The present disclosure may provide a cleaning apparatus for cleaning parts. The cleaning apparatus may comprise a housing defining a washing chamber having an opening through which parts may be loaded/unloaded into the washing chamber. The cleaning apparatus may also comprise a spray system adapted to direct a washing solution to clean the part in the washing chamber. The spray system may comprise a spray array with at least one rotatable spray head. The spray head may comprise a plurality of nozzles through which the washing solution is directed to clean the part in the washing chamber. The cleaning apparatus may also comprise a closure which may provide controlled access to the washing chamber through the opening and may be movable between a closed position to sealingly close the opening and an open position so as to allow for loading and unloading of parts into the washing chamber without obstruction.

The invention relates to a cleaning apparatus (10) for functionally regenerating a brush (20) which can be used for washing a flexographic plate; in particular, the apparatus is configured to regenerate a brush (20) comprising a cylindrical core (5) about which a channel (4) supporting filaments (3) is fixed according to a spiral shape. The apparatus comprises a frame defining a rotation axis (100) for the brush and a motorized assembly, which can be operatively connected to an end of said cylindrical core (5) of the brush (20) to rotate it about the rotation axis (100). The apparatus (10) further comprises a cleaning unit (30) comprising a carriage (31), movable along a rectilinear guide (32) and a tool (33) provided with an end (33A) adapted to penetrate into the spaces defined between the turns of the spiral to detach the polymer and monomer residues hardened in said spaces as a result of the use of said brush for said washing.

A method for preventing the collapse of patterned, high aspect ratio features formed in semiconductor substrates upon removal of wash solutions of the type used to clean etch residues from the spaces between the features. In the present method, the spaces are at least partially filled with a displacement solution, such as via spin coating, to substantially displace the wash solution. The displacement solution includes at least one solvent and at least one fill material which is a polyalkene carbonate (PAC) and/or a saccharide. The solvent is then volatized to deposit the fill material in substantially solid form within the spaces. The fill material may be removed by thermal degradation via heat treatment, wherein the need for removal of the fill material by plasma ashing is obviated in order to prevent or mitigate silicon loss.

A cleaning apparatus for concentration controller of coating machine may include a pulse bubble generator and a container used for cleaning a concentration controller of a coating machine and a tube thereof. The pulse bubble generator has a bubble-generating end connected to the container through a pipe, and the container is filled with a plentiful detergent. The pulse bubble generator is configured to pump air into the detergent with a pulse per time, and a large amount of detergent bubbles are adapted to be generated in the container. The detergent bubbles are configured to be pumped by the concentration controller into the tube and the concentration controller so as to complete cleaning effect of the tube and the concentration controller.

A system for removing a coating from an underlying layer can include a wave-based weakening system configured to weaken the coating by decreasing a coupling force between the coating and the substrate, a coating removal mechanism configured to remove the weakened coating from the underlying layer, and a sensor configured to determine a property associated with the coating. A method for removing a coating from an underlying layer can include generating a weakened coating and removing the weakened coating.

The invention relates to the use of a cleaning composition for removing uncured printing resin from 3D-printed articles, the cleaning composition comprising either of the following components alone or in combination: di basic esters of a carboxylic acid, tri basic esters of a carboxylic acid. The invention also relates to a process of cleaning a 3D-printed article, the process comprising the steps of a) providing the cleaning composition and a 3D-printed article comprising uncured printing resin on its surface, b) treating the surface of the 3D-printed article with the cleaning composition, c) optionally treating the 3D article with a solvent, in particular water, d) optionally drying the 3D article, optionally repeating steps b), c) and d) either singly or in combination. A further embodiment of the invention is directed to kit of parts comprising the cleaning composition and a 3D-printable resin composition, as well as a 3D-printing system comprising the cleaning composition, a 3D-printing device and a 3D-printable resin composition.

The present invention relates to a method for removing a polymeric material from a surface of a nanostructure. The method includes applying, by a scanning probe microscope, an electrical field between a probe tip of the scanning probe microscope and the nanostructure, and simultaneously scanning over the surface of the nanostructure. Thereby, bonds connecting the polymeric material to the surface of the nanostructure are broken. A further step includes cleaning the surface of the nanostructure. A scanning probe microscope for performing such a method and a computer program product for controlling the scanning probe microscope are also disclosed.

The present invention relates to a method for removing a polymeric material from a surface of a nanostructure. The method includes applying, by a scanning probe microscope, an electrical field between a probe tip of the scanning probe microscope and the nanostructure, and simultaneously scanning over the surface of the nanostructure. Thereby, bonds connecting the polymeric material to the surface of the nanostructure are broken. A further step includes cleaning the surface of the nanostructure. A scanning probe microscope for performing such a method and a computer program product for controlling the scanning probe microscope are also disclosed.

A method to prevent groundings of polycrystalline silicon rod holders to a reactor plate by the residual polymer in the following manner: first, providing a polycrystalline silicon reactor having a reactor plate with a plurality of silicon rod holders separated from the reactor plate with an insulation; next establishing an electrical circuit from a ground connection on the reactor plate connected to high potential test equipment to a high voltage probe; and finally completing the electrical circuit by contacting the high voltage probe to the holder. By this method any remaining polymer is physically removed as the polymer burns or is ejected by the energetic release caused by mild arcing from the holder to the reactor plate.

A method of separating excess resin from at least one object includes: (a) stereolithographically producing at least one object, each object having at least one retention feature (32) formed thereon, each object carrying excess resin on a surface thereof; then (b) mounting each object on at least one transfer frame (21), each transfer frame having at least one retention member (22) that mates with the retention feature; (c) connecting each transfer frame to a rotor with the at least one object carried thereon; (d) centrifugally separating excess resin from each object by spinning the rotor with each transfer frame connected thereto while the at least one object remains connected to each transfer frame by the retention feature; then (e) removing each transfer frame from the rotor, with excess resin separated from each at least one object thereon.