A liquid processing apparatus includes a storage tank, a circulation line, a supply line, a return line and at least one filter. The storage tank stores a processing liquid therein. Through the circulation line, the processing liquid sent from the storage tank is returned back into the storage tank. The supply line connects the circulation line and a supply configured to supply the processing liquid onto a substrate. The return line is connected to the supply line, and the processing liquid is returned back into the storage tank from the supply line through the return line. The filter is provided in at least one of the supply line on an upstream side of a connection point between the return line and the supply line or the return line, and is configured to remove a foreign substance in the processing liquid.

A liquid supply unit includes a tank having an inner space for storing the liquid, an inlet line for supplying the liquid from the liquid supply source to the inner space and having an inlet valve installed thereon, an outlet line for supplying the liquid from the tank to a nozzle or for recollecting the liquid to the tank and having an outlet valve installed thereon, a gas supply line for supplying a gas to the inner space and having a gas control valve installed thereon, an exhaust line for exhausting the inner space and having an exhaust valve installed thereon, a circulation line for circulating the liquid stored in the inner space, and a controller controlling the liquid supply unit so that the circulation line is pressurized while the liquid is supplied to the inner space.

An apparatus for processing a substrate may include a process chamber providing a processing space in which a predetermined process is performed on a substrate and a chemical liquid supply device for supplying a chemical liquid onto the substrate dispose din the process chamber. The chemical liquid supply device may include a chemical liquid supply reservoir for storing the chemical liquid, a chemical liquid supply line for providing a path through which the chemical liquid is supplied from the chemical liquid reservoir onto the substrate, at least one heating member for heating the chemical liquid provided from the chemical liquid reservoir, a sensing member including a first sensor for measuring a temperature of the chemical liquid entering the at least one heating member and a second sensor for measuring a temperature of the chemical liquid exiting the at least one heating member, and a control member for controlling an operation of the at least one heating member based on a difference between the temperatures measured by the first and the second sensors.

A cleaning system comprising: (a) one or more pumps; (b) one or more foamers; and (c) one or more cleaning reservoirs including one or more cleaning solutions; wherein the one or more foamers combine a fluid and the cleaning solution to form a foamed solution so that the solution is introduced into a system to be cleaned.

A device adapted to deliver fruit and/or vegetable juices, pulps, salads and composts, etc., each fruit or vegetable being selectively served raw or cooked, with a scope to obtain maximal nutritional intake. The device comprises a housing and a transparent showcase accommodating an ample variety of fruits and vegetables, equipment for the preparation of the above fruit/vegetable products including at least one juicer appliance and one blender appliance for alternatively preparing fruit/vegetable juice and pulp respectively delivered through downwardly inclined pipe members into a container within product delivery compartments and equipment for cleaning the juicer and blender appliances and corresponding pipe members in between sequential fruit/vegetable servings, comprising an autonomous circuitry and container of cleaning water supply and container for collection of sewerage. The device also comprises a kettle for cooking selected fruits/vegetables, an unpeeling device and cutting device.

The present invention relates to a composition consisting essentially of a sulfonic acid component selected from the group consisting of camphor sulfonic acid, and a benzene sulfonic acid of structure (I), wherein R is H or a C-1 to C-18 n-alkyl, oxalic acid, a solvent component which consists essentially of an organic solvent component, or a mixture of an organic solvent components and water, wherein the organic solvent component consist of about 100 wt % to about 85 wt % of said solvent component, and further wherein said organic solvent component is either selected from solvent (III), (IV), (V), (VI) (wherein R is selected from the group consisting of —(-0-CH.sub.2—CH.sub.2—).sub.n, —OH, —OH, and -0-C(═O)—CH.sub.3, wherein n′ is equal to 1, 2, 3, or 4), (VII) (wherein Ra is H or a C-1 to C-4 alkyl moiety), (VIII), (IX) (wherein Rb is a C-1 to C-18 alkyl moiety), (X), and (XI) or is a mixture, of at least two organic solvents selected from this group. The invention also relates to such compositions also containing a surfactant component, and also pertains to the process of using either of these compositions as a resist remover. ##STR00001##
Dipropylene glycol monomethyl ether (III), ##STR00002##

A substrate processing apparatus includes a chamber providing a space in which a substrate is processed, a first substrate support within the chamber and configured to support the substrate when the substrate is loaded into chamber, a second substrate support within the chamber and configured to support the substrate in a height greater than the height in which the first substrate supports the substrate, a first supply port through which a supercritical fluid is supplied to a first space under the substrate of a chamber space, a second supply port through which the supercritical fluid is supplied to a second space above the substrate of the chamber space, and an exhaust port through which the supercritical fluid is exhausted from the chamber.

The present disclosure relates generally to protective devices and cover members. In some embodiments, cover members are provided that are operable to protect covered components and to allow heat dissipation from the components. Cover members of the present disclosure are suitable for use with heat exchangers including, for example, those provided with hot water pressure washers.

The invention relates to a method of automatic dishwashing in a dishwasher having a wash tank, comprising: in a first step, delivering a first composition to dishware in the tank in the form of a mist; and afterwards, in a second step, delivering a second composition to the dishware in the tank in the form of a jet; wherein the first and second compositions are different, the first composition comprises a bleach, and the second composition is alkaline and comprises a builder. The invention also provides a dishwasher adapted to carry out the inventive method.

A cleaning station for an optical element is providing, including: an optical element holder configured to hold the optical element; a first drive configured to rotate the optical element holder around a rotation axis coinciding with an optical axis of the optical element when held by the optical element holder; a cleaning nozzle configured to project a cleaning jet of a cleaning liquid towards the optical element; and a separate drying nozzle configured to project a drying jet towards the optical element, the cleaning nozzle and the drying nozzle being configured to move in order to direct the cleaning jet and the drying jet, respectively, successively to different locations on the optical element.