A light emitting substrate is provided. The light emitting substrate includes a plurality of light emitting controlling units arranged in M rows and N columns, M is an integer equal to or greater than one, N is an integer equal to or greater than one. A respective column of the N columns of light emitting controlling units includes M number of groups of second voltage signal lines, a respective group of the M number of groups of second voltage signal lines connected to a respective one of the M number of light emitting controlling units, the respective group of the M number of groups of second voltage signal lines including k number of second voltage signal lines, k is an integer equal to or greater than one.

A temporary chip assembly, a display panel, and manufacturing methods of the temporary chip assembly and the display panel are provided. In the display panel, welding points between a micro light-emitting chip and corresponding bonding pads on a display backboard are covered with pyrolytic adhesive to block water and oxygen, thereby slowing down or avoiding the oxidation of the welding points.

A semiconductor structure includes: a first substrate, with a first opening being provided on a surface of first substrate; and a first bonding structure positioned in the first opening. The first bonding structure includes a first metal layer and a second metal layer with a melting point lower than that of the first metal layer. The first metal layer includes a first surface in contact with a bottom surface of the first opening and a second surface opposite to the first surface, the second surface is provided with a first groove, an area, not occupied by the first metal layer and the first groove, of the first opening constitutes a second groove, the second metal layer is formed in the first groove and the second groove, and a surface, exposed from the second groove, of the second metal layer constitutes a bonding surface of the first bonding structure.

The present disclosure relates to the technical field of semiconductors, and provides a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes a first chip and a second chip. A first conductive connection wire of the first chip is connected to a first conductive contact pad, and a second conductive connection wire of the second chip is connected to a second conductive contact pad. In addition, the first conductive contact pad includes a first conductor group and a second conductor group, and the second conductive contact pad includes a third conductor group and a fourth conductor group.

A method for forming a hybrid-bonding structure is provided. The method includes forming a first dielectric layer over a first semiconductor substrate. The first semiconductor substrate includes a conductive structure. The method also includes partially removing the first dielectric layer to form a first dielectric dummy pattern, a second dielectric dummy pattern and a third dielectric dummy pattern and an opening through the first dielectric layer. The first dielectric dummy pattern, the second dielectric dummy pattern and the third dielectric dummy pattern are surrounded by the opening. In addition, the method includes forming a first conductive line in the opening. The first conductive line is in contact with the conductive structure.

A method for forming a hybrid-bonding structure is provided. The method includes forming a first dielectric layer over a first semiconductor substrate. The first semiconductor substrate includes a conductive structure. The method also includes partially removing the first dielectric layer to form a first dielectric dummy pattern, a second dielectric dummy pattern and a third dielectric dummy pattern and an opening through the first dielectric layer. The first dielectric dummy pattern, the second dielectric dummy pattern and the third dielectric dummy pattern are surrounded by the opening. In addition, the method includes forming a first conductive line in the opening. The first conductive line is in contact with the conductive structure.

A composite integrated circuit (IC) structure includes at least a first IC die in a stack with a second IC die. Each die has a device layer and metallization layers interconnected to transistors of the device layer and terminating at features. First features of the first IC die are primarily of a first composition with a first microstructure. Second features of the second IC die are primarily of a second composition or a second microstructure. A first one of the second features is in direct contact with one of the first features. The second composition has a thermal conductivity at least an order of magnitude lower than that of the first composition and first microstructure. The first composition may have a thermal conductivity at least 40 times that of the second composition or second microstructure.

The present invention provides a display device comprising: a substrate; a wiring electrode disposed on the substrate; a plurality of semiconductor light emitting elements each provided with a conductive electrode electrically connected to the wiring electrode; and an anisotropic conductive layer which is disposed between the conductive electrodes and the wiring electrode and formed of a mixture of conductive particles and an insulating material, wherein the conductive electrodes are provided with a protrusion part protruding toward the wiring electrode.

A display device includes an array substrate, a plurality of mounting electrodes provided to the array substrate, a columnar conductor for coupling provided to each of the mounting electrodes, a plurality of light-emitting elements provided to the array substrate, a first electrode and a second electrode provided to a surface of each of the light-emitting elements facing the array substrate, the first electrode being coupled to one of an anode and a cathode of the light-emitting element, the second electrode being coupled to the other of the anode and the cathode of the light-emitting element, and a coupling member covering each of the first electrode and the second electrode. The columnar conductor is made of material harder than the coupling member, and an end of the columnar conductor on the light-emitting element side is electrically coupled to the coupling member.

Devices and techniques including process steps make use of recesses in conductive interconnect structures to form reliable low temperature metallic bonds. A fill layer is deposited into the recesses prior to bonding. First conductive interconnect structures are bonded at ambient temperatures to second metallic interconnect structures using direct bonding techniques, with the fill layers in the recesses in one or both of the first and second interconnect structures.