An electronic microbicidal air filter is provided as an ambient air filter in aeration supports or ventilation grids and as an air filter for PPE protection masks. The filter includes an UVC luminaire (2), a power module (3), activation sensors (4), internal structure (5) with walls defining filtering chambers (6) with exposure membranes (7) sandwiched between the chambers (6) under the luminaire (2), so that the chambers (6) determine a winding zigzag path for the air that passes therethrough, while the particles carried by the air are irradiated by the luminaire (2) directly. The functional elements in the internal structure (5) of chambers (6) are integrated in an encapsulation (9) that surrounds the external part of the assembly and defines a sealed space for the functional and support elements at the ends of the structure (5).

The present invention discloses a gas hydrate-based particulate/waste gas simultaneous removal system and method. R134a can be used to synthesize particulates/coking waste gases into gas hydrate, which can realize the simultaneous removal of particulates/coking waste gases with no pollution and low energy consumption. The system comprises a waste heat recovery device, a gas hydrate primary dust removal tower, a solid-liquid separation primary tower, a gas hydrate secondary dust removal tower, a solid-liquid separation secondary tower, a gas hydrate decomposition pool, a gas-solid separation tower and a low temperature fractionation device. The present invention can achieve the removal of harmful substances such as heavy metals and coking waste gases while removing particulates. Compared with the current particulate control and waste gas treatment device, the gas hydrate method-based device is greatly simplified and can effectively remove multiple pollutants and realize energy saving and environmental protection.

An apparatus for treating gaseous pollutants includes a gas inlet part, a first treatment unit, a second treatment unit and a non-mechanical flow-guiding device. The gas inlet part includes a gas inlet chamber and at least one guide pipe. The guide pipe communicates with the gas inlet chamber and guides an effluent stream from a semiconductor process to the gas inlet chamber. The first treatment unit is coupled to a bottom end of the gas inlet part and is configured to abate the effluent stream. The non-mechanical flow-guiding device is coupled to the first treatment unit. The flow-guiding device is configured to guide the effluent stream to move toward an opening. The second treatment unit is coupled to the flow-guiding device via the opening, receives the effluent stream from the first treatment unit and further abates the effluent stream.

Embodiments disclosed herein provide an organic matter processing apparatus and method for the use thereof to convert organic matter into a ground and desiccated product. The organic matter processing apparatus includes a lid assembly that is positioned at the top or head of the processing apparatus and an air treatment system. The lid assembly is operative to open to allow a user to deposit organic matter into the processing apparatus or to remove a removable bucket contained therein. The lid assembly is operative to close and provide an odor containing seal that prevents or substantially mitigates escape of odor. The air treatment system uniformly distributes untreated air through an air treatment chamber to convert the untreated air to treated air, which is exhausted out of the processing apparatus.

Disclosed is a gas collection apparatus used in manufacturing a semiconductor. The apparatus includes: a housing having a chamber formed therein; a heating member installed in the housing to heat cobalt-carbon gas introduced into the chamber; a cobalt deposition member installed across the chamber of the housing to deposit cobalt composite; and a cooling member that induces carbon composite to be solidified and deposited while rapidly cooling the carbon composite.

Vehicle comprising a passenger compartment and a system for cleaning the passenger compartment comprising at least one measuring member for measuring the level of dirtiness of said passenger compartment, at least one heating member configured to heat the ambient air of the passenger compartment to a temperature higher than 40° C. in order to desorb the impurities in the passenger compartment, at least one ventilation member configured to remove the ambient air and the desorbed impurities to outside the passenger compartment and at least one control member configured to activate the heating member if the measured level of dirtiness is above a predetermined maximum level of dirtiness.

A semiconductor waste abatement system for a semiconductor processing system includes a vacuum pump, an abatement apparatus having an abatement chamber in fluid communication with a source of semiconductor waste gas from the semiconductor processing chamber, and with the abatement chamber configured to ionize the waste gas and to exhaust ionized gas. The abatement system further includes a filter apparatus with a filter chamber, which forms a liquid reservoir. The inlet of the filter apparatus is in fluid communication with the outlet of the abatement chamber and the liquid reservoir, and the outlet of the filter apparatus is in communication with the inlet of the vacuum pump, wherein the filter chamber is under a vacuum, and wherein semiconductor waste gas is ionized in the abatement chamber and then filtered by the filter apparatus prior to input to the vacuum pump.

Systems and methods for the synthesis of ammonia includes a reformer; a carbon monoxide converter; a carbon dioxide scrubber unit with recovery; a methanation unit; and an ammonia synthesis unit; wherein the carbon dioxide scrubber unit with recovery is connected to at least one fired auxiliary steam boiler.

Various embodiments disclosed herein include a system and method for processing an exhaust gas. The system comprises a regenerative thermal oxidizer (RTO), a bypass flow module in parallel with the RTO, and a mixing module disposed downstream of the RTO; wherein the RTO is configured to oxidize a first part of the exhaust gas and produce a hot tail gas and deliver a predetermined amount of the hot tail gas outside of the RTO, and the mixing module is configured to receive the predetermined amount of the hot tail gas; and wherein the bypass flow module is configured to receive and bypass a second part of the exhaust gas around the RTO into the mixing module; and wherein the second part of the exhaust gas absorbs sufficient heat from the predetermined amount of the hot tail gas in the mixing module for oxidizing and decomposing an organic compound therein.

The disclosure describes various aspects of a metal organic chemical vapor deposition (MOCVD) effluent abatement process. In an aspect, a system for removing toxic waste from an exhaust stream includes a first cold trap that operates at a first pressure and condenses toxic materials in the exhaust stream for removal as solid waste; a pump connected to the first cold trap that increases a pressure of the exhaust stream; a hot cracker connected to the pump that decomposes toxic materials remaining in the exhaust stream after the first cold trap; a second cold trap connected to the hot cracker that operates at a second pressure higher than the first pressure and condenses the decomposed toxic materials remaining in the exhaust stream for removal as solid waste; and a scrubber connected to the second cold trap that absorbs toxic materials remaining in the exhaust stream after the second cold trap.