B08B1/20

Doctor blade handling system
10569293 · 2020-02-25 · ·

A doctoring apparatus has a flexible doctor blade advanced longitudinally across a surface being doctored. The doctor blade is feed in a continuous length from a storage cartridge and sequentially supported in a blade holder to apply the blade to a moving surface to be doctored. One or both of a pneumatic blade advancing device and a pneumatically operated clamping system are opened and closed in timed sequence with reciprocation of the blade holder longitudinally shifting the doctor blade in a selected direction across the doctored surface. The pneumatic blade advancing device includes an idler roller and a powered roller that co-operate to indexingly advance the doctor blade along the blade path. The clamping system includes a blade cutter to cut the doctor blade and that drives the cut off end of the doctor blade into a discard container.

SANITIZING SYSTEM WITH A PLURALITY OF MODULAR TREATMENT STATIONS
20200055095 · 2020-02-20 ·

A sanitizing system has a conveyor system, an elevator system, a control system, a plurality of height sensors, and a plurality of modular treatment stations for sanitizing and cleaning support objects infested with at least one contaminant. The plurality of modular treatment stations include an ultraviolet light treatment station, a steam treatment station, a vacuum treatment station, a heat treatment station, and a pair of ozone generators. The sanitizing system sanitizes and cleans support objects infested with at least one contaminant.

APPARATUS AND METHOD FOR WAFER CLEANING

The present disclosure relates to an apparatus and a method for wafer cleaning. The apparatus can include a wafer holder configured to hold a wafer; a cleaning nozzle configured to dispense a cleaning fluid onto a first surface (e.g., front surface) of the wafer; and a cleaning brush configured to clean a second surface (e.g., back surface) of the wafer. Using the cleaning fluid, the cleaning brush can clean the second surface of the wafer with a scrubbing motion and ultrasonic vibration.

WIPER BLADE POSITIONS

In an example, a wiper system includes a first wiper blade, a second wiper blade, and a cam. In that example, the cam is coupled to the first wiper blade to move the first wiper blade to a first wipe position when the cam is in a first cam position and coupled to the second wiper blade to move the second wiper blade to a second wipe position when the cam is in a second cam position.

BOTTLE-PROCESSING MACHINE AND METHOD FOR CLEANING THE PUMP/NOZZLE PROTECTOR OF THE BOTTLE-PROCESSING MACHINE
20200047092 · 2020-02-13 ·

The present disclosure relates to a bottle treatment machine including a pump/nozzle protector in the form of a screen. The screen includes an at least partially perforated surface and the screen is provided for passing a liquid of the bottle treatment machine therethrough. The bottle treatment machine further includes at least one scraper which rests at least partially on the at least partially perforated surface of the screen. The screen and the at least one scraper are arranged to be rotatable relative to one another. The present disclosure further relates to a method for cleaning the screen of the bottle treatment machine.

Substrate treatment method and substrate treatment device
10546763 · 2020-01-28 · ·

In parallel with a lower-side scrub cleaning step where a brush is contacted with a lower surface inclined portion of a substrate, a center-side spray cleaning step is performed where a collision position of liquid droplets with respect to an upper surface of the substrate is moved between the center of the substrate and the middle of the substrate while the liquid droplets collide with the upper surface of the substrate. Thereafter, in parallel with an upper-side scrub cleaning step where the brush is contacted with an upper surface inclined portion of the substrate, an outer circumference-side spray cleaning step is performed where the collision position of the liquid droplets with respect to the upper surface of the substrate is moved between the middle of the substrate and the outer circumference of the substrate while the liquid droplets collide with the upper surface of the substrate.

SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND PROGRAM RECORDING MEDIUM
20200020563 · 2020-01-16 ·

A substrate processing apparatus performs brush cleaning of a substrate. The substrate processing apparatus includes a spin base provided rotatably about a rotation axis, a spin base rotation mechanism that rotates the spin base, and a plurality of first chuck pins provided in the spin base, the first chuck pins being switchable between an opened state and a closed state and capable of clamping an end portion of the substrate from a side surface thereof in the closed state. An upper surface of each of the plurality of first chuck pins has a height the same as or lower than an upper surface of the substrate in the closed state where the end portion of the substrate is clamped.

CLEANING ASSEMBLY AND METHOD FOR A SHAFT
20200009622 · 2020-01-09 ·

A cylinder assembly comprising at least one tubular section with an open end and an opposite end closed by a cylinder head, the tubular section comprising a tubular member, the cylinder assembly further comprising a shaver secured to an inner wall of the cylinder head; and the shaver having an edge having a round profile, with a curvature radius comprised in a range between 0.0002 and 0.002, an inner diameter equal to an outer diameter of the tubular member and a surface hardness at least equal to a hardness of the surface of the tubular member.

Cleaning Pad Washing

A cleaning station for a mobile robot includes a fluid vessel and a roller arranged in the fluid vessel. The fluid vessel is shaped to hold a cleaning fluid that at least partially submerges the roller. The cleaning station includes a control system configured to, when the mobile robot is docked at the cleaning station, cause rotation of the roller to direct cleaning fluid from the fluid vessel to a cleaning pad of the mobile robot in order to release debris from the cleaning pad.

SYSTEMS AND METHODS FOR REMOVING VISCOUS MATERIALS IN METAL ARTICLE PROCESSING

Provided herein are systems and methods for removing a viscous material from a material article. In particular, a viscous material removal system can include a seal and a biasing mechanism. The viscous material removal system can also serve as a viscous material containment system. The systems can provide viscous material removal from planar and non-planar articles, as well as articles having surface irregularities or a topography including ridges and valleys. A method for removing viscous materials can include contacting the seal to the material article, maintaining contact of the seal across a width of the material article via the biasing mechanism, and passing the material article over the seal, thus removing the viscous material from the material article.