A system for providing vacuum to a moving element of a transport system, the system includes: a vacuum chamber on the moving element for storing vacuum; a vacuum source; a vacuum inlet provided on the vacuum chamber and for connection to the vacuum source; and a vacuum outlet in communication with the vacuum chamber and positioned on the moving element. The vacuum source may be provided on and travel with the moving element or on the transport system and periodically engage with the vacuum chamber. Where the vacuum source is provided on the moving element, a vacuum chamber may not be required. Further, the vacuum source may be driven by electrical energy and/or mechanical energy in various configurations.

The present disclosure relates to the technical field of semiconductors, and provides a vacuum system, a low-pressure vacuum process device, and a cutoff member. The vacuum system includes: a vacuum pump; an exhaust pipeline, wherein one end of the exhaust pipeline is used to communicate with a chamber to be evacuated, and the other end of the exhaust pipeline communicates with the vacuum pump; and a cutoff member, wherein the cutoff member is connected to the exhaust pipeline, the cutoff member includes a filter portion and a carrier portion, the filter portion includes a passage, the carrier portion includes an accommodation groove, and the passage communicates with the accommodation groove.

Disclosed is a basement sewer drain pump housing that draws fluid from a drain into a housing, the fluid is discharged from the housing and out of the basement. The device comprises a pickup tube having a fluid level sensor, which is placed within a sewer main drain or floor drain. The housing comprises an enclosed volume, a suction tube connected to the pickup tube, a suction pump, and a discharge pump. The pump is activated by a switch controlled by the pickup tube fluid sensor, the fluid is drawn into the housing from the drain and discharged through a discharge pipe. The device operates from outlet or battery and serves as a basement drain pump that prevents fluid and sewage backflow during power outages and plumbing blockages. Another modification provides two donuts to prevent the flow of fluid blocking both the floor drain and the main sewer drain.

A method and apparatus for reducing undesirable noise generated by a vacuum pumping system. The vacuum system operates to reduce the pressure in a chamber to a first pressure value. The system then detects that the pressure at the vacuum pump system's inlet is about to change to a second higher pressure and, in response, the speed of a booster pump in the vacuum pump system is reduced below the rated speed for the pump. When the pressure at the vacuum pump's inlet is above the second pressure, the speed of the booster pump is increased to the rated speed. Thus, the booster pump is slowed down prior the pump system becoming exposed to a rapid increase in inlet pressure.

To overcome the problem associated with liquid or solid process debris from a vacuum process system falling into, and contaminating or damaging, a vacuum pumping arrangement used to evacuate the system, the inlet of the vacuum pumping arrangement is located lower than the outlet of the arrangement. This provides a net flow of gas pumped by the arrangement in a generally upwards direction thereby resisting the passage of contaminants into the arrangement.

The invention relates to an system for supplying a hydraulic circuit with hydraulic fluid. The system includes a working reservoir and an auxiliary reservoir connected to the working reservoir by a hydraulic line. An air pump has an inlet connected to a suction line that opens into a liquid-free portion of the auxiliary reservoir so that a negative pressure can be built up in the auxiliary reservoir relative to the atmospheric ambient pressure. The air pump inlet is also connected to a control line, which comprises a control opening which is covered by the hydraulic fluid in the working reservoir, at least before the air pump is started up.

A purge solenoid valve is opened to introduce an atmospheric pressure into a fuel tank, the purge solenoid valve is closed to operate a negative pressure pump, and set an internal pressure of the tank to a reference pressure Pb. Then, a changeover valve is closed, and the purge solenoid valve is opened to cause a canister to communicate with an intake passage. Further, the changeover valve is opened, and the purge solenoid valve is closed. Then, a first tank internal pressure Po is detected and subtracted from the reference pressure Pb. If a calculated first pressure deviation Po is larger than a first threshold P1, it is determined that there is no open sticking in a sealing valve.

Embodiments of mechanisms for processing a wafer are provided. A method for processing a wafer includes creating an exhaust flow in a fluid conduit assembly that is connected to a process module used for processing the wafer. The method also includes detecting the exhaust pressure in the fluid conduit assembly. The method further includes determining whether the exhaust pressure meets a set point. In addition, the method includes regulating the exhaust flow if the exhaust pressure fails to meet the set point.