A method of cleaning residual resin from an additively manufactured object, includes: (a) enclosing an additively manufactured object in an inner chamber of a centrifugal separator, the additively manufactured object including a light polymerized resin with a surface coating of viscous, unpolymerized, residual resin; (b) flooding the chamber with a volatile organic solvent vapor without contacting liquid organic solvent to the object, the vapor present in an amount sufficient to reduce the viscosity of the residual resin; and (c) spinning the additively manufactured object in the chamber to centrifugally separate at least a first portion of the residual resin from the object.

A fluororubber wax-melting tray and a cleaning method thereof are disclosed. The fluororubber material of the disclosure is a synthetic polymer elastomer with high temperature resistance, corrosion resistance and low wear resistance. The fluororubber wax-melting tray has the same wax melting effect as the existing ceramic or metal wax melting trays. The shape of the wax melting tray is changed by the external force exerted by pushing the bottom of the fluororubber wax melting tray lightly. When both the external force tending to change the shape of the wax-melting tray and the adsorption force between the wax molecules are greater than the adsorption forces between the fragrance wax and the wax melting tray, the absorption force between a wax piece and the wax melting tray is released, and the whole solidified wax piece can be completely peeled off.

A fluororubber wax-melting tray and a cleaning method thereof are disclosed. The fluororubber material of the disclosure is a synthetic polymer elastomer with high temperature resistance, corrosion resistance and low wear resistance. The fluororubber wax-melting tray has the same wax melting effect as the existing ceramic or metal wax melting trays. The shape of the wax melting tray is changed by the external force exerted by pushing the bottom of the fluororubber wax melting tray lightly. When both the external force tending to change the shape of the wax-melting tray and the adsorption force between the wax molecules are greater than the adsorption forces between the fragrance wax and the wax melting tray, the absorption force between a wax piece and the wax melting tray is released, and the whole solidified wax piece can be completely peeled off.

A cleaning method includes controlling an unmanned aerial vehicle (UAV) to fly to a region of a wall body according to a path to be cleaned, and, in response to detecting a cleaning prohibition identifier associated with the region, recognizing the region as a cleaning prohibition region and controlling the UAV to fly over the cleaning prohibition region without cleaning the cleaning prohibition region.

An apparatus for cleaning nets underwater formed from a propeller housing with a centrally disposed axis with a plurality of blades extending therefrom. An outer perimeter ring secured to an outer tip of each blade with a plurality of knuckles secured to the outer perimeter ring. Each knuckle including a curved surface constructed and arranged to be forcefully presented to the aquaculture net upon rotation of said blades for removal of growth by impact and shaking of the aquaculture net. An elastomeric hub prevents spike loads.

An apparatus for cleaning nets underwater formed from a propeller housing with a centrally disposed axis with a plurality of blades extending therefrom. An outer perimeter ring secured to an outer tip of each blade with a plurality of knuckles secured to the outer perimeter ring. Each knuckle including a curved surface constructed and arranged to be forcefully presented to the aquaculture net upon rotation of said blades for removal of growth by impact and shaking of the aquaculture net. An elastomeric hub prevents spike loads.

Disclosed are a CMP wafer cleaning apparatus, and a wafer transfer manipulator and a wafer overturn method for same. The wafer transfer manipulator includes: a transverse transfer shaft, with same only being located at a side of a cleaning unit; a transverse transfer carriage provided on the transverse transfer shaft, and capable of transversely moving along the transverse transfer shaft; a first vertical lifting shaft provided on the transverse transfer carriage, and capable of vertically moving on the transverse transfer carriage; a rotary table provided on the first vertical lifting shaft; and a first claw clamping arm connected to the rotary table, and driven by the rotary table to move in a rotational manner. The CMP wafer cleaning apparatus is provided, and when the CMP wafer cleaning apparatus fails, safe storage of a polished wafer can be realized.

A pneumatic tool structure contains an air intake head, a slidable sleeve, a drive unit, a piston, an operation element, a resilient element, a first isolation ring, and a second isolation ring. The air intake head includes a press lever, an air channel, and a connection portion. The connection portion has a first coupling orifice. The slidable sleeve includes a shoulder. The drive unit includes a body, a recessed portion having a defining fringe, a screw bolt, and a chamber. An air discharge conduit is defined between the slidable sleeve and the body. The first segment has a second coupling orifice. The resilient element includes a through hole. The first isolation ring includes a first rim, a second rim, multiple first discharging grooves, and multiple first contact portions. The second isolation ring includes a third rim, a fourth rim, multiple second discharging grooves, and multiple second contact portions.

The systems and methods of automatically cleaning a wheel are disclosed herein. The systems and methods include a foreign matter detector arranged adjacent to the wheel, a cleaning device arranged adjacent to the wheel, one or more processors communicatively coupled to the foreign matter detector and the cleaning device; and a non-transitory, processor-readable storage medium communicatively coupled to the one or more processors. The non-transitory, processor-readable storage medium includes one or more programming instructions stored thereon that, when executed, cause the one or more processors to: receive a signal from the foreign matter detector, the signal being indicative of possible foreign matter present on a surface of the wheel, determine from the signal, whether foreign matter is present on the wheel, and direct the cleaning device to remove the foreign matter from the wheel.

The systems and methods of automatically cleaning a wheel are disclosed herein. The systems and methods include a foreign matter detector arranged adjacent to the wheel, a cleaning device arranged adjacent to the wheel, one or more processors communicatively coupled to the foreign matter detector and the cleaning device; and a non-transitory, processor-readable storage medium communicatively coupled to the one or more processors. The non-transitory, processor-readable storage medium includes one or more programming instructions stored thereon that, when executed, cause the one or more processors to: receive a signal from the foreign matter detector, the signal being indicative of possible foreign matter present on a surface of the wheel, determine from the signal, whether foreign matter is present on the wheel, and direct the cleaning device to remove the foreign matter from the wheel.