Patent classifications
B23Q3/15
ELECTROSTATIC CHUCK DEVICE
An electrostatic chuck device (1) including: an electrostatic chuck member (2) formed of ceramics; a temperature control base member (3) formed of metal; and a power supply terminal (16) which is inserted in the temperature control base member (3) and applies a voltage to an electrode for electrostatic attraction (13) which is provided on the electrostatic chuck member (2), the electrode for electrostatic attraction (13) and the power supply terminal (16) are connected with each other via a conductive adhesive layer (17), the conductive adhesive layer (17) contains a carbon fiber and a resin, and the carbon fiber has an aspect ratio of 100 or higher.
ELECTROSTATIC CHUCK DEVICE
An electrostatic chuck device (1) including: an electrostatic chuck member (2) formed of ceramics; a temperature control base member (3) formed of metal; and a power supply terminal (16) which is inserted in the temperature control base member (3) and applies a voltage to an electrode for electrostatic attraction (13) which is provided on the electrostatic chuck member (2), the electrode for electrostatic attraction (13) and the power supply terminal (16) are connected with each other via a conductive adhesive layer (17), the conductive adhesive layer (17) contains a carbon fiber and a resin, and the carbon fiber has an aspect ratio of 100 or higher.
MAGNETIC COUPLING DEVICE WITH AT LEAST ONE OF A SENSOR ARRANGEMENT AND A DEGAUSS CAPABILITY
Magnetic coupling devices are disclosed having magnetic field sensors. The magnetic coupling device may include a calibration module for calibrating the magnetic coupling devices.
MAGNETIC COUPLING DEVICE WITH AT LEAST ONE OF A SENSOR ARRANGEMENT AND A DEGAUSS CAPABILITY
Magnetic coupling devices are disclosed having magnetic field sensors. The magnetic coupling device may include a calibration module for calibrating the magnetic coupling devices.
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
A disclosed substrate support includes a base and first and second supports. A refrigerant flow path is formed inside the base. The base has first to third regions. The first region has a circular upper surface. The second region surrounds the first region. The third region surrounds the second region. The upper surface of the first region, the upper surface of the second region, and the upper surface of the third region are flat and continuous. The first support is provided on the first region and is configured to support the substrate placed thereon. The second support is provided on the third region to surround the first support, is configured to support the edge ring placed thereon, and is separated from the first support.
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
A disclosed substrate support includes a base and first and second supports. A refrigerant flow path is formed inside the base. The base has first to third regions. The first region has a circular upper surface. The second region surrounds the first region. The third region surrounds the second region. The upper surface of the first region, the upper surface of the second region, and the upper surface of the third region are flat and continuous. The first support is provided on the first region and is configured to support the substrate placed thereon. The second support is provided on the third region to surround the first support, is configured to support the edge ring placed thereon, and is separated from the first support.
Tiled display and method of assembling the same
There is provided a tiled display including: a plurality of display devices; a plurality of first magnets in contact with a surface of each of the display devices; a wall portion configured to be attached to and detached from the display devices; and a plurality of second magnets disposed on a surface of the wall portion and in line with the first magnets. The second magnets are movable in a direction perpendicular to or intersecting the surface of the wall portion. Accordingly, it is possible to attach/release the plurality of display devices to/from the wall portion by forming an attractive force or a repulsive force between the first magnets and the second magnets.
Tiled display and method of assembling the same
There is provided a tiled display including: a plurality of display devices; a plurality of first magnets in contact with a surface of each of the display devices; a wall portion configured to be attached to and detached from the display devices; and a plurality of second magnets disposed on a surface of the wall portion and in line with the first magnets. The second magnets are movable in a direction perpendicular to or intersecting the surface of the wall portion. Accordingly, it is possible to attach/release the plurality of display devices to/from the wall portion by forming an attractive force or a repulsive force between the first magnets and the second magnets.
Electropermanent magnet array
An electropermanent magnet array is provided. The electropermanent magnet array includes one or more of a plurality of electropermanent magnets of common length, arranged in a parallel fashion, and a planar pole piece, coupled to the first ends of the plurality of electropermanent magnets. Each electropermanent magnet includes a first and a second end opposite the first end.
ELECTROSTATIC CHUCK
An electrostatic chuck includes a ceramic dielectric substrate, a base plate, a heater part, and a bypass part. The ceramic dielectric substrate includes a substrate upper surface and a substrate lower surface. The heater part is disposed between the substrate upper surface and the substrate lower surface. The heater part includes at least one heater layer. The heater part includes a heater upper surface and a heater lower surface. The bypass part includes a first bypass portion disposed lower than the substrate lower surface. The first bypass portion including a first bypass upper surface and a first bypass lower surface. A second distance between the heater lower surface and the first bypass upper surface is greater than a first distance between the heater upper surface and the substrate upper surface.