An all-in-one cleaner is disclosed. An all-in-one cleaner, according to an embodiment of the present invention, comprises: a cleaner body; a soaking unit which is provided on one side of the cleaner body and carries out a soaking step on a subject to be cleaned; a washing unit which is provided near the soaking unit and carries out a washing step on the subject to be cleaned, for which the soaking step has been completed; and a rinsing unit which is provided near the washing unit and carries out a rinsing step on the subject to be cleaned, for which the washing step has been completed.

The present disclosure provides an apparatus for manufacturing a superfine fiber roll wiper for a cleanroom, wherein a thermal cutting unit including thermal cutting blocks and thermal cutters is applied to a thermal cutting part, such that a process of manufacturing a roll wiper and a process of thermally bonding both ends of the manufactured roll wiper may be performed by the single apparatus, as a result of which, with the use of the single apparatus, it is possible to considerably improve workability, implement the mass-production, and reduce manufacturing costs. Further, the thermal cutting unit further including interval adjustment blocks in addition to the thermal cutting blocks and the thermal cutters is applied, such that a width of a roll wiper to be manufactured may be selectively and conveniently adjusted when a change in width of the roll wiper is required.

A cleaning wafer or substrate for use in cleaning, or in combination with, components of, for example, integrated chip manufacturing apparatus. The cleaning substrate can include a substrate having varying predetermined surface features, such as one or more predetermined adhesive, non-tacky, electrostatic, projection, depression, or other physical sections. The predetermined features can provide for more effective cleaning of the components with which they are used, such as an integrated chip manufacturing apparatus in the place of the integrated chip wafer. The cleaning substrate can be urged into cleaning or other position by vacuum, mechanical, electrostatic, or other forces. The cleaning substrate can adapted to accomplish a variety of functions, including abrading or polishing. The cleaning substrate may be made by a novel method of making, and it may then be used in a novel method of use I combination with chip manufacturing apparatus.

A device for cleaning an optical communication device includes a hollow outer stem, an inner stem core, a locking handle, a flexible base, at least one ring seal, and a flexible cover. The inner stem core, fits within a length of the hollow outer stem and is slidable along the length of the hollow outer stem. The locking handle is coupled to a top end of the inner stem core, and is movable between a released position and a locked position, where moving the locking handle to the locked position from the released position slides the inner stem core within the hollow outer stem. The flexible base is coupled to a bottom end of the hollow outer stem, and is transformable between a contracted position when the locking handle is in the released position and an expanded position when the locking handle is in the locked position. The at least one ring seal is coupled to the flexible base. The flexible cover is wrapped around the flexible base and the at least one ring seal.

To provide a connector cleaning tool capable of precisely removing dust even on an end surface of a connector having irregularities. The connector cleaning tool includes a buffer body, and an adhesive body arranged with the buffer body, in which in a case where the connector cleaning tool is pressed toward a connection end surface of a connector on which a guide pin is protrudingly provided, the guide pin is inserted into the buffer body via the adhesive body.

In an example, a port cleaner may include a body having a fluid aperture extending into the body. The fluid aperture may extend into a surface of the body. The port cleaner may also include a fluid channel disposed, at least partially, within the body and may be in fluid communication with the fluid aperture. The port cleaner may further include a wiper or contact wiper engaged with the fluid channel and movable between a lowered position and a raised position. The contact wiper may extend from a surface of the body when disposed in the raised position.

Embodiments of the present invention are directed to a method for cleaning a wind turbine blade or a solar panel with a wind cinch device. The method includes applying a cleaning solution to a surface of a wind turbine blade or solar panel; affixing a wind cinch device around a high point of the wind turbine blade or solar panel; applying tension to one or more lines attached to the wind cinch device to control the pressure the wind cinch device applies to the surface of the wind turbine blade or solar panel; and applying tension to the one or more lines attached to the wind cinch device to pull the wind cinch device from the high point on the wind turbine blade or solar panel to a low point on the wind turbine blade or solar panel. Other embodiments of the present invention are directed to a Wind Cinch device. The Wind Cinch device includes a main body, the main body being an elongated member having a cleaning surface sufficient in length to form a loop around a wind turbine blade when wrapped around a wind turbine blade. The Wind Cinch device also includes a plurality of rigging points, each rigging point adapted to receive a line. Applying tension to one or more of the lines attached to the rigging points changes the circumference of the loop formed by wrapping the wind cinch device around the wind turbine blade.

A method for efficiently decontaminating surfaces is provided comprising applying an indicator to a surface wherein the indicator provides an observable or machine readable response when a contamination is present on the surface, wherein the response is located relative to a location of the contamination; and decontaminating the location of the contamination, and optionally rechecking the location of the initial contamination post decontamination to ensure that the surface is free of contamination.

An example cleaning station for a liquid electrophotographic printer is provided. The cleaning station has a sponge arranged to remove particles from a photo imaging plate of the printer, a fluid supply arranged to apply cleaning fluid to the sponge, a squeezing component arranged to squeeze the sponge in order to remove cleaning fluid and particles from the sponge, and a charging component arranged to electrically charge the squeezing component such that particles are attracted from the sponge to the squeezing component. The squeezing component is electrically isolated within the cleaning station.

A liquid treatment system comprising at least one ultra-violet light treatment lamp arranged within an elongated protective UV-transparent sleeve provided along a central longitudinal axis A, said sleeve having an outer surface and an essentially circular cross-sectional shape; and an elongated reactor configured to receive said sleeve, whereby an elongated liquid treatment chamber for receiving liquid to be treated, is provided between an inner surface of the reactor and the outer surface of the sleeve; wherein said liquid treatment system further comprises at least one cleaning arrangement comprising at least one cleaning device, wherein said cleaning arrangement is configured to compress said cleaning device towards the outer surface of the sleeve and to transfer the cleaning device over the sleeve surface for cleaning the outer surface of the sleeve, wherein the at least one cleaning device comprises at least one metal braid.