Patent classifications
B01J4/02
FEED SUPPLY UNIT
A feed supply unit comprising (a) a feed dosage unit for supplying a viscosity unstable liquid feed to a reactor, (b) a flushing unit for flushing at least a part of the feed dosage unit according to (a) with a flushing medium, and (c) a signal transmission means for transmitting a signal from a monitoring means to a control means.
Precursor supply system and precursors supply method
The present invention provides a supply system enabling a precursor of a solid material or a precursor of a liquid material to be supplied to a latter process at no higher concentration than required and also at or above a predetermined concentration. A supply system 1 comprises: a vessel 11 for receiving a precursor material; a vessel heating unit for heating the vessel at a set temperature; a carrier gas heating unit which is disposed in an introduction line L1 and heats a carrier gas; a main measurement unit which is disposed in an outward conduction line L2 and obtains data relating to a gas of the precursor; and a carrier gas temperature control unit for controlling the temperature of the carrier gas heating unit in accordance with a measurement result of the main measurement unit.
Precursor supply system and precursors supply method
The present invention provides a supply system enabling a precursor of a solid material or a precursor of a liquid material to be supplied to a latter process at no higher concentration than required and also at or above a predetermined concentration. A supply system 1 comprises: a vessel 11 for receiving a precursor material; a vessel heating unit for heating the vessel at a set temperature; a carrier gas heating unit which is disposed in an introduction line L1 and heats a carrier gas; a main measurement unit which is disposed in an outward conduction line L2 and obtains data relating to a gas of the precursor; and a carrier gas temperature control unit for controlling the temperature of the carrier gas heating unit in accordance with a measurement result of the main measurement unit.
SYSTEMS, DEVICES, AND METHODS FOR INTRODUCING ADDITIVES TO A PRESSURISED VESSEL
An additive dispensing device for dispensing of additives into a pressurised vessel, more particularly a fermentation vessel of a brewing system, is disclosed. The device has a vessel body including a chamber, the chamber having a closed end and an open end. A pressure release means is provided between the chamber and atmosphere. A controllable valve positioned between the closed end and the open end, configured to selectively open and close a flow path between the closed end and the open end.
SYSTEMS, DEVICES, AND METHODS FOR INTRODUCING ADDITIVES TO A PRESSURISED VESSEL
An additive dispensing device for dispensing of additives into a pressurised vessel, more particularly a fermentation vessel of a brewing system, is disclosed. The device has a vessel body including a chamber, the chamber having a closed end and an open end. A pressure release means is provided between the chamber and atmosphere. A controllable valve positioned between the closed end and the open end, configured to selectively open and close a flow path between the closed end and the open end.
CENTRIC SPRAY PIPE
A centric spray pipe apparatus is disclosed, The centric spray pipe includes a plurality of nozzles designed to provide full coverage of liquid spray to a vessel.
CENTRIC SPRAY PIPE
A centric spray pipe apparatus is disclosed, The centric spray pipe includes a plurality of nozzles designed to provide full coverage of liquid spray to a vessel.
Dosing device for dosing a granular material, spraying device and method for applying a granular material to a substrate
A dosing device for dosing a granular material containing a reservoir for storing the granular material, a dosing disc, and a suction device and a spraying device containing such a dosing device and a method for applying a granular material to a substrate.
Dosing device for dosing a granular material, spraying device and method for applying a granular material to a substrate
A dosing device for dosing a granular material containing a reservoir for storing the granular material, a dosing disc, and a suction device and a spraying device containing such a dosing device and a method for applying a granular material to a substrate.
Liquid level meter, vaporizer equipped with the same, and liquid level detection method
The liquid level meter according to the present invention includes a resistive temperature detector, a temperature measuring body located above it, a temperature detecting unit detecting temperatures of the resistive temperature detector and the temperature measuring body, a current controlling unit determining a current value to be flowed through the resistive temperature detector so that the resistive temperature detector and the temperature measuring body become a predetermined temperature difference, a power supply unit supplying the current of the determined current value to the resistive temperature detector, and a liquid level detecting unit detecting a position of a liquid level. The liquid level detecting unit detects the change in the relative position of the liquid level relative to the resistive temperature detector by determining whether a change width of the current value flowing through the resistive temperature detector during a predetermined period of time is positive or negative, and whether the change width is not less than a predetermined value. As a result, the position of the liquid level can be accurately detected without being affected by the variation in the characteristics of the resistive temperature detector.