A wafer cleaning apparatus is provided. The wafer cleaning apparatus includes comprising a chamber configured to be loaded with a wafer, a nozzle on the wafer and configured to provide liquid chemicals on an upper surface of the wafer, a housing under the wafer, a laser module configured to irradiate laser on the wafer, a transparent window disposed between the wafer and the laser module, and a controller configured to control on/off of the laser module, wherein the controller is configured to control repetition of turning the laser module on and off, and retain temperature of the wafer within a temperature range, and a ratio of time when the laser module is on in one cycle including on/off of the laser module is 30% to 50%.

A substrate processing system is disclosed, comprising: a vacuum transfer module; a substrate processing module connected to the vacuum transfer module and configured to process a substrate in a depressurized environment; a load-lock module connected to the vacuum transfer module; at least one substrate cooling stage disposed in the load-lock module; at least one substrate transfer robot disposed the vacuum transfer module and having at least one end effector; and a controller configured to control a particle removal operation. The operation includes: cooling at least one dummy substrate placed on said at least one substrate cooling stage to a first temperature; and holding said at least one end effector in any one of a plurality of positions in the vacuum transfer module or the substrate processing module for a first time period in a state where at least one cooled dummy substrate is placed on said at least one end effector.

A solidified body forming step includes: a first step of landing a processing surface of a cooling member on a liquid film to solidify the liquid to be solidified located in an area sandwiched between an upper surface and the processing surface; and a second step of releasing the processing surface from the solidified area solidified in the first step. The processing surface has a lower temperature than a freezing point of the liquid to be solidified. Adhesion between the solidified area and the processing surface is smaller than that between the solidified area and the upper surface.

An anti-fouling system (1) for use with a wet compartment (10) having at least one inlet opening (11) for allowing water to enter the compartment (10) is configured to receive and operate at least one anti-fouling source for emitting anti-fouling light in order to keep at least one surface (26) as present in the compartment (10) free from biofouling. The system (1) comprises a controller (50) for controlling operation of the at least one anti-fouling source (30), the controller (50) being configured to determine at least one operation parameter of the at least one anti-fouling source (30) in relation to at least one of at least one water-related parameter, at least one surface-related parameter and at least one opening-related parameter.

The invention relates to a device (1) for generating steam. The device (1) comprises a first plate (2) being inclined at a positive first angle (AO) compared to the horizontal direction (H) to define a first upper end (2a) and a first lower end (2b), a heating element (3) to heat the first plate (2) to a predetermined temperature being at least above water evaporation temperature, a water inlet arrangement (4) for dispensing water onto the first plate (2), a second plate (5) being inclined at a negative second angle (BO) compared to the horizontal direction (H) to define a second upper end (5a) and a second lower end (5b), the second upper end (5a) adjoining the first lower end (2b), and a container (6) extending at least below said first lower end (2b), said container (6) being arranged for collecting scale flakes falling from the first plate (2). This solution allows creating a larger volume for the collection of scale, thus increasing the operating life of the device (1).

A solidified body forming step includes: a first step of landing a processing surface of a cooling member on a liquid film to solidify the liquid to be solidified located in an area sandwiched between an upper surface and the processing surface; and a second step of releasing the processing surface from the solidified area solidified in the first step. The processing surface has a lower temperature than a freezing point of the liquid to be solidified. Adhesion between the solidified area and the processing surface is smaller than that between the solidified area and the upper surface.

In described examples, a transducer vibrates a lens element in a heating mode and a cleaning mode. Controller circuitry activates the transducer in the heating mode in response to an estimated temperature, and activates the transducer in the cleaning mode after the transducer is activated in the heating mode.

In one or more embodiments described herein, there is provided an apparatus for a user interface, the user interface including a user interface surface, the user interface surface including at least part of a self cleaning composition, the composition being configured to draw away at least one dermatological contaminant from one or more contaminated regions of the user interface surface to thereby provide a self-cleaning user interface surface.

A micropump that pumps liquid using electrothermally-induced flow is described, along with a corresponding self-regulating pump and infusion pump. The micropump has applications in microfluidic systems, such as biochips. The self-regulating infusion pump is useful for administration of large and small volumes of liquids such as drugs to patients and can be designed for a wide range of flow rates by combining multiple micropumps in one infusion pump system. The micropump uses electrode sequences on opposing surfaces of a flow chamber that are staggered with respect to each other. The opposing surfaces include staggered electrodes that have the same phase and same electrode sequence. As such electrodes with the same phase are staggered and not eclipsed.

A cleaning mixture comprising polymeric resin pellets having a Rockwell R hardness of 85 to 140, water, and a surfactant salt comprising at least one of sulfonate salts, C.sub.6 to C.sub.36 carboxylic acid salts, or mixtures thereof, is used to purge the mixing device. The cleaning mixture has a pH of 6.0 to 9.0.