Commercially beneficial carbon-containing fractions can be recovered from hydrothermal liquefaction reactions in various types of processors. Feedstock slurry from waste solids is placed into a pressurized processor where it is maintained at temperature and pressure for a predetermined period. On discharge from the processor the processed discharge is separated into liquid and solid fractions. Gaseous fractions including carbon dioxide can also be removed or off-taken from the processor. New molecular structures are created in this reaction, resulting in fractions including biogas, biofuels, biosolids and biocrude. Silica, phosphates, potash and low concentration nitrogen based fertilizer, along with carbonaceous material can also be recovered.

Systems for and methods of treating a fluid containing siloxanes, silanes and/or other silicon compounds. A hot box is configured to receive an initial flow of the fluid, react the flow with water at a temperature and pressure suitable for hydrolysis to generate a first treated flow, in which at least a portion is hydrolyzed to produce silicon dioxide and methane, and discharge the first treated flow. A solid removal mechanism can be configured to receive the first treated flow, separate at least a portion of the silicon dioxide as solid material, and discharge the remaining components as a second treated flow. Techniques of the present disclosure can lead to very low siloxane levels.

A filter assembly is disclosed that has a body defining a cavity and having a first side edge surface, a second side edge surface, a top edge surface, and a bottom edge surface forming a perimeter surface around the cavity. A porous flow face extends across the cavity and is coupled to the perimeter surface. The porous flow face arcs between the first side edge surface and the second side edge surface. An adsorbent is disposed in the cavity.

A device and method of simultaneously removing flammable gases and nitrous oxide are provided. The device includes a thermal oxidation chamber, a high-temperature resistant dust filter, and a catalyst chamber. The thermal oxidation chamber is configured to receive an exhaust gas from a process tool. The exhaust gas includes flammable gases and nitrous oxide. The thermal oxidation chamber has a first exhaust pipe to emit nitrous oxide and dust generated after the exhaust gas is thermally oxidized. The high-temperature resistant dust filter receives dust and nitrous oxide from the first exhaust pipe, wherein the high-temperature resistant dust filter has a filter fiber net and a second exhaust pipe, and the second exhaust pipe is configured to emit nitrous oxide. The catalyst chamber receives nitrous oxide from the second exhaust pipe, wherein the catalyst chamber has a nitrous oxide decomposition catalyst to decompose nitrous oxide into nitrogen and oxygen.

Apparatus and methods are disclosed. The apparatus comprises: an abatement chamber of an abatement apparatus which treats an effluent stream from a semiconductor processing tool to provide a combusted effluent stream having effluent particles; and a first atomiser located downstream of the abatement chamber, the first atomiser being configured to produce droplets having a droplet size based on a particle size of the effluent particles to be removed from the combusted effluent stream. In this way, the atomizer may produce droplets which combine with or adhere to the effluent particles which assists in the removal of the effluent particles from the combusted effluent stream.

Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

This invention relates to a Cu-BTC MOF which is water stable. The Cu-BTC MOF has been modified by substituting some of the BTC ligand (1,3,5, benzene tricarboxylic acid) with 5-aminoisophthalic acid (AIA). The resultant MOF retains at least 40% of its as synthesized surface area after exposure to liquid water at 60° C. for 6 hours. This is an unexpected result versus the MOF containing only the BTC ligand. This MOF can be used to abate contaminants such as ammonia in gas streams and especially air streams.

Novel methods for pretreating a rare-gas-containing stream exiting an etch chamber followed by recovering the rare gas from the pre-treated, rare-gas containing stream are disclosed. More particularly, the invention relates to the pretreatment and recovery of a rare gas, such as xenon or krypton, from a nitrogen-based exhaust stream with specific gaseous impurities generated during an etch process that is performed as part of a semiconductor fabrication process.

There is provided a scrubber device including: a reaction tower in which an internal space is formed; a liquid spray unit configured to spray a liquid in the internal space; a gas inlet port configured to introduce a gas to the reaction tower; a liquid outlet port configured to discharge, from the reaction tower, drainage generated by treatment of taking, into the liquid, a substance in the gas; a gas supply unit configured to supply the treated gas from the reaction tower; and a heating unit which is provided in at least a part of a portion close to the liquid outlet port with respect to the gas inlet port in the reaction tower, and a portion of a liquid outlet tube that is connected downstream from the liquid outlet port, and which is configured to heat the drainage.

Adsorbent materials are disclosed, along with filter elements containing the adsorbent materials methods of using adsorbents to remove siloxane contaminants from a gas stream. The method includes providing an adsorbent material that has been washed with an acid and passing a gas through the adsorbent material so as to reduce siloxane levels in the gas. A filter element for reducing siloxane levels in a gas includes a first adsorbent material, the first adsorbent material comprising an acid-washed adsorbent; and a second adsorbent material, the second adsorbent material comprising an acid-impregnated adsorbent.