H01L2224/48195

Voltage-Controlled Switching Device with Resistive Path

A voltage-controlled switching device includes a drain/drift structure formed in a semiconductor portion with a lateral cross-sectional area A.sub.Q, a source/emitter terminal, and an emitter channel region between the drain/drift structure and the source/emitter terminal. A resistive path electrically connects the source/emitter terminal and the emitter channel region. The resistive path has an electrical resistance of at least 0.1 mΩ*cm.sup.2/A.sub.Q.

Amplifier circuit
11296661 · 2022-04-05 · ·

An amplifier circuit that amplifies a high frequency signal includes a transistor that is an example of an amplifier integrated into an IC device and an inductor connected to an input terminal of the transistor, and the inductor includes a first inductor integrated into the IC device and a second inductor connected in series to the first inductor and included in a first component different from the IC device.

PACKAGING FOR RF TRANSISTOR AMPLIFIERS

RF transistor amplifiers an RF transistor amplifier die having a semiconductor layer structure, an interconnect structure having first and second opposing sides, wherein the first side of the interconnect structure is adjacent a surface of the RF transistor amplifier die such that the interconnect structure and the RF transistor amplifier die are in a stacked arrangement, and one or more circuit elements on the first and/or second side of the interconnect structure.

Semiconductor module
11309883 · 2022-04-19 · ·

A semiconductor module, including a semiconductor chip that includes a switching device having a control electrode, and a control terminal connected to the control electrode, a first resistance being formed between the control electrode and the control terminal and having a positive temperature coefficient, and a second resistance connected to the control terminal, the second resistance having a negative temperature coefficient. A temperature coefficient of a combined resistance at the control terminal is zero or negative.

Hybrid RF Integrated Circuit Device
20220085771 · 2022-03-17 ·

The present disclosure relates to an RF amplifier device including an IC chip including at least one transistor formed on a substrate, at least one operational circuit formed on the substrate and electrically coupled to the transistor, and a port configured to electrically couple the at least one operational circuit with operational circuitry outside the IC chip to adjust operation of the operational circuitry.

SEMICONDUCTOR DEVICE

According to one embodiment, a semiconductor device includes an integrated circuit (IC) chip and a silicon capacitor. The IC chip has a first terminal and a second terminal on a first surface. The silicon capacitor has a first electrode and a second electrode on a second surface facing the first surface. The first electrode is electrically connected to the first terminal through a first conductive member, and the second electrode is electrically connected to the second terminal through a second conductive member.

SEMICONDUCTOR MODULE
20220069816 · 2022-03-03 · ·

A semiconductor module, including a semiconductor chip that includes a switching device having a control electrode, and a control terminal connected to the control electrode, a first resistance being formed between the control electrode and the control terminal and having a positive temperature coefficient, and a second resistance connected to the control terminal, the second resistance having a negative temperature coefficient. A temperature coefficient of a combined resistance at the control terminal is zero or negative.

Laminate stacked on die for high voltage isolation capacitor

An isolator device includes a laminate die having a dielectric laminate material with a metal laminate layer on one side of the dielectric laminate material, the metal laminate layer being a patterned layer providing at least a first plate, including a dielectric layer over the first plate that includes an aperture exposing a portion of the first plate. An integrated circuit (IC) including a substrate having a semiconductor surface includes circuitry including a transmitter and/or a receiver, the IC including a top metal layer providing at least a second plate coupled to a node in the circuitry, with at least one passivation layer on the top metal layer. A non-conductive die attach (NCDA) material for attaching a side of the dielectric laminate material is opposite the metal laminate layer to the IC so that the first plate is at least partially over the second plate to provide a capacitor.

Package and semiconductor device
11158553 · 2021-10-26 · ·

A package includes a base substrate, a frame, and a lead frame. The base substrate is made of metal, and includes a mounting area on which a semiconductor element is to be mounted and a frame area surrounding the mounting area. The frame is provided on the frame area of the base substrate, and includes a first surface facing the frame area and a second surface opposite to the first surface. The lead frame is joined to the second surface of the frame. The frame includes a plurality of dielectric layers having a layered structure and an element connector to be electrically connected to the semiconductor element. The plurality of dielectric layers include a first dielectric layer having first permittivity and a second dielectric layer having second permittivity different from the first permittivity.

FIELD EFFECT TRANSISTOR AND SEMICONDUCTOR DEVICE

A field effect transistor includes: a semiconductor region including a first inactive region, an active region, and a second inactive region arranged side by side in a first direction; a gate electrode, a source electrode, and a drain electrode on the active region; a gate pad on the first inactive region; a gate guard on and in contact with the semiconductor region, the gate guard being apart from the gate pad and located between an edge on the first inactive region side of the semiconductor region and the gate pad; a drain pad on the second inactive region; a drain guard on and in contact with the semiconductor region, the drain guard being apart from the drain pad and located between an edge on the second inactive region side of the semiconductor region and the drain pad; and a metal film electrically connected to the gate guard.