A semiconductor package according to one embodiment comprises a substrate. A semiconductor chip is provided on the substrate. A resin layer is configured to cover the semiconductor chip on the substrate. A metal film is configured to cover a surface and side surfaces of the resin layer. The metal film is a laminated film including first to fourth metal layers. The first metal layer is configured to cover the resin layer. The second metal layer includes a first metal material that is different from a material of the first metal layer. The third metal layer includes an alloy of the first metal material forming the second metal layer and a second metal material different from the first metal material. The fourth metal layer is configured to cover the second or third metal layer.

A semiconductor package according to one embodiment comprises a substrate. A semiconductor chip is provided on the substrate. A resin layer is configured to cover the semiconductor chip on the substrate. A metal film is configured to cover a surface and side surfaces of the resin layer. The metal film is a laminated film including first to fourth metal layers. The first metal layer is configured to cover the resin layer. The second metal layer includes a first metal material that is different from a material of the first metal layer. The third metal layer includes an alloy of the first metal material forming the second metal layer and a second metal material different from the first metal material. The fourth metal layer is configured to cover the second or third metal layer.

A semiconductor package according to one embodiment comprises a substrate. A semiconductor chip is provided on the substrate. A resin layer is configured to cover the semiconductor chip on the substrate. A metal film is configured to cover a surface and side surfaces of the resin layer. The metal film is a laminated film including first to fourth metal layers. The first metal layer is configured to cover the resin layer. The second metal layer includes a first metal material that is different from a material of the first metal layer. The third metal layer includes an alloy of the first metal material forming the second metal layer and a second metal material different from the first metal material. The fourth metal layer is configured to cover the second or third metal layer.

A semiconductor package according to one embodiment comprises a substrate. A semiconductor chip is provided on the substrate. A resin layer is configured to cover the semiconductor chip on the substrate. A metal film is configured to cover a surface and side surfaces of the resin layer. The metal film is a laminated film including first to fourth metal layers. The first metal layer is configured to cover the resin layer. The second metal layer includes a first metal material that is different from a material of the first metal layer. The third metal layer includes an alloy of the first metal material forming the second metal layer and a second metal material different from the first metal material. The fourth metal layer is configured to cover the second or third metal layer.

A semiconductor device 10 includes a pair of electrodes 16 and a conductive connection member 21 electrically bonded to the pair of electrodes 16. At least a portion of a perimeter of a bonding surface 24 of at least one of the pair of electrodes 16 and the conductive connection member 21 includes an electromigration reducing area 22.

A method includes applying a die attach material to a die pad of an integrated circuit package. The die attach material is employed as a bonding material to the die pad. The method includes mounting an integrated circuit die to the die pad of the integrated circuit via the die attach material. The method includes printing an adhesion deposition material on the die attach material appearing at the interface of the integrated circuit die and the die pad of the integrated circuit package to mitigate delamination between the integrated circuit die and the die pad.

A method includes applying a die attach material to a die pad of an integrated circuit. The die attach material is employed as a bonding material to the die pad. The method includes mounting an integrated circuit die to the die pad of the integrated circuit via the die attach material. The method includes printing an adhesion deposition material on the die attach material appearing at the interface of the integrated circuit die and the die pad of the integrated circuit to mitigate delamination between the integrated circuit die and the die pad.

A semiconductor device 10 includes a pair of electrodes 16 and a conductive connection member 21 electrically bonded to the pair of electrodes 16. At least a portion of a perimeter of a bonding surface 24 of at least one of the pair of electrodes 16 and the conductive connection member 21 includes an electromigration reducing area 22.

A multichip package and a method for manufacturing the same are provided. A multichip package includes: a plurality of semiconductor chips each mounted on corresponding lead frame pads; lead frames connected to the semiconductor chips by a bonding wire; and fixed frames integrally formed with at least one of the lead frame pads and configured to support the lead frame pads on a package-forming substrate.

A multichip package and a method for manufacturing the same are provided. A multichip package includes: a plurality of semiconductor chips each mounted on corresponding lead frame pads; lead frames connected to the semiconductor chips by a bonding wire; and fixed frames integrally formed with at least one of the lead frame pads and configured to support the lead frame pads on a package-forming substrate.