Patent classifications
B01D2221/14
Dual medium filter for ion and particle filtering during semiconductor processing
The present disclosure is directed to fluid filtering systems and methods for use during semiconductor processing. One or more embodiments are directed to fluid filtering systems and methods for filtering ions and particles from a fluid as the fluid is being provided to a semiconductor wafer processing tool, such as to a semiconductor wafer cleaning tool.
Shot peening apparatus
A shot peening apparatus includes a first tank. The first tank includes a swirl flow generating mechanism and a suction port. The swirl flow generating mechanism swirls a waste liquid in the circumferential direction. The suction port is disposed at the axial center of the first tank. The suction port opens toward a bottom wall and suctions the waste liquid. A plurality of blade members are provided inside the first tank. The plurality of blade members hinders the waste liquid from swirling in the first tank.
SYSTEM TO COLLECT, RECOVER AND RECYCLE CHEMICAL EXHAUST FROM SEMICONDUCTOR PROCESSING CHAMBERS
Chemical precursor recovery systems and methods of recovering and reusing semiconductor manufacturing chemistry are disclosed. The recovery systems include a cold trap inlet line in fluid communication with a plurality of cold traps and a cold trap outlet line. The plurality of cold traps is configured to condense the chemical precursors and are arranged based on semiconductor manufacturing process conditions.
Method for separating polishing material and regenerated polishing material
Method for separating a polishing material, which is capable of separating and recovering cerium oxide from a used polishing material that is mainly composed of cerium oxide and a regenerated polishing material which can be obtained by the separation method. This method for separating a polishing material is characterized in that a divalent alkaline earth metal salt is added into the slurry of the used polishing material, while controlling the temperature of the slurry within the range of 10-70 DEG C., thereby causing the polishing material to aggregate under such conditions that the mother liquor has a pH of less than 10.0 as the pH is converted to one at 25 DEG C. so that the polishing material is separated from the mother liquor.
SYSTEM AND METHOD TO COMBINE A FILTER SYSTEM WITH A FREEZE DRYER TO PREVENT CONTAMINATION OF A VACUUM PUMP
A system and method for providing a filter to prevent contamination of a vacuum pump during use with a freeze dryer. The method comprises evacuating, with a vacuum pump, pressure from freeze dryer; monitoring level of oil in reservoir; circulating oil between a sedimentary filter and a coalescing filter, and the vacuum pump, whereby a low pressure generated by the vacuum pump enables flowage of the oil; collecting condensation and water vapor that evaporates from oil through an exhaust hose; collecting, in the sedimentary filter, rust, particulates, and water from oil; collecting, in coalescing filter, water vapor and particulate gas to coalesce water vapor and particulate gas into oil, water, and particulates; separating, in coalescing filter, oil from water and particulates, whereby oil is rejuvenated; injecting clean air into rejuvenated oil; and turning the vacuum off and allowing remaining oil in the static system to return to vacuum pump reservoir.
Processing liquid supply method, processing liquid supply apparatus and storage medium
Disclosed are an apparatus and a method for reducing a processing liquid consumed for removing bubbles from a new filter unit, and shortening a start-up time when the filter unit is attached in a processing liquid supply passage. The method includes: filling the processing liquid into a new filter unit, decompressing inside of the filter unit into a first pressure atmosphere in order to remove bubbles from the filter unit, boosting a pressure of the inside of the filter unit, flowing the processing liquid into the filter unit from a primary side of the filter unit, and supplying the processing liquid flowing from the filter unit to an object to be processed through a nozzle thereby performing a liquid processing and quickly removing the bubbles.
CHARGED PARTICLE FILTER AND REMOVAL SYSTEM
The present disclosure is directed to at least one embodiment of a filter that is configured to remove contaminants utilizing a first conductive mesh (e.g., first electrode) and a second conductive mesh (e.g., second electrode) that extends around the first conductive mesh. For example, the first conductive mesh may receive a first electrical signal and the second conductive mesh may receive a second electrical signal such that the first and second conductive meshes are oppositely charged from each other (e.g., the first conductive mesh is positively charged and the second conductive mesh is negatively charged). Anions that are present within the fluid or generated by an electrical field between the first and second conductive meshes may interact with the contaminants such that the contaminants are attracted to at least one of the first and second conductive meshes, respectively.
Filtration media especially useful for filtering fluids associated with wire electron discharge machining (WEDM) processes
Fibrous filtration media and methods of making and using the same are provided whereby the media includes a wet-laid nonwoven fibrous web having from about 20 wt. % to about 80 wt. %, based on total weight of fibrous web, of bicomponent staple fibers, and from about 10 wt. % to about 50 wt. %, based on total weight of the fibrous web, of fibrillated lyocell staple fibers. The fibrous web exhibits a wet burst strength of greater than 3 bar, for example between about 3 bar to about 6 bar and is especially suitable for use in filtering process fluids (e.g., water) associated with wire electron discharge machining (WEDM).
SYSTEM AND PROCESS FOR RECYCLING MACHINING WASTE FROM CNC EQUIPMENT
A system and process for recycling machining waste into a solid/scrap material component and a recyclable machining coolant. The system and process comprise collecting the waste machining waste and mechanically separating the machining waste into a solid/scrap material component and a machining waste liquid component. The machining waste liquid component is decanted to separate oils and solids from the recyclable machining coolant. The machine recyclable machining coolant is then filtered through at least a first filter and preferably a second, finer mesh filter. The recyclable machining coolant is then exposed to UV light to kill bacteria and microorganisms. Lastly, ultrapure water is added to dilute the recyclable machining coolant and form the recycled machining coolant. If desired, a virgin machining coolant can be added to the recycled machining coolant, to replenish any additive(s) stripped during the recycling process, prior to resale of the recycled machining coolant.
PARTICLE SEPARATING APPARATUS AND METHOD OF SEPARATING PARTICLES USING THE SAME
A particle separating apparatus and a method of separating particles using the same are provided. The particle separating apparatus comprises a base part, a micro channel disposed in the base part, an inlet portion disposed at an end portion of the micro channel, wherein light-emitting elements, Newtonian fluid and viscoelastic fluid are injected into the inlet portion, an inlet flow path connecting the inlet portion and the micro channel, an outlet portion disposed at an opposite end portion of the micro channel, wherein the light-emitting elements, the Newtonian fluid and the viscoelastic fluid are discharged from the outlet portion, an outlet flow path connecting the micro channel and the outlet portion, and a vortex generator disposed under the inlet portion to generate a surface acoustic wave.