Patent classifications
B24D18/0045
Vulcanized fiber grinding tool
The invention relates to a vulcanized fiber grinding tool (1) comprising two vulcanized fiber grinding disks (2, 3) which are adhered to each other over the entire surface by means of an adhesive layer (4) arranged between the vulcanized fiber grinding disks (2, 3) such that the vulcanized fiber grinding disk (2, 3) outer faces provided with the grinding means point away from each other and the use of a support plate is not necessary.
Sanding element and method for manufacturing a sanding element
Disc-shaped sanding element (1) and method for manufacturing this sanding element (1) with a circular circumference with at least two layers (4,5,6) bonded to each other containing abrasive grains (11, 12), wherein these layers (4,5,6) extend at least to the circumference of the sanding element (1) in order to form a sanding edge (8) on this circumference (7), wherein each of these layers (4,5,6) has layer properties including compressibility, abrasive grain density, abrasive grain size and grain material. The layers (4,5,6) contain a three-dimensional thread or fibre structure in which said abrasive grains (11,12) are distributed, wherein adjacent layers (4,5,6) have at least one different layer property.
CMP PAD CONSTRUCTION WITH COMPOSITE MATERIAL PROPERTIES USING ADDITIVE MANUFACTURING PROCESSES
Embodiments of the disclosure generally provide polishing pads includes a composite pad body and methods for forming the polishing pads. One embodiment provides a polishing pad including a composite pad body. The composite pad body includes one or more first features formed from a first material or a first composition of materials, and one or more second features formed from a second material or a second composition of materials, wherein the one or more first features and the one or more second features are formed by depositing a plurality of layers comprising the first material or first composition of materials and second material or second composition of materials.
Form dressing roller
A form dressing roller with a carrier body and a freestanding cover ring containing diamond grains and/or diamond rods configured in ceramic, metallic, or resin bond. The form dressing roller is made and used for dressing diamond and CBN grinding wheels as well as conventional wheels with abrasives made of corundum or silicon carbide. The form dressing roller includes clamping screws for securing the cover ring between the carrier body and an attachment ring, and includes a receiving hole in the center of the carrier body. The cover ring has at least three recesses.
ABRASIVE DISC WITH LATERAL COVER LAYER
A grinding disc includes an inner layer (20) which is made of grindable material (containing abrasive particles) and an outer layer (20) which covers at least a portion of the surface of the inner layer (50) and which is made of non-grindable material (i.e. not-containing abrasive grain).
METHOD FOR MANUFACTURING POLISHING HEAD, POLISHING HEAD, AND POLISHING APPARATUS
A method for manufacturing a polishing head, includes: forming, on a lower end surface of an intermediate plate, a groove which extends from an inlet of an incompressible fluid to an outer peripheral portion of the intermediate plate and a groove which extends from an outlet of air to the outer peripheral portion of the intermediate plate, also including, after attaching an elastic film to a lower end surface of a rigid ring and coupling an upper end surface of the rigid ring with the lower end surface of the intermediate plate to form a space section: depressurizing the inside of the space section; and discharging the air in the space section from the outlet while pouring the incompressible fluid into the space section from the inlet after the depressurizing, and closing the inlet and outlet to seal the incompressible fluid in the space section.
CMP pad construction with composite material properties using additive manufacturing processes
Embodiments of the disclosure generally provide polishing pads includes a composite pad body and methods for forming the polishing pads. One embodiment provides a polishing pad including a composite pad body. The composite pad body includes one or more first features formed from a first material or a first composition of materials, and one or more second features formed from a second material or a second composition of materials, wherein the one or more first features and the one or more second features are formed by depositing a plurality of layers comprising the first material or first composition of materials and second material or second composition of materials.
POLISHING PAD, METHOD FOR MANUFACTURING POLISHING PAD, AND POLISHING METHOD
A polishing pad for a chemical-mechanical polishing apparatus includes a first support layer and a polishing layer. The polishing layer is present on the first support layer. The polishing layer has a top surface that faces away from the first support layer and at least one first cavity that is buried at least beneath the top surface of the polishing layer.
Buffing pad and methods of making and using the same
A buffing pad having a front surface portion, a moisture barrier upon which the front surface is disposed, a compressible foam portion disposed below the moisture barrier, and a rear surface. The front surface portion has a plurality of indentations formed by RF welding and the rear surface has an attachment portion capable of attaching the buffing pad to a power tool. Methods of manufacturing and using a buffing pad.
APPARATUS AND METHOD OF FORMING A POLISHING ARTICLE THAT HAS A DESIRED ZETA POTENTIAL
Implementations described herein generally relate to polishing articles and methods of manufacturing polishing articles used in polishing processes and cleaning processes. More particularly, implementations disclosed herein relate to composite polishing articles having graded properties. In one implementation, a polishing article is provided. The polishing article comprises one or more exposed first regions formed from a first material and having a first zeta potential and one or more second exposed regions formed from a second material and having a second zeta potential, wherein the first zeta potential is different from the second zeta potential.