B23Q3/15

ELECTROSTATIC CHUCK WITH DIFFERENTIATED CERAMICS
20220270906 · 2022-08-25 ·

Electrostatic chucks (ESCs) for reactor or plasma processing chambers, and methods of fabricating ESCs, are described. In an example, a substrate support assembly includes a ceramic bottom plate having heater elements therein, the ceramic bottom plate composed of alumina having a first purity. The substrate support assembly also includes a ceramic top plate having an electrode therein, the ceramic top plate composed of alumina having a second purity higher than the first purity. A bond layer is between the ceramic top plate and the ceramic bottom plate. The ceramic top plate is in direct contact with the bond layer, and the bond layer is in direct contact with the ceramic bottom plate.

MAGNETIC STOPPER FOR A ROTARY MOTION SYSTEM
20220254677 · 2022-08-11 ·

A magnetic stopper, for a rotary motion system that includes a base unit and a rotary unit rotatably mounted on the base unit, includes a static part configured to be mounted on the base unit and a rotary arm configured to be mounted on the rotary unit. The static part includes a rotary arm stopping portion configured to receive a distal end portion of the rotary arm, and a movable arrangement including a magnet holder and a mobile magnet mounted on the magnet holder and movable within the rotary arm stopping portion. The rotary arm includes a rotary arm magnet configured to magnetically interact with the mobile magnet when the static part and the rotary part are mounted respectively on the base and rotary units, to prevent excessive movement of the rotary unit when the rotary motion system is operating.

MAGNETIC STOPPER FOR A ROTARY MOTION SYSTEM
20220254677 · 2022-08-11 ·

A magnetic stopper, for a rotary motion system that includes a base unit and a rotary unit rotatably mounted on the base unit, includes a static part configured to be mounted on the base unit and a rotary arm configured to be mounted on the rotary unit. The static part includes a rotary arm stopping portion configured to receive a distal end portion of the rotary arm, and a movable arrangement including a magnet holder and a mobile magnet mounted on the magnet holder and movable within the rotary arm stopping portion. The rotary arm includes a rotary arm magnet configured to magnetically interact with the mobile magnet when the static part and the rotary part are mounted respectively on the base and rotary units, to prevent excessive movement of the rotary unit when the rotary motion system is operating.

Electrostatic chuck
11410867 · 2022-08-09 · ·

According to one embodiment, an electrostatic chuck includes a ceramic dielectric, a base plate, a first electrode layer, and a second electrode layer. The ceramic dielectric substrate has a first major surface and a second major surface. The first electrode layer is provided between the first major surface and the second major surface. The second electrode layer is provided between the first electrode layer and the first major surface. The first electrode layer has a first surface and a second surface. A distance between the first surface and the first major surface is constant. A distance between the second surface and the first surface at an end portion of the first electrode layer is shorter than a distance between the second surface and the first surface at a central portion of the first electrode layer.

Electrostatic chuck
11410867 · 2022-08-09 · ·

According to one embodiment, an electrostatic chuck includes a ceramic dielectric, a base plate, a first electrode layer, and a second electrode layer. The ceramic dielectric substrate has a first major surface and a second major surface. The first electrode layer is provided between the first major surface and the second major surface. The second electrode layer is provided between the first electrode layer and the first major surface. The first electrode layer has a first surface and a second surface. A distance between the first surface and the first major surface is constant. A distance between the second surface and the first surface at an end portion of the first electrode layer is shorter than a distance between the second surface and the first surface at a central portion of the first electrode layer.

Method and device for removing electromagnetic core

A method and device for removing an electromagnetic core, the method including: using an electromagnet to magnetize or demagnetize a metallic upper nozzle when a magneto-conductive workpiece is cut off in a WEDM manner; attracting a core capable of being completely cut off and separated in the workpiece; utilizing the metallic upper nozzle to detect whether attracted; if the core is attracted, moving the core to a target area; demagnetizing and dropping the core in a trash area. The device is applied to a WEDM machine; after the metallic magneto-conductive upper nozzle is magnetized by the electromagnet, the upper nozzle is used to attract the magneto-conductive core; a metallic water spray cover is utilized to detect whether the core is attracted; the core is moved to the target area by a motion system of the WEDM machine, and dropped in a trash device after the upper nozzle is demagnetized.

Method and device for removing electromagnetic core

A method and device for removing an electromagnetic core, the method including: using an electromagnet to magnetize or demagnetize a metallic upper nozzle when a magneto-conductive workpiece is cut off in a WEDM manner; attracting a core capable of being completely cut off and separated in the workpiece; utilizing the metallic upper nozzle to detect whether attracted; if the core is attracted, moving the core to a target area; demagnetizing and dropping the core in a trash area. The device is applied to a WEDM machine; after the metallic magneto-conductive upper nozzle is magnetized by the electromagnet, the upper nozzle is used to attract the magneto-conductive core; a metallic water spray cover is utilized to detect whether the core is attracted; the core is moved to the target area by a motion system of the WEDM machine, and dropped in a trash device after the upper nozzle is demagnetized.

Decking stop device

A stop device for holding a unit load device in place on decking is described. In one example, the stop device includes a switchable magnet with an actuator to engage or disengage the stop device on decking using a switchable magnetic field of the stop device. The stop device also includes an interface bumper secured over a first surface of the switchable magnet, a foot plate secured over a second surface of the switchable magnet, and a handle rod assembly that extends from the switchable magnet for positioning the switchable magnet on the decking. The handle rod assembly includes a switch linkage, with the switch linkage extending from the actuator of the switchable magnet to a distal end of the handle rod assembly with a handle for a user. An individual can rotate a locking lever of the stop device to engage or disengage the stop device on the decking.

Decking stop device

A stop device for holding a unit load device in place on decking is described. In one example, the stop device includes a switchable magnet with an actuator to engage or disengage the stop device on decking using a switchable magnetic field of the stop device. The stop device also includes an interface bumper secured over a first surface of the switchable magnet, a foot plate secured over a second surface of the switchable magnet, and a handle rod assembly that extends from the switchable magnet for positioning the switchable magnet on the decking. The handle rod assembly includes a switch linkage, with the switch linkage extending from the actuator of the switchable magnet to a distal end of the handle rod assembly with a handle for a user. An individual can rotate a locking lever of the stop device to engage or disengage the stop device on the decking.

Electrostatic chuck with differentiated ceramics
11410869 · 2022-08-09 · ·

Electrostatic chucks (ESCs) for reactor or plasma processing chambers, and methods of fabricating ESCs, are described. In an example, a substrate support assembly includes a ceramic bottom plate having heater elements therein, the ceramic bottom plate composed of alumina having a first purity. The substrate support assembly also includes a ceramic top plate having an electrode therein, the ceramic top plate composed of alumina having a second purity higher than the first purity. A bond layer is between the ceramic top plate and the ceramic bottom plate. The ceramic top plate is in direct contact with the bond layer, and the bond layer is in direct contact with the ceramic bottom plate.