Patent classifications
B29C33/56
MOLD FOR INJECTION MOLDING PROCESSES AND MOLDING PROCESS USING THE MOLD
A mold for injection molding processes and a molding process that uses the mold. The mold has, at at least one part of the surface of its cavity raised portions which are longitudinally extended, are arranged side by side and are oriented substantially in the direction of the flow of the melted plastic material that is injected. During the process, the surface of the cavity of the mold is kept at a temperature that is lower than the glass transition temperature, in the case of molding of plastic material constituted by amorphous polymers, and lower than the crystallization temperature, in the case of molding of plastic material constituted by semicrystalline polymers.
MOLD FOR INJECTION MOLDING PROCESSES AND MOLDING PROCESS USING THE MOLD
A mold for injection molding processes and a molding process that uses the mold. The mold has, at at least one part of the surface of its cavity raised portions which are longitudinally extended, are arranged side by side and are oriented substantially in the direction of the flow of the melted plastic material that is injected. During the process, the surface of the cavity of the mold is kept at a temperature that is lower than the glass transition temperature, in the case of molding of plastic material constituted by amorphous polymers, and lower than the crystallization temperature, in the case of molding of plastic material constituted by semicrystalline polymers.
METHODS FOR CREATING LARGE-AREA COMPLEX NANOPATTERNS FOR NANOIMPRINT MOLDS
Some embodiments of the invention provide methods that can create large area complex patterns for nanoimprint molds without or with very litter of the use of the charged beam or photon beam direct-writing of nanostructures. Some embodiments of the invention use (i) Fourier nanoimprint patterning (FNP), (ii) edge-guided nanopatterning (EGN), and (iii) nanostructure self-perfection, and their combinations.
METHODS FOR CREATING LARGE-AREA COMPLEX NANOPATTERNS FOR NANOIMPRINT MOLDS
Some embodiments of the invention provide methods that can create large area complex patterns for nanoimprint molds without or with very litter of the use of the charged beam or photon beam direct-writing of nanostructures. Some embodiments of the invention use (i) Fourier nanoimprint patterning (FNP), (ii) edge-guided nanopatterning (EGN), and (iii) nanostructure self-perfection, and their combinations.
Synthetic polymer film and production method of synthetic polymer film
A synthetic polymer film whose surface has a plurality of raised or recessed portions, wherein a two-dimensional size of the plurality of raised or recessed portions is in a range of not less than 0.5 μm and not more than 3 μm when viewed in a normal direction of the synthetic polymer film, the synthetic polymer film has a crosslink structure and contains an organic carboxylic acid, at the lapse of 5 minutes since placing a 200 μL drop of water on the surface of the synthetic polymer film, a pH of an aqueous solution is less than 4, and an area equivalent circle diameter of the aqueous solution is not less than 20 mm, and at the lapse of 60 seconds since placing a drop of water on the surface of the synthetic polymer film, a static contact angle of the water drop with respect to the surface is less than 3°.
Synthetic polymer film and production method of synthetic polymer film
A synthetic polymer film whose surface has a plurality of raised or recessed portions, wherein a two-dimensional size of the plurality of raised or recessed portions is in a range of not less than 0.5 μm and not more than 3 μm when viewed in a normal direction of the synthetic polymer film, the synthetic polymer film has a crosslink structure and contains an organic carboxylic acid, at the lapse of 5 minutes since placing a 200 μL drop of water on the surface of the synthetic polymer film, a pH of an aqueous solution is less than 4, and an area equivalent circle diameter of the aqueous solution is not less than 20 mm, and at the lapse of 60 seconds since placing a drop of water on the surface of the synthetic polymer film, a static contact angle of the water drop with respect to the surface is less than 3°.
Mould for producing a fibre composite component
A tool for producing a fiber composite component includes at least two tool portions which have partial cavities and which are moved together in a production position in such a manner that they form a cavity, in which cavity the fiber composite component is produced. Associated with at least a first tool portion there is a retention element which retains the fiber composite component produced in the first tool portion when the tool portions are moved apart after the production of the fiber composite component.
Mould for producing a fibre composite component
A tool for producing a fiber composite component includes at least two tool portions which have partial cavities and which are moved together in a production position in such a manner that they form a cavity, in which cavity the fiber composite component is produced. Associated with at least a first tool portion there is a retention element which retains the fiber composite component produced in the first tool portion when the tool portions are moved apart after the production of the fiber composite component.
SYSTEMS FOR DEPOSITING COATINGS ON SURFACES AND ASSOCIATED METHODS
Systems for depositing coatings onto surfaces of molds and other articles are generally provided. In some embodiments, a system is adapted and arranged to cause gaseous species to flow parallel to a filament array. In some embodiments, a system comprises one or more mold supports that are translatable.
SYSTEMS FOR DEPOSITING COATINGS ON SURFACES AND ASSOCIATED METHODS
Systems for depositing coatings onto surfaces of molds and other articles are generally provided. In some embodiments, a system is adapted and arranged to cause gaseous species to flow parallel to a filament array. In some embodiments, a system comprises one or more mold supports that are translatable.