A method of cleaning an evaporator that includes at least one heat transfer element for the evaporation of water, comprising forming a sacrificial layer of a first material on a surface of the heat transfer element (1); evaporating water that includes a second material to deposit the second material on top of the sacrificial layer (2, 3); and cleaning the evaporator by removing both the sacrificial layer formed on the heat transfer element and the second layer formed on top of the sacrificial layer; wherein the first material is more easily removed from the heat transfer element than the second material (4).

An antibacterial cleaning composition for hard surfaces is made from a flexible superabsorbent material and an antibacterial agent. The composition can be applied to various liquid and solid surface contaminants, including blood, vomit, fecal matter, urine, glass, food, etc. The composition may be applied to the contaminated hard surface by several methods including pouring, rolling, spraying or foaming. Once cured, the antimicrobial cleaning composition is removed from the surface, taking the contaminant along with it and leaving behind a clean surface.

A rinsing liquid adheres to a substrate subjected to a cleaning process. The rinsing liquid on the substrate is first replaced with IPA liquid. While the substrate covered with the IPA liquid is held in a dryer chamber, liquid carbon dioxide is supplied to the surface of the substrate. Liquid nitrogen is supplied to cool down the interior of the dryer chamber. This solidifies the liquid carbon dioxide on the substrate into solid carbon dioxide. Thereafter, the pressure in the dryer chamber is returned to atmospheric pressure, and gaseous nitrogen is supplied into the dryer chamber. Thus, the temperature in the dryer chamber increases. The solid carbon dioxide on the surface of the substrate is sublimated, and is hence removed from the substrate. All of the steps are performed while carbon dioxide is not in a supercritical state but in a non-supercritical state.

Processes for removing a mask layer (e.g., doped amorphous carbon mask layer) from a substrate with high aspect ratio structures are provided. In one example implementation, a process can include depositing a polymer layer on at least a portion of a top end of a high aspect ratio structure on a substrate. The process can further include removing at least a portion of the polymer layer and the doped amorphous carbon film form the substrate using a plasma strip process. In example embodiments, depositing a polymer layer can include plugging one or more high aspect ratio structures with the polymer layer. In example embodiments, depositing a polymer layer can include forming a polymer layer on a sidewall of one or more high aspect ratio structures.

According to one embodiment, a method for cleaning a substrate includes first cleaning process and second cleaning process. The first cleaning process subjects a substrate to a first cleaning method. The second cleaning process subjects the substrate to a second cleaning method that is different from the first cleaning method and is subsequent to the first cleaning process. The first cleaning method includes at least one of acidic cleaning or alkaline cleaning. The second cleaning method includes freeze cleaning.

According to one embodiment, a method including supplying a liquid onto a substrate, solidifying the liquid on the substrate to form a solidified body, and melting the solidified body of the liquid on the substrate is provided. When solidifying the liquid, an internal pressure of the liquid on the substrate is varied.

A curable composition on a substrate is cured in a state where a member is in contact with the curable composition. Thereafter, the member having adhered to the curable composition is separated from the substrate, whereby the curable composition and a particle are removed from the substrate.

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes discharging a treating liquid including a polymer and a solvent onto a substrate; and solidifying a liquid film of the treating liquid by volatilizing the solvent from the treating liquid on the substrate, and wherein the solidifying a liquid film comprises a first period of stopping the rotation of the substrate or rotating the substrate at a first speed for a first time period.

The present disclosure provides an apparatus that can be attached to a tip portion of an eye-imaging device including the lens. The apparatus includes an annular base having an orifice having a first end and a second end. A contact member may be disposed adjacent the second end of the annular base. The contact member may include a contact surface having a geometry that is configured to fit on a tip of an eye-imaging device. For example, the contact surface may include a tapered region that matches the profile of a tip of an eye-imaging device. The tapered region may provide a frictional fit with a tip of the eye-imaging device such that the contact surface is flush with the surface of the tip. A solution can be deposited in the apparatus and onto a lens surface after it is attached to the tip of the eye-imaging device. In this way, the apparatus prevents any solution from leaking to other areas of the eye-imaging device to clean the lens surface of the eye-imaging device.

A composition for removing iron deposits, rust, or metallic particles from a surface, the composition including: at least one reducing agent; at least one chelating agent that changes color upon chelation; and at least one solvent.