A machining machine includes an annular bottom working disk and a top counter bearing element. The bottom working disk and top counter bearing element are driven to rotate relative to each other. A working gap is defined between the bottom working disk and the top counter bearing to machine flat work pieces on at least one side. A means for generating a local deformation of the bottom working disk are also provided.

A machining machine comprises a first support disk, a first working disk coupled to the first support disk, and a counter bearing element positioned to define a working gap between the first working disk and the counter bearing element. The first working disk and the counter bearing element are configured to rotate relative to each other to machine at least one side of a flat workpiece. A pressure volume is positioned between the first support disk and the first working disk and is configured to hold a pressure fluid, which generates a pressure configured to deform the first working disk. One or more temperature-controlling channels are positioned within the first working disk and configured to hold a temperature-controlling fluid that is configured to control a temperature of the first working disk, wherein the one or more temperature-controlling channels are fluidly separate from the pressure volume.

A learning device includes a learning unit that executes learning of determining a corrected polishing condition by updating an action value function based on state information including at least one polishing condition and a calculation result calculated based on at least one measured value during polishing.

A learning device includes a learning unit that executes learning of determining a corrected polishing condition by updating an action value function based on state information including at least one polishing condition and a calculation result calculated based on at least one measured value during polishing.

The present application relates to a pad-temperature regulating apparatus for regulating a temperature of a surface of a polishing pad. The pad-temperature regulating apparatus includes a pad-contact member, a supply system for supplying a heating liquid and a cooling liquid into the pad contact member, a pad-temperature measuring device for measuring the temperature of the surface of the polishing pad, and a controller for performing a PID control of manipulated variables of a first flow control valve and a second flow control valve. The controller includes a memory in which a learned model constructed to maintain a temperature behavior curve, created based on measured values of the pad-temperature measuring device, within a predetermined allowable range, is stored; and a processing device which inputs at least one temperature behavior parameter to the learned model, and performs a calculation to output a change value of PID parameter for the PID control.

The present application relates to a pad-temperature regulating apparatus for regulating a temperature of a surface of a polishing pad. The pad-temperature regulating apparatus includes a pad-contact member, a supply system for supplying a heating liquid and a cooling liquid into the pad contact member, a pad-temperature measuring device for measuring the temperature of the surface of the polishing pad, and a controller for performing a PID control of manipulated variables of a first flow control valve and a second flow control valve. The controller includes a memory in which a learned model constructed to maintain a temperature behavior curve, created based on measured values of the pad-temperature measuring device, within a predetermined allowable range, is stored; and a processing device which inputs at least one temperature behavior parameter to the learned model, and performs a calculation to output a change value of PID parameter for the PID control.

A system for monitoring one or more of an abrading tool, a consumable abrasive product and a workpiece, the system can optionally comprise: a data storage device; a sensor; a communication unit; a consumable abrasive product that is attachable to and detachable from the abrading tool and configured to abrade the workpiece; a computing system comprising one or more computing devices configured to: receive a first data from the communication unit regarding the sensor, the first data indicative of at least one operating parameter of one or more of the abrading tool, the consumable abrasive product and the workpiece; identify if the at least one operating parameter falls outside a predetermined operating parameter range; and if the at least one operating parameter falls outside a predetermined operating parameter range, store a second data based upon the first data in the data storage device.

A system for monitoring one or more of an abrading tool, a consumable abrasive product and a workpiece, the system can optionally comprise: a data storage device; a sensor; a communication unit; a consumable abrasive product that is attachable to and detachable from the abrading tool and configured to abrade the workpiece; a computing system comprising one or more computing devices configured to: receive a first data from the communication unit regarding the sensor, the first data indicative of at least one operating parameter of one or more of the abrading tool, the consumable abrasive product and the workpiece; identify if the at least one operating parameter falls outside a predetermined operating parameter range; and if the at least one operating parameter falls outside a predetermined operating parameter range, store a second data based upon the first data in the data storage device.

An apparatus for performing a polishing process includes: a rotatable polishing pad; a temperature sensor configured to monitor a temperature on a top surface of the rotatable polishing pad; a first dispenser configured to dispense a first slurry that is maintained at a first temperature on the rotatable polishing pad; and a second dispenser configured to dispense a second slurry that is maintained at a second temperature on the rotatable polishing pad, wherein the second temperature is different from the first temperature so as to maintain the temperature on the top surface of the rotatable polishing pad at a substantially constant value.

An apparatus for performing a polishing process includes: a rotatable polishing pad; a temperature sensor configured to monitor a temperature on a top surface of the rotatable polishing pad; a first dispenser configured to dispense a first slurry that is maintained at a first temperature on the rotatable polishing pad; and a second dispenser configured to dispense a second slurry that is maintained at a second temperature on the rotatable polishing pad, wherein the second temperature is different from the first temperature so as to maintain the temperature on the top surface of the rotatable polishing pad at a substantially constant value.