A cleaning device arranged in a table which is driven. The cleaning device includes one or more cleaning through holes provided in the table and opened at positions facing a workpiece or a jig, a container unit provided in the table and including a storage space which receives cleaning fluid; a movable member that is arranged in the container unit, that defines the storage space, and that is supported movably in a direction intersecting a horizontal axis line; and a cleaning piping component connecting the storage space and the cleaning through holes.

A cleaning device arranged in a table which is driven. The cleaning device includes one or more cleaning through holes provided in the table and opened at positions facing a workpiece or a jig, a container unit provided in the table and including a storage space which receives cleaning fluid; a movable member that is arranged in the container unit, that defines the storage space, and that is supported movably in a direction intersecting a horizontal axis line; and a cleaning piping component connecting the storage space and the cleaning through holes.

A dressing apparatus 200 includes a bus member 203 which is equipped with a ceiling plate 201 and a circular or polygonal cylindrical skirt portion 202 provided at a bottom surface of the ceiling plate 201 and which is configured to accommodate a polishing pad 131 from thereabove. The bus member 203 includes a dual fluid nozzle 204 configured to jet a cleaning liquid and a gas onto a polishing surface of the polishing pad 131; a dress board 205 configured to come into contact with the polishing surface of the polishing pad 131; and a rinse nozzle 206 configured to supply a rinse liquid onto a contact surface between the polishing surface of the polishing pad 131 and the dress board 205. A cleaning liquid, a fragment of a grindstone or a sludge is suppressed from being scattered around by the skirt portion 202.

A dressing apparatus 200 includes a bus member 203 which is equipped with a ceiling plate 201 and a circular or polygonal cylindrical skirt portion 202 provided at a bottom surface of the ceiling plate 201 and which is configured to accommodate a polishing pad 131 from thereabove. The bus member 203 includes a dual fluid nozzle 204 configured to jet a cleaning liquid and a gas onto a polishing surface of the polishing pad 131; a dress board 205 configured to come into contact with the polishing surface of the polishing pad 131; and a rinse nozzle 206 configured to supply a rinse liquid onto a contact surface between the polishing surface of the polishing pad 131 and the dress board 205. A cleaning liquid, a fragment of a grindstone or a sludge is suppressed from being scattered around by the skirt portion 202.

A conditioner of a chemical mechanical polishing (CMP) apparatus includes a disk to polish a polishing pad of the CMP apparatus, a driver to rotate the disk, a lifter to lift the driver, an arm to rotate the lifter, and a connector to connect the driver to the lifter, the driver being tiltable with respect to the lifter.

A self-cleaning device of the present disclosure includes: a cleaning member configured to clean a cleaning tool that cleans a substrate; and an injection unit configured to inject a liquid toward the cleaning member or the cleaning tool. The cleaning member has a cleaning surface that cleans the cleaning tool when the cleaning tool is pressed thereagainst, and the cleaning surface is inclined with respect to a horizontal plane.

A self-cleaning device of the present disclosure includes: a cleaning member configured to clean a cleaning tool that cleans a substrate; and an injection unit configured to inject a liquid toward the cleaning member or the cleaning tool. The cleaning member has a cleaning surface that cleans the cleaning tool when the cleaning tool is pressed thereagainst, and the cleaning surface is inclined with respect to a horizontal plane.

A cleaning device arranged in a table which is driven. The cleaning device includes one or more cleaning through holes provided in the table and opened at positions facing a workpiece or a jig, a container unit provided in the table and including a storage space which receives cleaning fluid; a movable member that is arranged in the container unit, that defines the storage space, and that is supported movably in a direction intersecting a horizontal axis line; and a cleaning piping component connecting the storage space and the cleaning through holes.

A cleaning device arranged in a table which is driven. The cleaning device includes one or more cleaning through holes provided in the table and opened at positions facing a workpiece or a jig, a container unit provided in the table and including a storage space which receives cleaning fluid; a movable member that is arranged in the container unit, that defines the storage space, and that is supported movably in a direction intersecting a horizontal axis line; and a cleaning piping component connecting the storage space and the cleaning through holes.

A multifunctional hub according to the present invention includes a box body, and the box body is provided with a sliding cavity with an upward opening therein, and an annular slider is slidably slid in the sliding cavity. The multifunctional hub of the present invention has simple and clear operation, sensitive response, saving time and labor; at the same time, the device of the present invention is rich in functions, fixed and reliable, and highly practical.