The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.

Provided are a group III nitride composite substrate having a low sheet resistance and produced with a high yield, and a method for manufacturing the same, as well as a method for manufacturing a group III nitride semiconductor device using the group III nitride composite substrate. A group III nitride composite substrate includes a group III nitride film and a support substrate formed from a material different in chemical composition from the group III nitride film. The group III nitride film is joined to the support substrate in one of a direct manner and an indirect manner. The group III nitride film has a thickness of 10 m or more. A sheet resistance of a group III-nitride-film-side main surface is 200 /sq or less.

A passive anti-icing and/or deicing device can include an icephobic outer layer configured to prevent ice from forming and/or building up on the outer layer by preventing ice from adhering to the outer layer. The device can include a backer film attached to an underside of the icephobic outer layer, and an adhesive attached to the backer film on an opposite side of the backer film relative to the icephobic outer layer.

The present invention includes a label, a label sheet and a method for manufacturing the label. The label includes a paper facestock having first and second surfaces and a layer of pressure sensitive adhesive proximal to the second surface. The label can be adhered to a substrate having pre-applied indicia to cover the indicia and the label is opaque enough to prevent the viewing of the covered indicia while matching the color of the substrate.

The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said sub-strate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.

Provided are a group III nitride composite substrate having a low sheet resistance and produced with a high yield, and a method for manufacturing the same, as well as a method for manufacturing a group III nitride semiconductor device using the group III nitride composite substrate. A group III nitride composite substrate includes a group III nitride film and a support substrate formed from a material different in chemical composition from the group III nitride film. The group III nitride film is joined to the support substrate in one of a direct manner and an indirect manner. The group III nitride film has a thickness of 10 m or more. A sheet resistance of a group III-nitride-film-side main surface is 200 /sq or less.

Provided is a hard coating film in which a hard coating layer having a water contact angle of 90 or less, a conductive layer, and a low refractive index layer are laminated on a substrate, the film having excellent hardness, anti-curling property, antireflection performance, antifouling performance, and antistatic performance.

Provided is a hard coating film in which a hard coating layer having a water contact angle of 90 or less, a high refractive index layer, and a low refractive index layer are laminated on a substrate, the film having suppressed curling, and excellent hardness and antireflection performance.

The present invention relates to a double glazed window of a polycarbonate layer and, specifically, to a double glazed window of a polycarbonate layer, comprising an outer glass layer and an inner polycarbonate layer so as to have improved heat insulation and earthquake resistance. The double glazed window of a polycarbonate layer comprises: a glass layer forming an outer layer; a polycarbonate layer forming an inner layer; a vacuum layer (VL) formed between the glass layer and the polycarbonate layer; and sealing means for sealing the VL while coupling the glass layer and the polycarbonate layer.

Methods and systems for coating metal substrates are provided. The methods and systems include application of TGIC-reactive carboxyl-functional polyester resins with high acid number formulated to cure at low temperatures of 120 C. to 135 C.