A dispenser system including a source of chemical concentrate, a source of diluent, and a mix chamber in fluid communication with the source of chemical concentrate via a first line and with the source of diluent via a second line to mix chemical concentrate and diluent to form a dilution. The dispenser system also includes one or more metering devices disposed in one or both of the first line and the second line, a discharge fluidly coupled to the mix chamber to deliver the dilution to a downstream receptacle, and a control system in communication with the one or more metering devices. The control system is programmed to adjust a concentration of chemical concentrate in the dilution via control of the one or more metering devices based on an environmental factor affecting a physical environment to be cleaned using the dilution.

Methods and apparatuses for delivering a process gas to a processing chamber are provided. A mass flow controller includes a first flow line for introducing a process fluid and an inlet valve disposed along the first flow line for controlling a flow rate of the process fluid. The mass flow controller includes a second flow line for introducing a carrier fluid into the mass flow controller and a micro-electro-mechanical system (MEMS) Coriolis sensor for providing a density signal and a mass flow rate signal for a mixture of the process fluid and the carrier fluid. The mass flow controller provided includes an outlet valve for controlling a mass flow rate of the mixture that is output by the mass flow controller as well as a controller for operating the inlet valve based on the density signal and for operating the outlet valve based on the mass flow rate signal.

A method includes mixing a first deionized water (DI) water from a first pipe and a second DI water from a second pipe in a merging pipe that is in fluid communication with the first pipe and the second pipe. An electrical resistivity of the first DI water is different from an electrical resistivity of the second DI water. A mixture of the first DI water and the second DI water is applied from the merging pipe onto a wafer.

The present invention relates to a liquid mixing device which has a control system and electronic regulation, in charge of receiving the parameters set with respect to the liquid which is expected to be supplied by the tap or supply means whereto said device is connected and which acts on the regulation means of the different supply lines of liquids to mix to achieve said parameters, which has a high measurement and actuation dynamic thanks to measuring sections with ultrasonic transducers and proportional solenoid valves and a configuration and geometry of said measuring sections which allows having a multitude of reliable measurements per second.

A system for providing deionized (DI) water with a dynamic electrical resistivity is provided. The system includes plural DI water sources, source pipes, flow control devices, a merging pipe and a flow controller. The DI water sources respectively have different electrical resistivities. The source pipes are respectively connected to the DI water sources in a one-to-one manner. The flow control devices are respectively disposed in the source pipes in a one-to-one manner. The merging pipe joins the source pipes. The flow controller includes a resistivity sensor disposed in the merging pipe, and the flow controller is configured to control a flowrate of the DI water through the source pipes.

A plural component dispensing system individually delivers separate material components to each of a plurality of proportioners. Each of the proportioners regulates volumetric flow of each of the separate material components to produce a target ratio of the separate material components associated with the proportioner. The target ratios associated with the plurality of proportioners can be the same or different target ratios. Each proportioner delivers the separate material components at the associated target ratio to one of a plurality of dispensing devices. Each dispensing device mixes the separate components received at the corresponding target ratio and delivers the components as a mixture.

Methods and apparatuses for delivering a process gas to a processing chamber are provided. A mass flow controller includes a first flow line for introducing a process fluid and an inlet valve disposed along the first flow line for controlling a flow rate of the process fluid. The mass flow controller includes a second flow line for introducing a carrier fluid into the mass flow controller and a micro-electro-mechanical system (MEMS) Coriolis sensor for providing a density signal and a mass flow rate signal for a mixture of the process fluid and the carrier fluid. The mass flow controller provided includes an outlet valve for controlling a mass flow rate of the mixture that is output by the mass flow controller as well as a controller for operating the inlet valve based on the density signal and for operating the outlet valve based on the mass flow rate signal.

A circulation pump assembly for a heating and/or cooling system includes an electric drive motor (108) and a connected pump housing (106) in which at least one impeller (118) is situated and which comprises a first inlet (112) and a first outlet (114). The pump housing (106) includes a second inlet (122) which is connected in an inside of the pump housing (106) at a mixing point (130) to the first inlet (112). A regulating valve (134), which is designed for regulating the mixing ratio of two flows mixing at the mixing point (130), as well as a control device, which controls the regulating valve (134) for regulating the mixing ration, are arranged in the pump housing (106). A hydraulic manifold is provided with such a circulation pump assembly.

A circulation pump assembly for a heating and/or cooling system includes an electric drive motor (108) and a connected pump housing (106) in which at least one impeller (118) is situated and which comprises a first inlet (112) and a first outlet (114). The pump housing (106) includes a second inlet (122) which is connected in an inside of the pump housing (106) at a mixing point (130) to the first inlet (112). A regulating valve (134), which is designed for regulating the mixing ratio of two flows mixing at the mixing point (130), as well as a control device, which controls the regulating valve (134) for regulating the mixing ration, are arranged in the pump housing (106). A hydraulic manifold is provided with such a circulation pump assembly.

A method of controlling a flow rate includes selecting an operating condition defined by an operating flow rate and an operating pressure, comparing the operating flow rate to a threshold flow rate, and executing an adaptive calibration routing if the operating flow rate is greater than or equal to the threshold flow rate. The adaptive calibration routine includes measuring the operating pressure, measuring a first flow rate through a first meter, and modifying a pressure-flow table based on the operating pressure and the first flow rate.