Disclosed is a gas collection apparatus used in manufacturing a semiconductor. The apparatus includes: a housing having a chamber formed therein; a heating member installed in the housing to heat cobalt-carbon gas introduced into the chamber; a cobalt deposition member installed across the chamber of the housing to deposit cobalt composite; and a cooling member that induces carbon composite to be solidified and deposited while rapidly cooling the carbon composite.

A gas combustion treatment device that subjects an ammonia-containing gas, a hydrogen cyanide-containing gas, and a hydrogen sulfide-containing gas to combustion treatment includes: a first combustion unit configured to introduce therein fuel, the ammonia-containing gas, the hydrogen cyanide-containing gas, and air and burn and reduce the fuel and the gases at an air ratio lower than 1; a second combustion unit provided downstream of the first combustion unit and configured to burn and reduce, in a reducing atmosphere, nitrogen oxide in a first combustion gas sent from the first combustion unit; and a third combustion unit provided downstream of the second combustion unit and configured to introduce therein hydrogen sulfide-containing gas with air in addition to a second combustion gas sent from the second combustion unit.

A fuel cell system 2 is provided with: a contaminated exhaust gas line for supplying a contaminated exhaust gas containing a contaminant discharged from a facility; and a contaminated exhaust gas purification part for purifying the contaminated exhaust gas supplied from the contaminated exhaust gas line by using heat of reaction of a fuel cell.

A gas treatment system includes a first scrubber, a regenerative catalytic oxidizer (RCO) that treats gas that passes through the first scrubber, a second scrubber that treats the gas that passed through the regenerative catalytic oxidizer, and a dielectric barrier discharge (DBD) plasma reactor that treats the gas that passed through the second scrubber. The regenerative catalytic oxidizer includes a two-bed regenerative catalytic reactor.

A microwave enhanced air disinfection (MEAD) device includes a housing and a microwave generator coupled to the housing. The microwave generator is configured to generate microwave energy. The MEAD device further includes a multi-component filter disposed in the housing. The multi-component filter is configured to collect contaminants from airflow. At least a portion of the contaminants from the airflow is to be destroyed at least one of directly or indirectly via the microwave energy.

The present disclosure relates to a regenerative thermal oxidizer comprising at least a first transfer chamber and at least a second transfer chamber, wherein the first transfer chamber comprises a first bed and the second transfer chamber comprises a second bed; at least one reaction chamber in fluid flow communication with the first transfer chamber and with the second transfer chamber, wherein waste gas is introducible into the regenerative thermal oxidizer to flow through the first bed to the reaction chamber or to flow through the second bed to the reaction chamber; and one or more first oxygen-containing gas inlet for introducing oxygen-containing gas into the regenerative thermal oxidizer positioned between at least a portion of the first bed and at least a portion of the reaction chamber or positioned between at least a portion of the second bed and at least a portion of the reaction chamber.

FIG. 1

The present disclosure relates to a regenerative thermal oxidizer comprising at least a first transfer chamber and at least a second transfer chamber, wherein the first transfer chamber comprises a first bed and the second transfer chamber comprises a second bed; at least one reaction chamber in fluid flow communication with the first transfer chamber and with the second transfer chamber; and one or more first waste gas inlet for introducing at least a first portion of waste gas into the regenerative thermal oxidizer positioned between at least a portion of the first bed and at least a portion of the reaction chamber or positioned between at least a portion of the second bed and at least a portion of the reaction chamber.

An electronic microbicidal air filter is provided as an ambient air filter in aeration supports or ventilation grids and as an air filter for PPE protection masks. The filter includes an UVC luminaire (2), a power module (3), activation sensors (4), internal structure (5) with walls defining filtering chambers (6) with exposure membranes (7) sandwiched between the chambers (6) under the luminaire (2), so that the chambers (6) determine a winding zigzag path for the air that passes therethrough, while the particles carried by the air are irradiated by the luminaire (2) directly. The functional elements in the internal structure (5) of chambers (6) are integrated in an encapsulation (9) that surrounds the external part of the assembly and defines a sealed space for the functional and support elements at the ends of the structure (5).

A system for reducing the release of hydrocarbons emitted from a hydrocarbon source into the atmosphere includes a hydrocarbon supply conduit configured to receive the emitted hydrocarbons. In addition, the system includes an air supply conduit coupled to an air source. Further, the system includes a combustion device coupled to an outlet end of the hydrocarbon supply conduit and an outlet end of the air supply conduit. The combustion device is configured to receive the hydrocarbons from the hydrocarbon supply conduit and the air from the air supply conduit, and combust the hydrocarbons. Still further, the system includes a catalytic converter spaced apart from the combustion device and a transfer conduit extending from an outlet of the combustion device to an inlet of a catalytic converter. The catalytic converter is configured to receive the combustion products and any un-combusted hydrocarbons from the transfer conduit, and oxidize the un-combusted hydrocarbons.

An apparatus for treating gaseous pollutants includes a gas inlet part, a first treatment unit, a second treatment unit and a non-mechanical flow-guiding device. The gas inlet part includes a gas inlet chamber and at least one guide pipe. The guide pipe communicates with the gas inlet chamber and guides an effluent stream from a semiconductor process to the gas inlet chamber. The first treatment unit is coupled to a bottom end of the gas inlet part and is configured to abate the effluent stream. The non-mechanical flow-guiding device is coupled to the first treatment unit. The flow-guiding device is configured to guide the effluent stream to move toward an opening. The second treatment unit is coupled to the flow-guiding device via the opening, receives the effluent stream from the first treatment unit and further abates the effluent stream.