Patent classifications
B05C3/20
SYSTEM AND METHOD FOR LOCAL SURFACE TREATMENT
The invention relates to a system for the local surface treatment of an aeronautical part (1) to be treated.
Said system is characterised in that it comprises a plurality of containers (18, 19, 20, 21) each comprising a treatment product (22, 23, 24, 25), at least one bath enclosure (102a, 102b) suitable for delimiting a fluid-tight space (26a, 26b) between this bath enclosure (102a, 102b) and a portion (101a, 101b) of the part to be treated, and a controlled circuit (10) for supplying said fluid-tight space (26a, 26b) with treatment product (22, 23, 24, 25) the containers (18, 19, 20, 21) connecting at least this container (18, 19, 20, 21) to said fluid-tight space (26a, 26b) and comprising valves for managing the supply to the fluid-tight space by one or more containers from the plurality of containers.
METHOD AND APPARATUS FOR REPAIRING COMPOSITE MATERIAL USING SOLVATION PROCESS
Disclosed are a method and an apparatus for repairing composite materials using a solvation process, in which, in the repair of composite materials comprising a matrix resin and a filler fiber, a solution capable of depolymerizing the matrix resin is provided to a portion to be repaired of the composite material to depolymerize the matrix resin. By removing the matrix resin constituting the composite material by solvating it with a solvent while leaving the internal filler fibers, it is possible to secure continuity of the fiber skeleton of the composite material even after the repair, perform very easy repair, and minimize damage to the fiber skeleton.
METHOD AND APPARATUS FOR REPAIRING COMPOSITE MATERIAL USING SOLVATION PROCESS
Disclosed are a method and an apparatus for repairing composite materials using a solvation process, in which, in the repair of composite materials comprising a matrix resin and a filler fiber, a solution capable of depolymerizing the matrix resin is provided to a portion to be repaired of the composite material to depolymerize the matrix resin. By removing the matrix resin constituting the composite material by solvating it with a solvent while leaving the internal filler fibers, it is possible to secure continuity of the fiber skeleton of the composite material even after the repair, perform very easy repair, and minimize damage to the fiber skeleton.
Assembly for coloring articles and method of coloring
A coloring system includes an assembly for retaining articles to be colored and an actuator for moving the assembly. The assembly can be translated horizontally, raised and lowered and rotated by the actuator. The coloring system may include a fluid control system that allows gas to be removed from a container of the assembly while the container is immersed in a liquid coloring agent.
Assembly for coloring articles and method of coloring
A coloring system includes an assembly for retaining articles to be colored and an actuator for moving the assembly. The assembly can be translated horizontally, raised and lowered and rotated by the actuator. The coloring system may include a fluid control system that allows gas to be removed from a container of the assembly while the container is immersed in a liquid coloring agent.
Alteration of graphene defects
Technologies are generally described for method and systems effective to at least partially alter a defect in a layer including graphene. In some examples, the methods may include receiving the layer on a substrate where the layer includes at least some graphene and at least some defect areas in the graphene. The defect areas may reveal exposed areas of the substrate. The methods may also include reacting the substrate under sufficient reaction conditions to produce at least one cationic area in at least one of the exposed areas. The methods may further include adhering graphene oxide to the at least one cationic area to produce a graphene oxide layer. The methods may further include reducing the graphene oxide layer to produce at least one altered defect area in the layer.
Alteration of graphene defects
Technologies are generally described for method and systems effective to at least partially alter a defect in a layer including graphene. In some examples, the methods may include receiving the layer on a substrate where the layer includes at least some graphene and at least some defect areas in the graphene. The defect areas may reveal exposed areas of the substrate. The methods may also include reacting the substrate under sufficient reaction conditions to produce at least one cationic area in at least one of the exposed areas. The methods may further include adhering graphene oxide to the at least one cationic area to produce a graphene oxide layer. The methods may further include reducing the graphene oxide layer to produce at least one altered defect area in the layer.
Coating of a glass sleeve
Disclosed is a method of applying a coating to a glass sleeve with an inner surface and an outer surface, the glass sleeve configured as a part of a solar-receiver tube. Thereby, the coating is solely applied to one of the surfaces of the glass sleeve. Also disclosed is a method of fixing such glass sleeve in an interior of a coating tank, such coating tank and a fixing arrangement for fixing such glass sleeve in an interior of a coating tank.
Coating of a glass sleeve
Disclosed is a method of applying a coating to a glass sleeve with an inner surface and an outer surface, the glass sleeve configured as a part of a solar-receiver tube. Thereby, the coating is solely applied to one of the surfaces of the glass sleeve. Also disclosed is a method of fixing such glass sleeve in an interior of a coating tank, such coating tank and a fixing arrangement for fixing such glass sleeve in an interior of a coating tank.
MASK ASSEMBLY FOR TESTING A DEPOSITION PROCESS, DEPOSITION APPARATUS INCLUDING THE MASK ASSEMBLY, AND TESTING METHOD FOR A DEPOSITION PROCESS USING THE MASK ASSEMBLY
A deposition apparatus includes deposition sources, a deposition chamber, a mask assembly, and a transfer unit. The mask assembly includes a support member, a shutter member, and a drive member. The support member has a first opening configured to allow the deposition materials to pass through while supporting the base substrate on which the passed-through deposition materials are deposited. The shutter member is accommodated in the support member and has a second opening smaller than the first opening. The drive member is configured to change a position of the second opening with respect to the base substrate in accordance with the movement of the mask assembly.