Patent classifications
B08B7/0035
In-Situ DC Plasma For Cleaning Pedestal Heater
Substrate supports, substrate support assemblies and methods of using an arc generated between a first electrode and a second electrode to clean a support surface. The first electrode comprises a plurality of first branches which are interdigitated with a plurality of branches of the second electrode in a finger-joint like pattern creating a gap between the first electrode and the second electrode.
GAS CLUSTER PROCESSING DEVICE AND GAS CLUSTER PROCESSING METHOD
There is provided a gas cluster processing device for performing a predetermined process on a workpiece by irradiating the workpiece with a gas cluster, including: a processing container in which the workpiece is disposed; a gas supply part configured to supply a gas for generating the gas cluster; a flow rate controller configured to control a flow rate of the gas supplied from the gas supply part; a cluster nozzle configured to receive the gas for generating the gas cluster at a predetermined supply pressure, spray the gas into the processing container maintained in a vacuum state, and convert the gas into the gas cluster through an adiabatic expansion; and a pressure control part provided in a pipe between the flow rate controller and the cluster nozzle and including a back pressure controller configured to control a supply pressure of the gas for generating the gas cluster.
MULTI-COLOR ELECTRONIC HOUSINGS
The present disclosure is drawn to a multi-color electronic housing. The multi-color electronic housing can include a metal alloy having a first portion that can be milled, plasma-treated, and can include an electrodeposited colorant thereon. The metal alloy can further have a second portion that can be milled, plasma-treated, and can include second electrodeposited colorant thereon. The first electrodeposited colorant can provide a different coloration than the second electrodeposited colorant.
Method of disinfecting vehicle using UVC light emitters
Methods and system for disinfecting an autonomous vehicle includes one or more LEDs coupled to the autonomous vehicle to emit UVC light into a passenger compartment of the autonomous vehicle. The autonomous vehicle can include sensors to confirm that the passenger compartment is empty and can be configured to prevent ingress of passengers into the passenger compartment while the UVC light is being emitted. Moreover, visible light indicators in the vehicle can be controlled to provide different visual indicators during the disinfecting cycle and when the vehicle is available to a passenger. In examples, the disinfecting cycle can be performed while the autonomous vehicle is in use, e.g., while the autonomous vehicle is traversing to a location to retrieve a passenger. The methods and systems can provide improved cleaning and disinfection of autonomous vehicles without the need to take the vehicles out of operation.
METHOD FOR CLEANING A VACUUM SYSTEM USED IN THE MANUFACTURE OF OLED DEVICES, METHOD FOR VACUUM DEPOSITION ON A SUBSTRATE TO MANUFACTURE OLED DEVICES, AND APPARATUS FOR VACUUM DEPOSITION ON A SUBSTRATE TO MANUFACTURE OLED DEVICES
The present disclosure provides a method for cleaning a vacuum system used in the manufacture of OLED devices. The method includes performing pre-cleaning for cleaning at least a portion of the vacuum system, and performing plasma cleaning using a remote plasma source.
ULTRAVIOLET SPECIMEN CLEANING APPARATUS
An apparatus for cleaning a sample is provided. The apparatus includes an ultraviolet grid lamp having a forward side, the ultraviolet grid lamp configured to direct ultraviolet light energy from its forward side toward the sample, a quartz plate positioned between the forward side of the ultraviolet grid lamp and the sample, and a nitrogen circulating arrangement configured to circulate nitrogen along the ultraviolet grid lamp.
Method of using dual frequency RF power in a process chamber
Embodiments of the present disclosure generally relate to methods of depositing carbon film layers greater than 3,000 Å in thickness over a substrate and surface of a lid of a chamber using dual frequency, top, sidewall and bottom sources. The method includes introducing a gas to a processing volume of a chamber. A first radiofrequency (RF) power is provided having a first frequency of about 40 MHz or greater to a lid of the chamber. A second RF power is provided having a second frequency to a bias electrode disposed in a substrate support within the processing volume. The second frequency is about 10 MHz to about 40 MHz. An additional third RF power is provided having lower frequency of about 400 kHz to about 2 MHz to the bias electrode.
COVER WAFER FOR SEMICONDUCTOR PROCESSING CHAMBER
Semiconductor processing systems according to embodiments of the present technology may include a chamber body having sidewalls and a base. The chamber body may define an internal volume. The systems may include a substrate support assembly having a shaft and a platen coupled with the shaft along a first surface of the platen. The semiconductor processing systems may include a cover plate positioned on the platen of the substrate support assembly along a second surface of the platen opposite the first surface. The cover plate may include a flange extending about an exterior region of the cover plate. The flange may be in direct contact with the platen. The cover plate may include an upper wall vertically offset from the flange. An interior volume may be defined between the upper wall and the platen of the substrate support assembly.
Method and apparatus for removing particles from the surface of a semiconductor wafer
A method for removing particles from a semiconductor wafer surface is disclosed. A wafer is being spun on a spin coater contained within a condensing environment. Liquid vapor is then infused into the condensing environment to allow some of the liquid vapor to be condensed onto a surface of the wafer on which particles may adhere while the wafer is being spun. Next, a set of light pulses is applied to the surface of the spinning wafer. Finally, an air stream is utilized to carry the particles off the surface of the wafer.
Medical device for detecting at least one analyte in a body fluid
A medical device for detecting, at least one analyte, in a body fluid is disclosed. The medical device comprises: at least one analyte sensor having an insertable portion adapted for at least partially being inserted into a body tissue of a user, at least one insertion cannula, wherein the analyte sensor at least partially is placed inside the insertion cannula; at least one housing, wherein the housing comprises at least one sensor compartment, wherein the sensor compartment forms a sealed compartment receiving at least the insertable portion of the analyte sensor, wherein the sealed compartment comprises at least one detachable upper cap and at least one detachable lower cap, wherein the detachable lower cap is configured for detachment before insertion, thereby opening the insertable portion for insertion, wherein the insertion cannula is attached to the detachable upper cap, wherein the detachable upper cap is configured for detachment after insertion, thereby removing the insertion cannula; and at least one electronics unit, wherein the analyte sensor is operably connected to the electronics unit, wherein the electronics unit comprises at least one interconnect device with at least, one electronic component attached thereto, wherein the interconnect device fully or partially surrounds the housing.