A deposition system is provided capable of cleaning itself by removing a target material deposited on a surface of a collimator. The deposition system in accordance with the present disclosure includes a substrate process chamber. The deposition includes a substrate pedestal in the substrate process chamber, the substrate pedestal configured to support a substrate, a target enclosing the substrate process chamber, and a collimator having a plurality of hollow structures disposed between the target and the substrate, a vibration generating unit, and cleaning gas outlet.

In some implementations, the power plant may include an array having 200 or more modules. In addition, the array may have conterminous modules. Arrays may include modules having a contact point that rests on the ground or a contact surface of one or more structures. In some implementations, 90% of the power-plant arrays have 800 or more modules. In some plants, the ground supports 90 percent of the conterminous modules. In some plants, neither the plants nor the arrays do not contain stowing functionality or extreme dampening functionality.

A cleaning machine and a cleaning method for a photomask pellicle are provided. The cleaning machine at least includes: an air knife and a cleaning device. The air knife is configured to blow away contamination particles on the surface of the photomask pellicle. The cleaning device is configured to spray cleaning liquid to the surface of the photomask pellicle, to weather the contamination particles failed to be blown away by the air knife through the volatilization of the cleaning liquid. The air knife is also configured to blow away the weathered contamination particles.

A cleaning machine and a cleaning method for a photomask pellicle are provided. The cleaning machine at least includes: an air knife and a cleaning device. The air knife is configured to blow away contamination particles on the surface of the photomask pellicle. The cleaning device is configured to spray cleaning liquid to the surface of the photomask pellicle, to weather the contamination particles failed to be blown away by the air knife through the volatilization of the cleaning liquid. The air knife is also configured to blow away the weathered contamination particles.

An underwater remote cleaning device includes a submersible assembly, a cleaning conduit, and a thruster conduit. The submersible assembly has an upper frame and a lower frame spaced-apart from each other and at least one vertically extending element having a first end and a second end. The first end of the vertically extending element is engaged to the upper frame and the second end of the vertically extending element is engaged to the lower frame. The cleaning conduit is disposed within the submersible assembly with an inlet for receiving a liquid and at least one nozzle disposed on the cleaning conduit for spraying the liquid. The thruster conduit is disposed within the submersible assembly with an inlet for receiving a liquid and at least one nozzle disposed on the cleaning conduit for spraying the liquid.

An underwater remote cleaning device includes a submersible assembly, a cleaning conduit, and a thruster conduit. The submersible assembly has an upper frame and a lower frame spaced-apart from each other and at least one vertically extending element having a first end and a second end. The first end of the vertically extending element is engaged to the upper frame and the second end of the vertically extending element is engaged to the lower frame. The cleaning conduit is disposed within the submersible assembly with an inlet for receiving a liquid and at least one nozzle disposed on the cleaning conduit for spraying the liquid. The thruster conduit is disposed within the submersible assembly with an inlet for receiving a liquid and at least one nozzle disposed on the cleaning conduit for spraying the liquid.

A method for cleaning a first electrospray emitter of a mass spectrometer comprises: changing an operating mode of the first electrospray emitter from a stable jet mode of operation to a dripping or pulsating mode of operation by lowering a magnitude of a voltage applied between a counter electrode and the first electrospray emitter, |V.sub.1|; moving the first electrospray emitter from a first emitter position from which electrospray ions are delivered to a mass spectrometer inlet to a second emitter position and, simultaneously, moving a second electrospray emitter from a third emitter position to a fourth emitter position; causing a cleaning solvent to flow through the first electrospray emitter at least until a droplet of the cleaning solvent forms on an exterior surface of the first electrospray emitter while operating the electrospray emitter in the dripping mode of operation; and causing the droplet to dislodge from the emitter exterior.

A method for cleaning a first electrospray emitter of a mass spectrometer comprises: changing an operating mode of the first electrospray emitter from a stable jet mode of operation to a dripping or pulsating mode of operation by lowering a magnitude of a voltage applied between a counter electrode and the first electrospray emitter, |V.sub.1|; moving the first electrospray emitter from a first emitter position from which electrospray ions are delivered to a mass spectrometer inlet to a second emitter position and, simultaneously, moving a second electrospray emitter from a third emitter position to a fourth emitter position; causing a cleaning solvent to flow through the first electrospray emitter at least until a droplet of the cleaning solvent forms on an exterior surface of the first electrospray emitter while operating the electrospray emitter in the dripping mode of operation; and causing the droplet to dislodge from the emitter exterior.

Methods and apparatus are disclosed for a coupling nozzle for cryogenic fluid. An example nozzle includes a flow body defining a conduit. The flow body is configured to permit cryogenic fluid to flow through the conduit. The nozzle includes a mounting ring through which the flow body slidably extends and a bushing fixedly positioned adjacent the mounting ring. The bushing slidably receives the flow body in a keyed manner to prevent rotation of the flow body. The nozzle includes a flow control assembly at least partially disposed in the conduit of the flow body. The flow control assembly is configured to permit the cryogenic fluid to flow through the flow body in an open position and prevent the cryogenic fluid from flowing through the flow body in a closed position.

The present disclosure relates to an optical fiber processing apparatus. The optical fiber processing apparatus comprising: a fixing module for fixing an optical fiber; and a stripping module for stripping layers outside an uncoated bare fiber of the optical fiber, The stripping module may comprise a stripping member which comprises two bodies arranged in parallel. Each body is provided with two or more kinds of blades suitable for stripping different sizes of layers outside the uncoated bare fiber, and each body is configured to be rotatable about its longitudinal axis to select different blades among the two or more kinds of blades, thereby enabling the stripping member to strip two or more sizes of layers outside the uncoated bare fiber.