A surface treating apparatus that suppresses occurrence of defects is provided. A treatment solution is accumulated in a tank 15 through a treatment solution collecting port/air discharging port 13 in a lower portion of a body 4. An air heated by the treatment solution flows toward an upper portion (portion without the treatment solution) of the tank 15 via the treatment solution collecting port/air discharging port 13 in the lower portion of the body 4, and is discharged via an exhaust duct 17. In this way, the air that is heated and tends to flow upward in the body 4 is discharged from the lower portion thereof and is replaced with an external air from the upper portion thereof. Accordingly, the air in the body 4 can be maintained at a uniform temperature. Thus, the treatment solution that reaches a lower portion of a substrate 54 from an upper portion thereof can be maintained at a uniform temperature. The air is caused to flow toward the lower portion from the upper portion in the body 4, so that the substrate 54 is pulled downward, and swinging of the substrate 54 can thus be reduced. Therefore, the substrate 54 can be less likely to contact an inlet 44 and an outlet 46.

A surface treating apparatus that suppresses occurrence of defects is provided. A treatment solution is accumulated in a tank 15 through a treatment solution collecting port/air discharging port 13 in a lower portion of a body 4. An air heated by the treatment solution flows toward an upper portion (portion without the treatment solution) of the tank 15 via the treatment solution collecting port/air discharging port 13 in the lower portion of the body 4, and is discharged via an exhaust duct 17. In this way, the air that is heated and tends to flow upward in the body 4 is discharged from the lower portion thereof and is replaced with an external air from the upper portion thereof. Accordingly, the air in the body 4 can be maintained at a uniform temperature. Thus, the treatment solution that reaches a lower portion of a substrate 54 from an upper portion thereof can be maintained at a uniform temperature. The air is caused to flow toward the lower portion from the upper portion in the body 4, so that the substrate 54 is pulled downward, and swinging of the substrate 54 can thus be reduced. Therefore, the substrate 54 can be less likely to contact an inlet 44 and an outlet 46.

To provide a viscous material supply device facilitating removal operation of viscous material that could be adhered to a platen, a covering sheet used in the viscous material supply device, and a viscous material supply method. A viscous material supply device can include a tank provided with a storage space storing viscous material; a piston slidably inserted into the tank, and is provided with a pressing surface that presses the viscous material and a suction passage through which the viscous material inside the tank flows by pressing force of the pressing surface; and a covering sheet including a covering part covering the pressing surface in the piston and a communication hole communicating with the suction passage.

A mud pumping apparatus that can be removably coupled to a container the mud was originally provided in when first obtained by the user. The mud may be mastic, mortar, grout, joint compound, spackle, or the like. The apparatus may be sized to be used with various standard sized containers, and adjustably powered and controllable to be used with different types, consistencies, and viscosities of spreadable material.

A mud pumping apparatus that can be removably coupled to a container the mud was originally provided in when first obtained by the user. The mud may be mastic, mortar, grout, joint compound, spackle, or the like. The apparatus may be sized to be used with various standard sized containers, and adjustably powered and controllable to be used with different types, consistencies, and viscosities of spreadable material.

A wiping solution dispenser utilizes a motorized dispenser mechanism that moves a nozzle back and forth along a stroke to dispense a wide band of wiping solution onto toilet tissue. A motor may be coupled with a nozzle that moves back and forth or rotates about a pivot point to dispense a band of wiping solution. Wiping solution may be within a solution container that is configured for insertion into the dispenser housing and may be automatically ruptured by a puncture feature. A pump may force the wiping solution from the nozzle, or the solution may be gravity fed. A motion detector may be incorporated to control the actuation and dispensing of the solution. A near field communication transceiver may be used to receive payment before solution is dispensed.

A wiping solution dispenser utilizes a motorized dispenser mechanism that moves a nozzle back and forth along a stroke to dispense a wide band of wiping solution onto toilet tissue. A motor may be coupled with a nozzle that moves back and forth or rotates about a pivot point to dispense a band of wiping solution. Wiping solution may be within a solution container that is configured for insertion into the dispenser housing and may be automatically ruptured by a puncture feature. A pump may force the wiping solution from the nozzle, or the solution may be gravity fed. A motion detector may be incorporated to control the actuation and dispensing of the solution. A near field communication transceiver may be used to receive payment before solution is dispensed.

A system for applying a product (3) by roller is disclosed. The system has an applicator roller (1) for applying a product (3) on a substrate (4) and a first dosing roller (2) for dosing said product (3) on the surface of the applicator roller (1), wherein the system comprises at least one second dosing roller (2) configured to fine-tune the dosing performed by the first dosing roller (2), thereby adjusting the amount of product (3) dosed on the surface of the applicator roller (1).

A system for applying a product (3) by roller is disclosed. The system has an applicator roller (1) for applying a product (3) on a substrate (4) and a first dosing roller (2) for dosing said product (3) on the surface of the applicator roller (1), wherein the system comprises at least one second dosing roller (2) configured to fine-tune the dosing performed by the first dosing roller (2), thereby adjusting the amount of product (3) dosed on the surface of the applicator roller (1).

An applicator is disclosed for applying sealant to a moving substrate. The applicator includes a wheel having a periphery. A plurality of spaced apart footprints extends around the periphery of the wheel and each footprint has a sealant receiving feature. A reservoir is provided for containing a supply of sealant to be applied to the moving substrate. The wheel is rotatably mounted at least partially in the reservoir such that as the wheel rotates, each of the spaced apart footprints repeatedly moves through a supply of sealant in the reservoir to pick up a charge of sealant, around one side of the wheel toward the moving substrate, adjacent the moving substrate to transfer the sealant charge to the substrate, and around the other side of the wheel back toward the supply of sealant. At least one stop is formed on each of the footprints for inhibiting sealant picked up by the footprint from being urged rearwardly on the footprint by high speed rotation of the wheel. A backstop may be formed at a trailing end of each footprint and mid-stops may be formed between a leading end of each footprint and the trailing end.