The invention relates to an apparatus for the vapor deposition of a coating on optical articles, comprising a distribution mask (32) for controlling the vapor deposition of a coating on optical articles that is positioned in the path of some of the molecules emitted by said emitting source in the direction of the rotatable support for optical articles. The distribution mask (32) is fitted with at least one arm (34) positioned so as to mask at least one partial zone (16) of an individual housing (28) on a portion of the revolution turn, this masked partial zone (16) comprising the center of the individual housing (28).

The invention relates to an apparatus for the vapor deposition of a coating on optical articles, comprising a distribution mask (32) for controlling the vapor deposition of a coating on optical articles that is positioned in the path of some of the molecules emitted by said emitting source in the direction of the rotatable support for optical articles. The distribution mask (32) is fitted with at least one arm (34) positioned so as to mask at least one partial zone (16) of an individual housing (28) on a portion of the revolution turn, this masked partial zone (16) comprising the center of the individual housing (28).