Patent classifications
B
B05
B05C
1/00
B05C1/006
B05C1/006
Substrate processing apparatus and substrate processing method
12589403
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2026-03-31
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The invention includes a gas supplier for discharging a gas into a space sandwiched between a substrate and a shielding plate by supplying the gas to a gas discharge nozzle provided in the shielding plate to form a flow of the gas from a central part toward a radially outer side of the substrate. This gas supplier is controlled such that a flow velocity of the gas into a discharge space at a peripheral edge part of the substrate becomes larger than zero.