The present application discloses forming self-assembled monolayers (SAMs) by exposing the substrate at least twice to SAM precursors with intervening cooling of a substrate.

The present application discloses forming self-assembled monolayers (SAMs) by exposing the substrate at least twice to SAM precursors with intervening cooling of a substrate.

An embodiment includes a system comprising: a monolithic shape memory polymer (SMP) foam having first and second states; wherein the SMP foam includes: (a) polyurethane, (b) an inner half portion having inner reticulated cells defined by inner struts, (c) an outer half portion, having outer reticulated cells defined by outer struts, surrounding the inner portion in a plane that provides a cross-section of the SMP foam, (d) hydroxyl groups chemically bound to outer surfaces of both the inner and outer struts. Other embodiments are discussed herein.

Provided are certain silicon precursor compounds which are useful in the formation of silicon-containing films in the manufacture of semiconductor devices, and more specifically to compositions and methods for forming such silicon-containing films, such as films comprising silicon, silicon nitride, silicon oxynitride, silicon dioxide, a carbon-doped silicon nitride, or a carbon-doped silicon oxynitride film.

A vessel has a lumen defined at least in part by a wall. The wall has an interior surface facing the lumen, an outer surface, and a plasma-enhanced chemical vapor deposition (PECVD) coating set supported by the wall. The PECVD coating set comprises a water barrier coating or layer having a water contact angle from 80 to 180 degrees, applied using a precursor comprising at least one of a saturated or unsaturated fluorocarbon precursor having from 1 to 6 carbon atoms and a saturated or unsaturated hydrocarbon having from 1 to 6 carbon atoms. Optionally, the coating set includes an SiOx gas barrier coating or layer from 2 to 1000 nm thick, in which x is from 1.5 to 2.9 as measured by x-ray photoelectron spectroscopy (XPS), and optionally other related coatings.

Embodiments of the invention provide methods and materials for making analyte sensors having a plurality of layered elements such as amperometric glucose sensors that are used by diabetic individuals to monitor blood sugar concentrations. Embodiments of the invention utilize plasma deposition technologies to form thin films of hexamethyldisiloxane useful in such sensors. Sensors that incorporate the thin film compositions formed by these processes exhibit a number of desirable characteristics.

An inhaler comprising a valve having a valve volume of no more than 40 micro liters and a valve having a first layer comprising a silane and a second layer comprising a polyfluoropolyether silane—and albuterol.

A polymeric substrate and a method of providing same includes providing a protection system of one or more layers on at least one first surface of the polymeric substrate, coating a spectrally controlling system on a surface of the protection system to provide an external surface, the spectrally controlling system comprising at least a light absorbing or a light reflecting layer, partially removing the spectrally controlling system from the external surface until reaching the at least one first surface of the protection system creating in the spectrally controlling system an area free of the light absorbing or light reflecting layer of the spectrally controlling system, and covering the area by depositing at least one or more substances in droplets.

A method for altering adhesion properties of a surface of a substrate by a coating, comprising the steps of: a) ionizing a plasma gas at low temperature and at atmospheric pressure, thereby creating a plasma with a plasma temperature of at most 50° C.; b) introducing a precursor into a plasma gas afterglow of the plasma; c) subjecting the surface of the substrate to the plasma including the precursor, thereby forming a coating onto the surface. The plasma gas is essentially completely comprised of inert gas. The coating alters the adhesion properties of the surface.

The disclosure provides an apparatus for depositing poly(p-xylylene) onto a component. The apparatus comprises a deposition chamber configured to receive a component to be coated therein; an electrical power supply; a platen, disposed inside the deposition chamber and comprising an electrically conductive material, wherein the platen is electrically connected to the electrical power supply and configured to support the component; a monomer reservoir, configured to receive a monomer of poly(p-xylylene) therein; a monomer conduit extending between the monomer reservoir and the deposition chamber; and a heating means configured to heat the monomer reservoir and the monomer conduit to a temperature of between 25 and 250° C.