A removing apparatus includes a table, multiple chucks, a nozzle and a table cover. The table is horizontally provided and configured to be rotated around a vertical rotation center line. The multiple chucks are disposed at a distance therebetween around the rotation center line of the table. The nozzle is configured to supply a processing liquid to a substrate held by the chuck. The table cover is configured to receive the processing liquid from above the table. The table cover has an inclined member of a conical shape having a decreasing height as the inclined member goes away from the rotation center line of the table while having a constant height in a rotation direction.

A grinding apparatus acquires a ground-off quantity of a wafer that is being ground, by subtracting a vertical length |(H0−H1)| by which grindstones are worn that is acquired by an upper surface height measuring instrument that is selectively lifted and lowered in unison with a grinding mechanism from a distance |(Z0−Z1)| by which the grinding mechanism is lowered that is acquired by a Z-axis encoder coupled with the grinding mechanism. Since the ground-off quantity of the wafer is acquired using the upper surface height measuring instrument and the Z-axis encoder, it is not necessary to determine the ground-off quantity of the wafer with use of only an upper surface height measuring instrument disposed on a foundation, as has been customary heretofore.

In a substrate polishing apparatus where a polishing liquid passes through inside a rotary joint, the rotary joint requires maintenance. There is provided a substrate polishing apparatus that includes: a polishing head for holding a substrate; a rotary table that has a surface to which a first opening portion is provided; a polishing liquid discharge mechanism disposed to the rotary table; and a controller configured to control at least the polishing liquid discharge mechanism. The polishing liquid discharge mechanism includes a first cylinder, a first piston, and a driving mechanism that drives the first piston. The first opening portion is communicated with a liquid holding space defined by the first cylinder and the first piston. The controller controls the driving of the first piston by the driving mechanism to increase and decrease a volume of the liquid holding space.

To provide a manufacturing method of a semiconductor device including a semiconductor substrate, the manufacturing method of the semiconductor device including a sticking for sticking a protection tape to a first surface of the semiconductor substrate, a first grinding for supporting the protection tape and grinding a second surface of the semiconductor substrate that is a surface on the opposite side of the first surface, a protection tape cutting for supporting the second surface of the semiconductor substrate and flattening the protection tape, and a second grinding for supporting the protection tape and grinding the second surface of the semiconductor substrate. In the second grinding, in order to leave a convex part in an outer circumference of the semiconductor substrate, an inside of the convex part may be ground.

The present disclosure relates to a laboratory wheel grinder and a method for plane grinding a lower side of specimens, in particular mounted specimens, as well as a replacement grinding disc for the laboratory wheel grinder and the use of a grinding disc in a laboratory wheel grinder, wherein the grinding disc is divided into a peripheral annular first surface and a central second surface arranged within the peripheral annular first surface wherein the upper surface of the carrier disc is covered with the abrasive only in the peripheral annular first surface so as to form a grinding peripheral annular first surface and a passive central second surface.

The present disclosure relates to a laboratory wheel grinder and a method for plane grinding a lower side of specimens, in particular mounted specimens, as well as a replacement grinding disc for the laboratory wheel grinder and the use of a grinding disc in a laboratory wheel grinder, wherein the grinding disc is divided into a peripheral annular first surface and a central second surface arranged within the peripheral annular first surface wherein the upper surface of the carrier disc is covered with the abrasive only in the peripheral annular first surface so as to form a grinding peripheral annular first surface and a passive central second surface.

A manufacturing method for a substrate wafer, including: a wafer having a first and second main surface; forming a flattening resin layer on second main surface; with the flattening resin layer adsorbed and held as a reference surface, grinding or polishing first main surface as a first processing; removing flattening resin layer from the wafer; with the wafer's first main surface subjected to the first processing adsorbed and held, grinding or polishing second main surface as a second processing; with the second main surface subjected to second processing adsorbed and held, further grinding or polishing first main surface as a third processing; with first main surface subjected to third processing adsorbed and held, further grinding or polishing second main surface as a fourth processing to obtain a substrate wafer, wherein first processing and/or third processing is executed such that the wafer has a central concave or central convex thickness distribution.

A workpiece to be ground by a grinding wheel of a grinding apparatus has a first layer including a first material and a second layer including a second material that is harder to grind than the first material and stacked on the first layer. The rotational speed of the grinding wheel for grinding the second layer, i.e., a second rotational speed, is lower than the rotational speed of the grinding wheel for grinding the first layer, i.e., a first rotational speed. The second layer can thus be ground effectively, as it is not necessary to use a grinding wheel with a high grinding capability or to lower a rate at which the workpiece is ground. Consequently, it is possible to maintain productivity for device chips manufactured by dividing the workpiece, and also prevent the footprint of the grinding apparatus from increasing.

A platen for a metallographic grinder has an outer peripheral rim with an upper surface having a lower height. Also, fingers engaging a specimen are allowed to move laterally (i.e., wobble) to minimize the tipping forces on the specimen during the grinding process. Either one or both of these structures can be employed and results in a much flatter specimen surface for use in subsequent analysis.

A grinding method for grinding a workpiece includes a first grinding step of grinding the workpiece in such a manner that an outer circumferential part of the workpiece becomes thinner than a central part of the workpiece, a measurement step of measuring the thickness of the workpiece at the outer circumferential part, and a second grinding step of grinding the workpiece. In the second grinding step, the grinding is started from the central part of the workpiece and the grinding is ended when the workpiece reaches a finished thickness decided based on the thickness of the workpiece at the outer circumferential part measured in the measurement step.