A memory device includes an active region with a drain; a plurality of memory blocks arranged in a first direction; and a plurality of pass transistors formed in the active region and sharing the drain, each one of the plurality of pass transistors configured to transfer an operating voltage from the drain to a corresponding one of the plurality of memory blocks in response to a block select signal. The plurality of pass transistors is divided into first pass transistors and second pass transistors. A channel length direction of the first pass transistors and a channel length direction of the second pass transistors are different from each other.

A semiconductor storage device includes a first chip and a second chip. The first chip includes a semiconductor substrate, transistors, a first interconnect, and first bonding electrodes. The second chip includes a memory cell array and second bonding electrodes. The second bonding electrodes are bonded to the first bonding electrodes. The first chip or the second chip has bonding pad electrodes. The second bonding electrodes include third bonding electrodes and fourth bonding electrodes. The third and fourth bonding electrodes overlap the memory cell array. The third bonding electrodes are in a current pathway between the memory cell array and the transistors whereas the fourth bonding electrodes are not in such a current pathway. The first interconnect is electrically connected to a bonding pad electrode and a fourth bonding electrode directly, without a current path via any one of transistors.

The present discloses includes a memory device including a first vertical plug and a second vertical plug that are arranged to be adjacent to each other, a first select line contacting the first vertical plug, a second select line over a same layer as the first select line and contacting the second vertical plug, and an isolation pattern overlapping with a portion of the first vertical plug and a portion of the second vertical plug and separating the first select line from the second select line.

A semiconductor device includes: a first semiconductor substrate and a logic circuit provided on the first semiconductor substrate; a memory cell provided above the logic circuit and a second semiconductor substrate provided above the memory cell; a bonding pad provided above the second semiconductor substrate and electrically connected to the logic circuit; and a wiring provided above the second semiconductor substrate. The wiring is electrically connected to the memory cell, and includes at least one of a data signal line, a control voltage line, and a power supply line.

Technology for two-sided adjacent memory cell interference mitigation in a non-volatile storage system is disclosed. During reading of target memory cells, the storage system applies a suitable magnitude read pass voltage to a first unselected word line adjacent to a target word line to compensate for interference from adjacent cells on the first unselected word line while applying a suitable magnitude read reference voltage to the target word line to compensate for interference from adjacent cells on a second unselected word line on the other side of the target word line. The read pass voltage may compensate for interference due to charge being added to when programming cells on the first unselected word line after programming the target cells. The read reference voltage may compensate for interference due to charge movement near the target cells that results from charge stored in the cells on the second unselected word line.

A nonvolatile memory device includes a memory cell array in a first semiconductor layer and including a first memory cell connected to a first word line and a first bit line and a second memory cell connected to the first word line and a second bit line; a page buffer circuit in a second semiconductor layer and including a first page buffer connected to the first bit line, and a second page buffer connected to the second bit line; and a page buffer controller in the second semiconductor layer. The page buffer controller controls the first and second page buffers so that a develop timing of a first sensing node of the first page buffer is different from a develop timing of a second sensing node of the second page buffer. The first page buffer is closer to a through electrode region than the second page buffer.

A nonvolatile memory device includes a memory cell array including memory cells and a page buffer circuit. The page buffer circuit includes page buffer units and cache latches. The cache latches are spaced apart from the page buffer units in a first horizontal direction, and correspond to respective ones of the plurality of page buffer units. Each of the page buffer units includes a pass transistor connected to each sensing node and driven in response to a pass control signal. The page buffer circuit being configured to perform a data transfer operation, based on performing a first data output operation to output data, provided from a first portion of page buffer units, from a first portion of cache latches to a data input/output (I/O) line, the data transfer operation configured to dump sensed data from a second portion of page buffer units to a second portion of cache latches.

A nonvolatile memory device includes bitlines, a source line, cell channel structures, a gate electrode structure, erase channel structures and an erase selection line. The bitlines are disposed at a first end portion of a cell region, arranged in a first horizontal direction and extend in a second horizontal direction. The source line is disposed at a second end portion of the cell region and extend in the second horizontal direction. The cell channel structures are disposed in a cell string area of the cell region and are respectively connected between the bitlines and the source line. The erase channel structures are disposed in a contact area of the cell region and respectively connected between the bitlines and the source line. The erase channel structures include erase transistors. The erase selection line is disposed in the contact area to form a gate electrode of the erase transistors.

A non-volatile memory device includes a memory cell array including memory cells respectively connected to bit lines; and a control logic unit configured to control a program operation with respect to the memory cells. The control logic unit is configured to perform a normal program verify operation with respect to the memory cells by using a normal program verify condition, during the program operation, and, based on a suspend command that is received during the program operation, perform an initial program verify operation with respect to the memory cells by using an initial program verify condition that is different from the normal program verify condition.

There are provided a semiconductor memory device and a manufacturing method of a semiconductor memory device. The semiconductor memory device includes: a peripheral circuit layer; a bonding structure disposed on the peripheral circuit layer; a channel structure disposed on the bonding structure; a first gate contact structure including a first vertical part penetrating the bonding structure and a first horizontal part intersecting with the first vertical part and extending from the first vertical part; and a first gate conductive pattern in contact with a side all of the first horizontal part, the first gate conductive pattern being spaced apart from the first vertical part, the first gate conductive pattern extending to surround the channel structure.