Disclosed is a method for the removal of soluble particulate matter from a gas stream, such as urea dust from the off-gas of a finishing section of a urea production plant. The method comprises subjecting the off-gas to at least two quenching stages an aqueous quenching liquid. The quenching liquid used in a first, upstream quench stage, is allowed to have a higher concentration of dissolved particulate matter than the quenching liquid in the second, downstream quench stage. The quenched gas is led through a particle capture zone, typically comprising one or more of a wet scrubber, a Venturi scrubber, and a wet electrostatic precipitator.

Disclosed is a method for the removal of soluble particulate matter from a gas stream, such as urea dust from the off-gas of a finishing section of a urea production plant. The method comprises subjecting the off-gas to at least two quenching stages an aqueous quenching liquid. The quenching liquid used in a first, upstream quench stage, is allowed to have a higher concentration of dissolved particulate matter than the quenching liquid in the second, downstream quench stage. The quenched gas is led through a particle capture zone, typically comprising one or more of a wet scrubber, a Venturi scrubber, and a wet electrostatic precipitator.

Disclosed is a method for the removal of soluble particulate matter from a gas stream, such as urea dust from the off-gas of a finishing section of a urea production plant. The method comprises subjecting the off-gas to at least two quenching stages an aqueous quenching liquid. The quenching liquid used in a first, upstream quench stage, is allowed to have a higher concentration of dissolved particulate matter than the quenching liquid in the second, downstream quench stage. The quenched gas is led through a particle capture zone, typically comprising one or more of a wet scrubber, a Venturi scrubber, and a wet electrostatic precipitator.

The invention provides a scrubbing column for cleaning gas streams laden with absorbent residues, for example with methanol, and also with solid particles, for example with fuel dust. The gas scrubbing is effected by means of a random packing disposed in the lower region of the scrubbing column and the gas scrubbing of the gas stream laden solely with absorbent residues but not with solid particles by means of a structured packing disposed in the upper region of the scrubbing column. The use of the scrubbing column according to the invention in the integrated plant system between a gasification plant and a plant for gas scrubbing which is operated by the Rectisol process, for example, offers particular advantages with regard to its industrial employability owing to the possible connections described, which bring synergies for efficient operation of the integrated plant system.

A scrubber for cleaning of a gas comprises a casing, enclosing a scrubbing chamber. The casing comprises a gas inlet into and a gas outlet out from the scrubbing chamber. The casing permits the gas to flow through the scrubbing chamber from the gas inlet to the gas outlet. A deflector device is provided in the scrubbing chamber between the gas inlet and the gas outlet and forms a passage between the deflector device and the casing. The deflector device comprises a downstream surface facing the gas outlet and having an outer edge. A spraying nozzle is configured to spray a scrubbing liquid into the scrubbing chamber and the gas flow. A channel member extends from the deflector device. The channel member leads scrubbing liquid collected by the deflector device from the deflector device.

A scrubber for cleaning of a gas comprises a casing, enclosing a scrubbing chamber. The casing comprises a gas inlet into and a gas outlet out from the scrubbing chamber. The casing permits the gas to flow through the scrubbing chamber from the gas inlet to the gas outlet. A deflector device is provided in the scrubbing chamber between the gas inlet and the gas outlet and forms a passage between the deflector device and the casing. The deflector device comprises a downstream surface facing the gas outlet and having an outer edge. A spraying nozzle is configured to spray a scrubbing liquid into the scrubbing chamber and the gas flow. A channel member extends from the deflector device. The channel member leads scrubbing liquid collected by the deflector device from the deflector device.

A scrubber for cleaning a gas comprises a casing extending along a longitudinal central axis and enclosing a scrubbing chamber. The casing has a gas inlet and a gas outlet. The casing is configured to permit flow of the gas through the scrubbing chamber in a flow direction from the gas inlet to the gas outlet. A deflector device in the scrubbing chamber between the gas inlet and outlet forms a gas passage between the deflector device and the casing. The deflector device comprises an upstream surface facing the gas inlet. A spraying nozzle is configured to spray a scrubbing liquid into the scrubbing chamber and the gas flow. A separation device comprises a shield element and is arranged between the upstream surface of the deflector device and the gas inlet. The shield element shields the upstream surface from the gas flow and is perforated by a plurality of holes.

A scrubber for cleaning a gas comprises a casing extending along a longitudinal central axis and enclosing a scrubbing chamber. The casing has a gas inlet and a gas outlet. The casing is configured to permit flow of the gas through the scrubbing chamber in a flow direction from the gas inlet to the gas outlet. A deflector device in the scrubbing chamber between the gas inlet and outlet forms a gas passage between the deflector device and the casing. The deflector device comprises an upstream surface facing the gas inlet. A spraying nozzle is configured to spray a scrubbing liquid into the scrubbing chamber and the gas flow. A separation device comprises a shield element and is arranged between the upstream surface of the deflector device and the gas inlet. The shield element shields the upstream surface from the gas flow and is perforated by a plurality of holes.

The device (1) for bringing a gas and a liquid into contact includes an enclosure (E), first means (5) for introducing into the enclosure and circulating therein a gas stream (G), second means (6) for introducing into the enclosure and circulating therein a liquid stream (L) that circulates inside the enclosure (E) in the same direction as the gas stream (G), and means (4A) for mixing the gas stream (G) and the liquid stream (L). These mixing means (4A) are positioned inside the enclosure (E) in the path of the gas stream and liquid stream and are capable of locally deflecting upward, and/or of locally causing to rise, at least one portion of the gas stream and liquid stream, so as to locally create turbulences in the gas stream and in the liquid stream.

The device (1) for bringing a gas and a liquid into contact includes an enclosure (E), first means (5) for introducing into the enclosure and circulating therein a gas stream (G), second means (6) for introducing into the enclosure and circulating therein a liquid stream (L) that circulates inside the enclosure (E) in the same direction as the gas stream (G), and means (4A) for mixing the gas stream (G) and the liquid stream (L). These mixing means (4A) are positioned inside the enclosure (E) in the path of the gas stream and liquid stream and are capable of locally deflecting upward, and/or of locally causing to rise, at least one portion of the gas stream and liquid stream, so as to locally create turbulences in the gas stream and in the liquid stream.