A gas mixing device includes: a cylindrical portion including an upper surface which is closed; a gas outflow passage formed in a central portion of a bottom surface of the cylindrical portion, and extends downward; a plurality of gas stream guide walls disposed to be spaced apart from each other in a circumferential direction along an edge of an opening formed by the gas outflow passage in the bottom surface, and installed to be rotationally symmetrical to a center of the cylindrical portion, the gas stream guide walls protruding toward the upper surface; and a gas inlet part installed between the gas stream guide walls and an inner peripheral surface of the cylindrical portion, and into which a gas to be mixed flows.

A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.

A mixer structure includes a helical fluid passage includes a first partition and a second partition. The first partition extends intersecting with a cross-sectional center line of the passage, and divides the helical passage into first sub-passages in parallel. The second partition is disposed downstream of the first partition, extends intersecting with the cross-sectional center line, and divides the helical passage into second sub-passages in parallel. A rear or downstream end of the first partition and a front or upstream end of the second partition intersect with each other or are at skew position.

Provided is a supply-liquid producing apparatus capable of producing a supply liquid by an amount needed at a use point.

A supply-liquid producing apparatus includes a mixer that mixes water and ozone gas to produce ozone water; a booster pump that increases the pressure of the water supplied to the mixer; a gas-liquid separation tank that separates the ozone water produced by the mixer into ozone water to be supplied to a use point and exhaust gas to be discharged from an exhaust port; a flowmeter that measures the flow rate of the ozone water supplied from the gas-liquid separation tank to the use point; a flow control unit that adjusts the flow rate of the water supplied to the mixer by controlling the booster pump in response to the flow rate of the ozone water measured by the flowmeter; and an exhaust pressure control unit that controls the exhaust pressure to keep constant the water level in the gas-liquid separation tank.

Even when the flow rate at which liquid is supplied varies, the variation in the resistivity of resistivity-adjusted liquid is suppressed by using a simple structure. The hollow fiber membrane module is sectioned into a liquid-phase region and a gas-phase region by hollow fiber membranes. The liquid-phase region receives liquid L whose resistivity is to be adjusted. The gas-phase region receives adjustment gas G used to adjust a resistivity of the liquid L. The module passage pipe communicates with the liquid-phase region of the hollow fiber membrane module, the liquid supply pipe, and the liquid discharge pipe and passes through the hollow fiber membrane module. The bypass pipe communicates with the liquid supply pipe and the liquid discharge pipe and bypasses the hollow fiber membrane module. The bypass pipe includes a laminarization unit including a plurality of thin tubes thinner than the module passage pipe.

A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.

A gas solution production apparatus 1 includes a gas dissolving unit 5 that dissolves the gas of the second raw material into the liquid of the first raw material to generate a gas solution with a predetermined concentration, and a gas-liquid separation unit 8 that subjects the gas solution to gas-liquid separation into a supply liquid and an exhaust gas. The unit 5 includes a first nozzle 9 that atomizes the liquid of the first raw material, a mist mixing section 11 that mixes the liquid of the first raw material atomized by the nozzle 9 and the gas of the second raw material to generate a gas solution with a higher concentration than a predetermined concentration, and a liquid mixing section 12 that mixes the gas solution with the high concentration and the liquid of the first raw material to generate the gas solution with the predetermined concentration.

A paddle for agitating a plating solution by reciprocating parallel to a surface of a substrate is disclosed. The paddle includes a plurality of vertically-extending agitation rods. Each agitation rod includes: a planar portion perpendicular to a reciprocating direction of the paddle; two slope surfaces extending from side ends of the planar portion in directions closer to each other, the two slope surfaces being symmetric with respect to a center line of the agitation rod, the center line being perpendicular to the planar portion; and a tip portion connected with the two slope surfaces.

Included is a method and system of generating a diffused fluid using a spiral mixer comprising: injecting a first fluid into a first inlet port, generating a first fluid ribbon using a first narrow-gap slot; injecting a second fluid into a second inlet port and generating a second fluid ribbon; combining the first fluid and the second fluid ribbon into a spiraling flow around a cone feature in the mixing chamber of the first spiral mixing block, generating a combined flow of diffused fluids; dividing the combined flow in the mixing chamber of the first flow divider block, generating a divided flow of diffused fluids; combining the divided flow a mixing chamber of the final spiral mixing block, generating a final combined fluid flow in a spiraling flow around a final cone feature; and flowing the final combined fluid flow and dispensing the combined fluid flow onto a substrate.

A chemical liquid preparation method of preparing a TMAH-containing chemical liquid, including, a correspondence relationship preparing step of preparing a correspondence relationship between a supply flow rate ratio between an oxygen-containing gas and an inert-gas-containing gas and a convergent dissolved oxygen concentration in the TMAH-containing chemical liquid that is converged to when the oxygen-containing gas and the inert-gas-containing gas are supplied into the TMAH-containing chemical liquid; a concentration setting step of setting a target dissolved oxygen concentration in the TMAH-containing chemical liquid; a supply-flow-rate-ratio acquiring step of acquiring the supply flow rate ratio between the oxygen-containing gas and the inert-gas-containing gas corresponding to the target dissolved oxygen concentration in accordance with the correspondence relationship prepared in the correspondence relationship preparing step; and a gas supplying step of supplying the oxygen-containing gas and the inert-gas-containing gas with the supply flow rate ratio acquired in the supply-flow-rate-ratio acquiring step.