A grinding apparatus including a robot, a grinding tool attached to the robot, a force sensor configured to detect a force exerted on the grinding tool, and a controller connected with the force sensor and configured to control the robot. The controller includes a variation acquiring section configured to acquire the present position of the robot by pressing the grinding tool against a reference surface in such a manner that a pressing force detected by the force sensor is constant, and to acquire a difference between the acquired present position and a reference position of the robot stored in advance, the difference being acquired as a variation of the grinding tool.

A grinding apparatus including a robot, a grinding tool attached to the robot, a force sensor configured to detect a force exerted on the grinding tool, and a controller connected with the force sensor and configured to control the robot. The controller includes a variation acquiring section configured to acquire the present position of the robot by pressing the grinding tool against a reference surface in such a manner that a pressing force detected by the force sensor is constant, and to acquire a difference between the acquired present position and a reference position of the robot stored in advance, the difference being acquired as a variation of the grinding tool.

A polishing assembly and method for polishing optical cables, the polishing assembly having a platform configured to receive a polishing film and configured to rotate according to a dual orbital motion; a force gauge functionally coupled to the platform and configured to measure downward force applied against the platform; a mounting fixture configured to mount a plurality of optical cables; and a movable arm configured to move the mounting fixture downwards to press mounted cables against the polishing film, upwards to pull the mounted cables away from the polishing film, and to rotate circularly along a continuous circular path. The optical cables are pressed against the rotating polishing film while simultaneously monitoring the downward force applied against the platform so that downward force can be maintained within a prescribed tolerance throughout the polishing process.

A polishing assembly and method for polishing optical cables, the polishing assembly having a platform configured to receive a polishing film and configured to rotate according to a dual orbital motion; a force gauge functionally coupled to the platform and configured to measure downward force applied against the platform; a mounting fixture configured to mount a plurality of optical cables; and a movable arm configured to move the mounting fixture downwards to press mounted cables against the polishing film, upwards to pull the mounted cables away from the polishing film, and to rotate circularly along a continuous circular path. The optical cables are pressed against the rotating polishing film while simultaneously monitoring the downward force applied against the platform so that downward force can be maintained within a prescribed tolerance throughout the polishing process.

An endless abrasive belt for a sanding machine includes a flexible support structure, on an upper side of the support structure, an active layer with a binder and abrasive grains held in the binder. A transponder device is affixed to an underside of the endless abrasive belt, the transponder device including an attachment region and a flag, the attachment region being glued onto the underside by an adhesive layer, the flag being held by the attachment region and projecting laterally away from the endless abrasive belt, and a transponder including a transponder chip and an aerial for a wireless data connection with the sanding machine is arranged in the flag.

An endless abrasive belt for a sanding machine includes a flexible support structure, on an upper side of the support structure, an active layer with a binder and abrasive grains held in the binder. A transponder device is affixed to an underside of the endless abrasive belt, the transponder device including an attachment region and a flag, the attachment region being glued onto the underside by an adhesive layer, the flag being held by the attachment region and projecting laterally away from the endless abrasive belt, and a transponder including a transponder chip and an aerial for a wireless data connection with the sanding machine is arranged in the flag.

The present invention relates to a device for polishing a specimen (104, 204). The device comprises a polishing platen (101, 201) rotatable about an axis, a polishing pad (103, 203) attached to the polishing platen (101, 201), a specimen holder (105, 205) for holding the specimen (104, 204) against the polishing pad (103, 203), means (107, 110, 207, 212) for measuring a physical quantity in a plurality of positions on the polishing pad (103, 203), the physical quantity being indicative of the moisture or the friction, and means (116, 119, 120, 121, 213, 215, 216, 217) for dispensing a polishing suspension, based on values of the measured physical quantity, to the plurality of positions on the polishing pad (103, 203). The invention also relates to a method for polishing a specimen (104, 204).

The present invention relates to a device for polishing a specimen (104, 204). The device comprises a polishing platen (101, 201) rotatable about an axis, a polishing pad (103, 203) attached to the polishing platen (101, 201), a specimen holder (105, 205) for holding the specimen (104, 204) against the polishing pad (103, 203), means (107, 110, 207, 212) for measuring a physical quantity in a plurality of positions on the polishing pad (103, 203), the physical quantity being indicative of the moisture or the friction, and means (116, 119, 120, 121, 213, 215, 216, 217) for dispensing a polishing suspension, based on values of the measured physical quantity, to the plurality of positions on the polishing pad (103, 203). The invention also relates to a method for polishing a specimen (104, 204).

A novel polishing apparatus which determines a polishing end point of a substrate on the basis of a strain of a constituent element of the polishing apparatus caused by friction between a substrate such as a wafer and a polishing pad. The polishing apparatus includes a rotatable polishing table which supports a polishing pad, a polishing head which presses the substrate against the polishing pad, a rotating shaft connected to the polishing head, a support structure which rotatably supports the rotating shaft, a strain measuring instrument which measures a strain of the support structure, and an end point detector which determines a polishing end point of the substrate on the basis of a change in the strain. The strain measuring instrument includes at least one strain sensor fixed to the support structure.

A novel polishing apparatus which determines a polishing end point of a substrate on the basis of a strain of a constituent element of the polishing apparatus caused by friction between a substrate such as a wafer and a polishing pad. The polishing apparatus includes a rotatable polishing table which supports a polishing pad, a polishing head which presses the substrate against the polishing pad, a rotating shaft connected to the polishing head, a support structure which rotatably supports the rotating shaft, a strain measuring instrument which measures a strain of the support structure, and an end point detector which determines a polishing end point of the substrate on the basis of a change in the strain. The strain measuring instrument includes at least one strain sensor fixed to the support structure.