A method of treating a polymer surface using conventional plasma nitriding, and a nitrided polymer surface obtained thereby. The method comprises introducing nitrogen into the polymer surface using conventional plasma nitriding, and optionally functionalizing the nitrided polymer surface with a molecule, such as an antimicrobial moiety, which is capable of forming a covalent bond with the nitrogen atoms within the polymer surface.

A modification method of a surface of a base includes applying a composition on a surface layer of a base to form a coating film. The surface layer contains a metal atom. The coating is heated. The composition contains a polymer and a solvent. The polymer includes at an end of a main chain or at an end of a side chain thereof, a functional group that is at least one selected from: a group represented by the following formula (1); a group containing a carbon-carbon triple bond; and a group containing an aromatic hydroxy group. In the formula (1), R.sup.1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 1 to 10, wherein in a case in which n is no less than 2, a plurality of R.sup.1s are identical or different. ##STR00001##

A coated glass element includes: a glass surface; and a coating that coats at least part of the glass surface. The coating includes at least one layer. The at least one layer of the coating fulfills the following parameter: [Si.sub.2C.sub.5H.sub.15O.sub.2.sup.−].sub.20/[Si.sub.2C.sub.5H.sub.15O.sub.2.sup.−].sub.80≥1.0. [Si.sub.2C.sub.5H.sub.15O.sub.2.sup.−].sub.20 are counts of [Si.sub.2C.sub.5H.sub.15O.sub.2] ions, measured by a time-of-flight secondary ion mass spectrometry (TOF-SIMS), at 20% of a time a sputter gun beam needs to reach the glass surface and [Si.sub.2C.sub.5H.sub.15O.sub.2.sup.−].sub.80 are counts of [Si.sub.2C.sub.5H.sub.15O.sub.2.sup.−].sub.80 ions, measured by a TOF-SIMS, at 80% of a time a sputter gun beam needs to reach the glass surface.

A gas blocking layer forming apparatus comprises a vacuum chamber that provides a space where a chemical vapor deposition process and a sputtering process are performed; a holding unit that is provided at a lower side within the vacuum chamber and mounts thereon a target object on which an organic/inorganic mixed multilayer gas blocking layer is formed; a neutral particle generation unit that is provided at an upper side within the vacuum chamber and generates a neutral particle beam having a high-density flux with a current density of about 10 A/m.sup.2 or more; and common sputtering devices that are provided at both sides of the neutral particle generation unit, wherein each common sputtering device has a sputtering target of which a surface is inclined toward a surface of the target object.

Methods, systems and apparatuses are disclosed for depositing a substantially transparent film coating onto a substantially transparent substrate via atmospheric pressure plasma deposition techniques and apparatuses.

An electrical assembly which comprises a substrate and a conformal coating deposited on at least one surface of the substrate by plasma polymerization of a compound of formula (I) and deposition of a resulting polymer of the compound of formula (I), and plasma polymerization of a fluorohydrocarbon and deposition of a resulting polymer of the fluorohydrocarbon, such that the resulting polymer of the compound of formula (I) and the resulting polymer of the fluorohydrocarbon create discrete layers of the conformal coating; wherein the compound of formula (I) is an organic compound.

A chemical vapor deposition method for producing a dielectric film, the method comprising: providing a substrate into a reaction chamber; introducing gaseous reagents into the reaction chamber wherein the gaseous reagents comprise a silicon precursor comprising an silicon compound having Formula I as defined herein and applying energy to the gaseous reagents in the reaction chamber to induce reaction of the gaseous reagents to deposit a film on the substrate. The film as deposited is suitable for its intended use without an optional additional cure step applied to the as-deposited film.

A method of forming a polysiloxane film on a substrate comprises polymerizing a siloxane monomer in a reaction chamber containing the substrate. The polymerization is catalyzed by a 30-60 W radio frequency plasma, the pressure in the reaction chamber during the polymerization is 100-400 mTorr, the residence time of the siloxane monomer in the reaction chamber is 5-120 minutes, the siloxane monomer is heated to 30-200° C. before entering the reaction chamber, and the polymerization is carried out at a temperature of 30-100° C.

The present disclosure provides a water-resistant nanofilm, a preparation method and an article thereof, in which fluorocarbon gas is used as a plasma source and is formed on a substrate surface of substrate by a plasma enhanced chemical vapor deposition method, so that the water-resistance performance of the substrate surface is improved.

Ophthalmic devices coated with an active agent eluting coating are provided herein. Placement of the coated ophthalmic devices on the surface of eye results in modulation of cells responding to an immune modifying agent and reducing inflammation-related complications in the eye. Methods for treating ocular disorders are also provided herein. The disclosed subject matter is based, in part, on the discovery that ophthalmic devices coated with a cytokine eluting coating can shift early-stage macrophage polarization associated with alleviation of symptoms and causes of inflammatory ocular disorders.