Patent classifications
B23K26/50
Fiber Bragg gratings in carbon-coated optical fibers and techniques for making same
A technique is described for fabricating one or more optical devices in a carbon-coated optical fiber. A photosensitive optical fiber is provided having a hermetic carbon coating. Further provided is a laser having a beam output that is configured to inscribe one or more refractive index modulations into the optical fiber through the hermetic carbon layer while leaving the hermetic carbon layer intact. The laser is used to inscribe one or more optical devices into the optical fiber through the hermetic carbon layer.
METHOD FOR MANUFACTURING ORGANIC ELECTRO-LUMINESCENT ELEMENT AND THE ORGANIC ELECTRO-LUMINESCENT ELEMENT
A method for manufacturing an organic electro-luminescent (EL) element includes: a first process of preparing an organic EL element which includes a positive electrode, an organic layer which includes a light-emitting layer, and a negative electrode, the organic EL element having a short-circuited portion where the positive electrode and the negative electrode are short-circuited; and a second process of emitting femtosecond laser light to at least one of: the transparent electrically conductive material layer and the metal layer in a short-circuited portion; and the transparent electrically conductive material layer and the metal layer around the short-circuited portion to bring the transparent electrically conductive material layer and the metal layer into high-resistance states.
PROCESSING SYSTEM
A processing system includes a holding apparatus for hold an object to be rotatable; a rotation apparatus for rotating the holding apparatus; a beam irradiation apparatus for irradiating the object with an energy beam; an object measurement apparatus for measuring the object; and a control apparatus for controlling at least one of the beam irradiation apparatus and the rotation apparatus based on an information related to the object measured by the object measurement apparatus and an information of a rotational axis of the rotation apparatus, and processes the object by irradiating the object held by the holding apparatus with the energy beam from the beam irradiation apparatus.
PROCESSING SYSTEM
A processing system includes a holding apparatus for hold an object to be rotatable; a rotation apparatus for rotating the holding apparatus; a beam irradiation apparatus for irradiating the object with an energy beam; an object measurement apparatus for measuring the object; and a control apparatus for controlling at least one of the beam irradiation apparatus and the rotation apparatus based on an information related to the object measured by the object measurement apparatus and an information of a rotational axis of the rotation apparatus, and processes the object by irradiating the object held by the holding apparatus with the energy beam from the beam irradiation apparatus.
METHOD OF CREATING A SUBSURFACE 3D ENGRAVING IN A CRYSTAL
A method of creating a subsurface engraved crystal comprising the steps of: performing a 3D/4D scan of a subject; saving the volumetric data; generating a point cloud based on the volumetric data; outputting the point cloud to a laser engraver; and engraving a crystal with the laser engraver.
METHOD OF CREATING A SUBSURFACE 3D ENGRAVING IN A CRYSTAL
A method of creating a subsurface engraved crystal comprising the steps of: performing a 3D/4D scan of a subject; saving the volumetric data; generating a point cloud based on the volumetric data; outputting the point cloud to a laser engraver; and engraving a crystal with the laser engraver.
Lift-off method
A lift-off method for transferring an optical device layer in an optical device wafer to a transfer substrate, the optical device layer being formed on the front side of an epitaxy substrate through a buffer layer. A transfer substrate is bonded through a bonding layer to the front side of the optical device layer of the optical device wafer, thereby forming a composite substrate. A pulsed laser beam having a wavelength transmissive to the epitaxy substrate and absorptive to the buffer layer is applied from the back side of the epitaxy substrate to the buffer layer, thereby breaking the buffer layer, and the epitaxy substrate is peeled from the optical device layer, thereby transferring the optical device layer to the transfer substrate. Ultrasonic vibration is applied to the composite substrate in transferring the optical device layer.
Lift-off method
A lift-off method for transferring an optical device layer in an optical device wafer to a transfer substrate, the optical device layer being formed on the front side of an epitaxy substrate through a buffer layer. A transfer substrate is bonded through a bonding layer to the front side of the optical device layer of the optical device wafer, thereby forming a composite substrate. A pulsed laser beam having a wavelength transmissive to the epitaxy substrate and absorptive to the buffer layer is applied from the back side of the epitaxy substrate to the buffer layer, thereby breaking the buffer layer, and the epitaxy substrate is peeled from the optical device layer, thereby transferring the optical device layer to the transfer substrate. Ultrasonic vibration is applied to the composite substrate in transferring the optical device layer.
LASER PROCESSING METHOD AND LASER PROCESSING SYSTEM
A laser processing method of performing laser processing on a transparent material that is transparent to ultraviolet light by using a laser processing system includes: performing relative positioning of a transfer position of a transfer image and the transparent material in an optical axis direction of a pulse laser beam so that the transfer position is set at a position inside the transparent material at a predetermined depth ΔZsf from a surface of the transparent material in the optical axis direction; and irradiating the transparent material with the pulse laser beam having a pulse width of 1 ns to 100 ns inclusive and a beam diameter of 10 μm to 150 μm inclusive at the transfer position.
METHOD OF PROCESSING WAFER
A method of processing a wafer having a plurality of intersecting streets on a face side thereof with protrusions on the streets includes a holding step of holding a protective sheet of a wafer unit on a holding table, an upper surface heightwise position detecting step of detecting a heightwise position of an upper surface of a reverse side of the wafer along the streets, and a laser beam applying step of applying a laser beam having a wavelength transmittable through the wafer to the wafer from the reverse side thereof along the streets while positioning a focused point of the laser beam within the wafer on the basis of the heightwise position, to thereby form modified layers in the wafer along the streets.