Patent classifications
H
ELECTRICITY
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H01
ELECTRIC ELEMENTS
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H01L
SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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21/00
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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H01L21/02
Manufacture or treatment of semiconductor devices or of parts thereof
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H01L21/04
the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
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H01L21/18
the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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H01L21/30
Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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H01L21/31
to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
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H01L21/316
composed of oxides or glassy oxides or oxide based glass
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H01L21/31604
Deposition from a gas or vapour
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H01L21/31641
Deposition of Zirconium oxides, e.g. ZrO2
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H01L21/31641

Graded dielectric structures
09627501 · 2017-04-18 · ·

Graded dielectric layers and methods of fabricating such dielectric layers provide dielectrics in a variety of electronic structures for use in a wide range of electronic devices and systems. In an embodiment, a dielectric layer is graded with respect to a doping profile across the dielectric layer. In an embodiment, a dielectric layer is graded with respect to a crystalline structure profile across the dielectric layer. In an embodiment, a dielectric layer is formed by atomic layer deposition incorporating sequencing techniques to generate a doped dielectric material.

Method of forming dielectric films, new precursors and their use in semiconductor manufacturing
09583335 · 2017-02-28 · ·

Method of deposition on a substrate of a dielectric film by introducing into a reaction chamber a vapor of a precursor selected from the group consisting of Zr(MeCp)(NMe.sub.2).sub.3, Zr(EtCp)(NMe.sub.2).sub.3, ZrCp(NMe.sub.2).sub.3, Zr(MeCp)(NEtMe).sub.3, Zr(EtCp)(NEtMe).sub.3, ZrCp(NEtMe).sub.3, Zr(MeCp)(NEt.sub.2).sub.3, Zr(EtCp)(NEt.sub.2).sub.3, ZrCp(NEt.sub.2).sub.3, Zr(iPr.sub.2Cp)(NMe.sub.2).sub.3, Zr(tBu.sub.2Cp)(NMe.sub.2).sub.3, Hf(MeCp)(NMe.sub.2).sub.3, Hf(EtCp)(NMe.sub.2).sub.3, HfCp(NMe.sub.2).sub.3, Hf(MeCp)(NEtMe).sub.3, Hf(EtCp)(NEtMe).sub.3, HfCp(NEtMe).sub.3, Hf(MeCp)(NEt.sub.2).sub.3, Hf(EtCp)(NEt.sub.2).sub.3, HfCp(NEt.sub.2).sub.3, Hf(iPr.sub.2Cp)(NMe.sub.2).sub.3, Hf(tBu.sub.2Cp)(NMe.sub.2).sub.3, and mixtures thereof; and depositing the dielectric film on the substrate.