A substrate processing method and apparatus which can remove an anti-drying liquid, which has entered a three-dimensional pattern with recessed portions formed in a substrate, in a relatively short time. The substrate processing method includes the steps of: carrying a substrate, having a three-dimensional pattern formed in a surface, into a processing container, said pattern being covered with an anti-drying liquid that has entered the recessed portions of the pattern; heating the substrate and supplying a pressurizing gas or a fluid in a high-pressure state into the processing container, thereby forming a high-pressure atmosphere in the processing container before the anti-drying liquid vaporizes to such an extent as to cause pattern collapse and bringing the anti-drying liquid into a high-pressure state while keeping the liquid in the recessed portions of the pattern; and thereafter discharging a fluid in a high-pressure state or a gaseous state from the processing container.

The composition for cleaning disarticulated skeletons is a mixture of ammonia, hydrogen peroxide and water. The composition may further include ozone continuously pumped into the mixture while soaking the skeleton. The skeleton may initially be soaked in a composition having 7% ammonia by volume and 8-10% hydrogen peroxide by volume, the balance being water, e.g., for a period of ten days. The composition may be maintained at 20 C. and ozone may be continuously pumped during the ten-day period. If any grease remains, the bones may be soaked again, e.g., in a composition having 3% ammonia and 3% hydrogen peroxide for an additional seven days, again with continuous pumping of ozone at a rate of 200 mg/hr into the mixture, followed by rinsing with water and drying.

An apparatus for processing a substrate may include an upper chamber, a lower chamber being combined with the upper chamber and separated from the upper chamber, and at least one driving member for moving the lower chamber in an upward direction and a downward direction. The least one driving member may include a supporting element for supporting the lower chamber, a first driving element for moving the lower chamber and the supporting element, a second driving element for moving the lower chamber, the supporting element and the first driving element, the second driving element being disposed adjacent to the first driving element, and a connecting element for connecting the first driving element to the second driving element. A processing space may be provided between the upper chamber and the lower chamber when the lower chamber is combined with the upper chamber.

A sealing member for use in sealing a chamber for treating a substrate, the sealing member inserted in a groove formed in the chamber, includes a bottom part, a top part opposite the bottom part, an inner part connecting a first side of the bottom part to the top part, an outer part opposite the inner part and connecting a second side of the bottom part to the top part, and a recessed portion between the top part and the outer part.

A substrate processing apparatus includes a vessel providing a processing space for processing a substrate, a substrate support supporting the substrate loaded in the processing space, and a barrier between a side wall of the vessel and the substrate support and surrounding an edge of the substrate supported by the substrate support.

Use of supercritical CO2 for cleaning long, narrow pipes with a cross sectional area of less than 1000 square mm and a length of more than 500 meter. Cleaning is performed by adding a fluid to the lumen of the pipe (140); providing the fluid (2) in a supercritical state (6) inside the lumen; and subsequently, as a flushing step, while the fluid is in the supercritical state or in a liquid state, displacing the fluid (2) in the lumen of the pipe (140) and out of lumen of the pipe at a speed that causes a turbulent flow of the fluid, thereby flushing particles out of the lumen.

Provide are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus comprises a chamber, a substrate supporting member which is positioned in the chamber to support the substrate, a spray member which supplies a rinse liquid to the substrate, a depressurizing line which is used to depressurize the chamber, and a controller which vaporizes the rinse liquid by depressurizing the chamber through the depressurizing line after supplying the rinse liquid in a liquid phase.

A method and apparatus for processing a substrate is provided. A feed stream of carbon dioxide liquid is supplied under pressure from a feed supply to a purification vessel. The carbon dioxide liquid in the purification vessel is distilled to form a purified carbon dioxide gas in a single stage distillation process. The processing method includes condensing the purified carbon dioxide gas in the condenser by heat exchange with a refrigerant from a refrigeration system to form a purified carbon dioxide liquid. The purified carbon dioxide liquid is heated to a target temperature above a critical point to change the purified carbon dioxide liquid to a supercritical carbon dioxide fluid. The processing method includes using the supercritical carbon dioxide fluid to clean a substrate disposed in a processing chamber.

An apparatus and a method for cleaning a chamber are provided. A method for cleaning a chamber having a treatment space for treating a substrate includes cleaning the chamber by supplying a cleaning medium into the treatment space. The cleaning medium includes a supercritical fluid having a non-polar property and an organic solvent having a polar property. The cleaning efficiency of the chamber is improved with respect to a non-polar contaminant and a polar contaminant.

A descaling system includes injector arranged to inject cleaning fluid over an inlet for inflow of a fuel-air mixture of an internal-combustion engine and a controller that opens or closes the engine's EGR valve according to parameters of the injected cleaning fluid.