The proposed multifunctional hydrodynamic vortex type reactor includes —a housing having curvilinear inner sidewalls, —a base attached to the housing, an inverse taper narrowing downward and attached to the top of housing, —a supporting tube passing at least through the housing and base, —a set of washers tapered downward and mounted on an outer surface of the supporting tube such that outer upper edges of the set of washers and the inner sidewalls form predetermined gaps therebetween, and —a number of inlets tangentially attached to the base for introducing, under external pressure, a solid substance and a liquid (or a suspension of their mixture) thereinto, forming a circulating flow therein. The flow forms a high speed bypassing cavitation zone and, changing its direction at the inverse taper, forms a vortex cavitation zone, providing for mixing and grinding the substance up to nanoscale sizes. Methods for intensifying cavitation are also provided.

The proposed multifunctional hydrodynamic vortex type reactor includes —a housing having curvilinear inner sidewalls, —a base attached to the housing, an inverse taper narrowing downward and attached to the top of housing, —a supporting tube passing at least through the housing and base, —a set of washers tapered downward and mounted on an outer surface of the supporting tube such that outer upper edges of the set of washers and the inner sidewalls form predetermined gaps therebetween, and —a number of inlets tangentially attached to the base for introducing, under external pressure, a solid substance and a liquid (or a suspension of their mixture) thereinto, forming a circulating flow therein. The flow forms a high speed bypassing cavitation zone and, changing its direction at the inverse taper, forms a vortex cavitation zone, providing for mixing and grinding the substance up to nanoscale sizes. Methods for intensifying cavitation are also provided.

A mixer arrangement for aftertreatment of exhaust gas including a housing configured to form a cavity including a center flow channel in which the exhaust gas flows; and at least one side inlet arrangement configured to allow the exhaust gas to enter the center flow channel from the sides thereof and configured to cause an advancing center flow in the center flow channel and a rotating flow around or on the edges of the center flow in the center flow channel; wherein the at least one side inlet arrangement contains at least a pair of side inlet pipes on the side of the center flow channel.

A mixer arrangement for an exhaust gas system, having an inlet opening through which an exhaust gas mass flow (A) can be guided, and a mixer for swirling the exhaust gas, which has at least one inflow opening that is fluidically connected to the inlet opening, wherein at least one first portion (A1) of the exhaust gas mass flow (A) can be guided through the mixer via the at least one inflow opening, an injection device by means of which an additive can be injected, and a bypass having at least one throughflow opening which is fluidically connected to the inlet opening and through which a second portion (A2) of the exhaust gas mass flow (A) can be guided past the mixer, there being provided at least one regulating body by means of which a flow cross-section Q in the mixer arrangement can be varied such that a ratio V with (formula I) can be varied.

A mixer arrangement for an exhaust gas system, having an inlet opening through which an exhaust gas mass flow (A) can be guided, and a mixer for swirling the exhaust gas, which has at least one inflow opening that is fluidically connected to the inlet opening, wherein at least one first portion (A1) of the exhaust gas mass flow (A) can be guided through the mixer via the at least one inflow opening, an injection device by means of which an additive can be injected, and a bypass having at least one throughflow opening which is fluidically connected to the inlet opening and through which a second portion (A2) of the exhaust gas mass flow (A) can be guided past the mixer, there being provided at least one regulating body by means of which a flow cross-section Q in the mixer arrangement can be varied such that a ratio V with (formula I) can be varied.

A piping manifold that combines multiple solids fluidizers with a common motive fluid connection and a common slurry discharge connection. The manifold utilizes flexible pipe materials to connect the individual fluidizer feed and discharge connections to a distribution and a collection hub that are combined into a single structure with a common dividing plate between the distribution and collection chambers. An adjustable support structure that allows adjustable positioning of the individual fluidizers without customized design, manufacturing or modification of the manifold.

The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto. In one embodiment, the apparatus is a gas injection assembly disposed between a remote plasma source and a process chamber. The gas injection assembly includes a body, a dielectric liner disposed in the body that defines a gas mixing volume, a first flange to couple the gas injection assembly to a process chamber, and a second flange to couple the gas injection assembly to the remote plasma source. The gas injection assembly further includes one or more gas injection ports formed through the body and the liner.

A vortex mixer may have a vortex mixing chamber having a first wall, a second wall, and a side wall connecting the first wall and the second wall. At least two inlet ports may be configured along the side wall, each inlet port having an inlet channel connected thereto. The at least two inlet ports may be approximately equally spaced around the vortex mixing chamber and configured tangentially to the vortex mixing chamber. An exit port may have an exit channel connected thereto. The exit port may be configured at a radial center of the second wall, and the exit channel may extend from the exit port and away from the vortex mixing chamber.

A vortex mixer may have a vortex mixing chamber having a first wall, a second wall, and a side wall connecting the first wall and the second wall. At least two inlet ports may be configured along the side wall, each inlet port having an inlet channel connected thereto. The at least two inlet ports may be approximately equally spaced around the vortex mixing chamber and configured tangentially to the vortex mixing chamber. An exit port may have an exit channel connected thereto. The exit port may be configured at a radial center of the second wall, and the exit channel may extend from the exit port and away from the vortex mixing chamber.

A cold water saponification method is disclosed. The method is for preferred use in industrial applications such as mining operations wherein saponification of fatty acids is required. Broadly, the method comprises the steps of filling a tank with a solution comprising water, a base and fatty acids, installing a mixer capable of creating a vortex in order to effectively saponify fatty acid particles. The use of a high-shear mixer installed vertically has been proven successful in saponifying fatty acids in cold water.