Implementations described herein relate to apparatus and methods for self-assembled monolayer (SAM) deposition. Apparatus described herein includes processing chambers having various vapor phase delivery apparatus fluidly coupled thereto. SAM precursors may be delivered to process volumes of the chambers via various apparatus which is heated to maintain the precursors in vapor phase. In one implementation, a first ampoule or vaporizer configured to deliver a SAM precursor may be fluidly coupled to the process volume of a process chamber. A second ampoule or vaporizer configured to deliver a material different from the SAM precursor may also be fluidly coupled to the process volume of the process chamber.

Protective coatings, including moisture-resistant coatings, that include two or more different types of moisture-resistant materials are disclosed, as are moisture-sensitive substrates that include such protective coatings. Moisture-sensitive substrates that include different types of moisture-resistant coatings on different elements are also disclosed.

A method of manufacturing a semiconductor includes adjusting a temperature of a substrate having a recess formed therein and accommodated in a container to a temperature within a range of 200 degrees C. or higher and 280 degrees or lower, and laminating a polyurea film in the recess in the substrate by supplying isocyanate gas and amine gas into the container.

A derivatization apparatus and method for coating a sample carrier with a reagent solution. The derivatization apparatus consists of a closed system in which a small quantity of reagent solution is sprayed into a closed container via a spray nozzle. A sample carrier is located in the closed container and is coated as homogeneously as possible with the reagent solution.

The present invention is directed to a thermoplastic packaging film coated with an antimicrobial coating, a method for the preparation of the coated film and packaging articles made with the film.

Aspects of the inventive concepts provide a cleaning apparatus and a substrate processing system including the same. The cleaning apparatus includes a chuck receiving a substrate, a first nozzle providing first cleaning water or a first organic solvent onto the substrate at a first pressure, and a second nozzle disposed adjacent to the first nozzle. The second nozzle provides a cleaning solution including second cleaning water and a second organic solvent onto the substrate at a second pressure lower than the first pressure.

Urethane (multi)-(meth)acrylate (multi)-silane compositions, and articles including a (co)polymer reaction product of at least one urethane (multi)-(meth)acrylate (multi)-silane precursor compound. The disclosure also articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urethane (multi) (meth)acrylate (multi)-silane precursor compound. The substrate may be a (co)polymeric film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof. Methods of making urethane (multi)-(meth)acrylate (multi)-silane precursor compounds and their use in composite multilayer barrier films are also described. Methods of using such barrier films in articles selected from a solid state lighting device, a display device, and combinations thereof, are also described.

The present invention provides a heating device for evaporation of an OLED material, which includes a crucible (1) for receiving and containing therein an OLED material (10), a lower heating coil (2) surrounding outside an outer circumference of the body section (11) of the crucible (1), an upper heating coil (3) surrounding outside an outer circumference of the top cover section (13) of the crucible (1), a lower thermally conductive temperature homogenizing sleeve (4) arranged between the body section (11) and the lower heating coil (2), an upper thermally conductive temperature homogenizing sleeve (5) arranged between the top cover section (13) and the upper heating coil (3), and a thermal insulation ring (6) arranged between the upper and lower thermally conductive temperature homogenizing sleeves (5, 4). The upper and lower heating coils (3, 2) are each connected to a power supply for individually controlling a heating temperature of each of the top cover section (13) and the body section (11). The heating device prevents gaseous molecules of the OLED material (10) from getting condensed and solidified at a gas release hole (131) of the crucible (1) so as to prevent jamming and blocking of the gas release hole (131).

A method of forming a process film includes the following operations. A substrate is transferred into a process chamber having an interior surface. A process film is formed over the substrate, and the process film is also formed on the interior surface of the process chamber. The substrate is transferred out of the process chamber. A non-process film is formed on the interior surface of the process chamber. In some embodiments, porosity of the process film is greater than a porosity of the non-process film.

A component of an internal combustion engine with anti-fouling (e.g., anti-coking) properties, said component comprising a metal surface; a plasma deposition formed layer comprising silicon, oxygen, and hydrogen on at least a portion of said metal surface; and an anti-fouling coating, of an at least partially fluorinated composition comprising at least one silane group, on at least a portion of a surface of said layer.