Patent classifications
B29C59/005
METHOD FOR MANUFACTURING POLYESTER FILM FOR EMBOSSING
A method for manufacturing a polyester film for embossing is provided. A polyester composition is prepared from a recycled polyester material. The polyester composition includes a physically regenerated polyester resin and a chemically regenerated polyester resin. The polyester composition is melted and extruded so as to form a base layer. The base layer is stretched in a machine direction. A surface coating paste is coated onto the base layer. The base layer with the surface coating paste is heated and stretched in a transverse direction, such that the surface coating paste turns into a surface coating layer, and a polyester film for embossing is obtained.
Method of covering a plastic surface with a permanent coating
The invention particularly relates to a method of applying a permanent coating to a plastic surface of a first part, comprising the following steps: applying to said plastic surface a layer of a polyamide-based hot-melt material, maintaining this layer of hot-melt material on said plastic surface for a period of time ranging from a few minutes to several hours, removing this layer of hot-melt material from this plastic surface; and applying a permanent coating to said surface, said permanent coating being based on polyurethane, an epoxy resin or polyesters, a polycarbonate and/or an acrylic resin; as well as the use of such a method in the automotive industry.
ANTIVIRAL AND ANTIMICROBIAL PROTECTIVE FILMS WITH MICROSTRUCTURE DETERRENTS COMBINED WITH THERMALLY ELASTOMERIC AND EMBEDDED CHEMICAL ANTI-BACTERIAL OR ANTI-VIRAL AGENTS
An antimicrobial protective film that can be applied to a surface such as a screen of a smartphone or computing device. The user is able to view items displayed on the screen and to interact with the screen via touch or the like. The protective film includes a base layer or film upon which a second layer is formed, and this second layer includes numerous structures, e.g., micro or nano structures. The structures have a geometry that is unfriendly for viruses and bacteria. The structures are embedded with antimicrobial and/or antiviral agents that migrate out of the structures and kill or at least detrimentally affect the viruses or bacteria received within the second layer. This effect is combined with the fact that the structures are made with geometries particularly devastating to microbes during elongation and contraction of the structures with the thermal-based expansion and contraction of the underlying base layer.
FABRIC STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
The present disclosure provides a fabric structure including at least one fiber interlaced in a first pattern, and a surface layer having a second pattern not corresponding to the first pattern. The fiber includes a thermoplastic component and a functional component. The surface layer comprises a fused portion of the thermoplastic component and covers the functional component.
METHOD FOR APPLYING A MATERIAL TO A FIBER COMPOSITE COMPONENT
The invention relates to a method for applying a material (30) to a fiber composite component within an application region (13) of the fiber composite component, the fiber composite component being produced from a fiber composite material having a fiber material (11) and a matrix material (12), the method comprising the following steps: —providing at least one monofilament woven fabric (20), in which a plurality of or all threads each consist of a single filament, —arranging the at least one monofilament woven fabric (20) on a fiber preform (10) in the application region (13), which fiber preform is formed from the fiber material (11) of the fiber composite material, —curing, in a common process step, the matrix material (12) of the fiber composite material, which matrix material embeds the fibers material (11) of the fiber preform (10), and a matrix material (12) embedding the monofilament woven fabric (20), thereafter the matrix material (12) of the fiber preform (10) and the matrix material (12) of the monofilament woven fabric (20) being at least partially cured, —tearing off the monofilament woven fabric (20) integrally bonded to the fiber preform (10), and —applying the material (30) in the application region (13) after the monofilament woven fabric (20) has been torn off.
Polymer film and uses of the same
A polymer film comprising polyvinyl acetal and a laminated glass manufactured using the same are provided. At least one surface of the polymer film has a void volume (Vv) value at a material ratio of 10% ranging from 2 μm.sup.3/μm.sup.2 to 18 μm.sup.3/μm.sup.2, wherein the void volume (Vv) and material ratio are defined in accordance with ISO 25178-2:2012.
Substrates comprising nano-patterning surfaces and methods of preparing thereof
Substrates comprising a functionalizable layer, a polymer layer comprising a plurality of micro-scale or nano-scale patterns, or combinations thereof, and a backing layer and the preparation thereof by using room-temperature UV nano-embossing processes are disclosed. The substrates can be prepared by a roll-to-roll continuous process. The substrates can be used as flow cells, nanofluidic or microfluidic devices for biological molecules analysis.
CURABLE COMPOSITION FOR IMPRINTING, METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTING, CURED PRODUCT, PATTERN PRODUCING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT
Provided are a curable composition for imprinting including a polymerizable compound, a photopolymerization initiator, and a particulate metal which has a particle diameter of 1 nm or larger, as measured by a single particle ICP-MASS method, and includes at least one kind of iron, copper, titanium, or lead, in which a content of the particulate metal is 100 ppt by mass to 30 ppb by mass with respect to a solid content of the composition; a method for producing the curable composition for imprinting; a cured product using the curable composition for imprinting; a pattern producing method; and a method for manufacturing a semiconductor element.
HIGH REFRACTIVE INDEX IMPRINT COMPOSITIONS AND MATERIALS AND PROCESSES FOR MAKING THE SAME
Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition contains one or more types of nanoparticles, one or more surface ligands, one or more solvents, one or more additives, and one or more acrylates.
Graphite materials and devices with surface micro-texturing
Flexible graphite and other graphite materials with surface micro-texturing, and methods and apparatuses for micro-texturing the surface of flexible graphite and other graphite materials are provided. Micro-texturing can be used to modify wettability and/or adhesion characteristics of a flexible graphite surface. Micro-textured flexible graphite materials can be advantageously used in applications where the material is in contact with liquid water or other liquids.