In order to provide a tool holder for holding a tool for treating the surface of a workpiece by means of which it is possible to treat workpieces in a low-vibratory and convenient manner, it is proposed that the tool holder comprise a disk-shaped base body which has an attachment section for the attachment of the tool holder to a machine tool and at least one resiliently flexible deformation section.

In order to provide a tool holder for holding a tool for treating the surface of a workpiece by means of which it is possible to treat workpieces in a low-vibratory and convenient manner, it is proposed that the tool holder comprise a disk-shaped base body which has an attachment section for the attachment of the tool holder to a machine tool and at least one resiliently flexible deformation section.

A tool (1) for surface finish machining, having a cushion (6) made of an elastic plastics foam, on the underside of which there is formed a working medium face (2) having working media or adhesives (8, 11, 12, 13) for the releasable attachment of working medium discs and on the top side of which there is formed a drive receptacle (4, 5) for application of work, is created as a product that is producible easily and non-critically in high volume, is extremely robust in use, is moisture-resistant and is able to withstand high rotational speeds, in that the elastic plastics foam consists of closed-cell expanded and fused-together particles of a thermoplastic elastomer (TPE).

A system for monitoring contamination level of effluent of an offline brush conditioning system includes a first set of reservoirs configured to collect first effluents from corresponding portions of a first brush and a second set of reservoirs configured to collect second effluents from corresponding portions of a second brush, and the first and second effluents are from a fluid used to condition the first and second brushes that are configured to clean a surface of a semiconductor wafer. An effluent contamination monitor is configured to monitor contamination levels of the first and second effluents, wherein the monitored contamination levels may provide feedback for use in the brush conditioning.

An elastic self-lubricating polishing tool includes an elastic grinding layer including an abrasive member and an elastic base layer affixed to the abrasive member, an absorbing layer absorbing and sustainedly releasing liquid inside of the absorbing layer, and an adhesive layer overlappedly connected with the elastic base layer of the elastic grinding layer and the absorbing layer. The elastic self-lubricating polishing tool is elastic and self-lubricating to sand and polish a surface of a workpiece.

An abrasive segment includes a carrier body for attaching the abrasive segment to a lateral surface of an abrasive roll in an interlocking manner; and a substantially planar abrasive layer. The abrasive layer is oriented substantially parallel to the lateral surface of the abrasive roll in a state of the abrasive segment in which it is attached to the abrasive roll, and an elastic intermediate layer is located between the carrier body and the abrasive layer.

The method is for producing a disk of the type having a central hub surrounded by an abrasive material, the hub having an aperture of the type provided in abrasive discs sold by Robert Bosch GmbH under the trademark X-LOCK, the method comprising the steps: positioning a metal hub against an abrasive disc, the metal hub having an annular portion and a plurality of tabs, the annular portion defining an aperture of the type provided in abrasive discs sold by Robert Bosch GmbH under the trademark X-LOCK and the plurality of tabs protruding from the annular portion, against an abrasive disc, the abrasive disc having a central void, and the positioning being such that the metal hub occludes the central void and the tabs protrude through the disc; and bending the tabs such that the abrasive disc is gripped between the annular portion and the tabs.

A method and systems for controlling optical transmissivity of a polish pad material are provided. The method and systems may include adjusting control parameters to determine the optical transmissivity of a polish pad material. The control parameters may also include pre-processing controls, casting controls, and/or curing controls. Methods and systems also provided for assembling a polish pad that controls the optical transmissivity of the polish pad. Additionally, a polish pad with a controlled optical transmissivity is provided.

A method and systems for controlling optical transmissivity of a polish pad material are provided. The method and systems may include adjusting control parameters to determine the optical transmissivity of a polish pad material. The control parameters may also include pre-processing controls, casting controls, and/or curing controls. Methods and systems also provided for assembling a polish pad that controls the optical transmissivity of the polish pad. Additionally, a polish pad with a controlled optical transmissivity is provided.

There are provided a polishing pad and a polishing method using the same that are useful for removing the surface waviness of a curved resin-painted surface at a high polishing removal rate. A polishing pad (10) according to one aspect of the present invention includes a layer having a polishing surface (30). The layer having the polishing surface (30) has a sparse and dense structure in which a proportion of a sparse portion of the polishing surface (30) is 52% or more and 96% or less, and is composed of a sheet material having an A hardness of 70 or more measured according to JIS K 6253.