The present specification provides a blanket for printing and a method for manufacturing the same.

A nanowire device of the present description may be produced with the incorporation of at least one hardmask during the fabrication of at least one nanowire transistor in order to assist in protecting an uppermost channel nanowire from damage that may result from fabrication processes, such as those used in a replacement metal gate process and/or the nanowire release process. The use of at least one hardmask may result in a substantially damage free uppermost channel nanowire in a multi-stacked nanowire transistor, which may improve the uniformity of the channel nanowires and the reliability of the overall multi-stacked nanowire transistor.

Provided is a printing blanket that is unlikely to cause portions uncoated with ink even when the printing-applied surface has protrusions. The printing blanket according to an embodiment of the present invention includes a printing surface to be pressed against a printing plate on which the ink is placed and against the surface on which printing is applied and that is a target of printing. The printing blanket further includes a substrate, an inner coating layer covering at least part of the surface of the substrate, and an outer coating layer covering at least part of the surface of the inner coating layer that is on the side opposite the substrate. The inner coating layer has a smaller Asker C hardness than the substrate, and the outer coating layer has the printing surface on the side opposite the inner coating layer.

An ink transfer medium, in particular a printing blanket, in particular a printing blanket for flexographic printing, has a cover layer for transferring an ink via a printing side and an adhesive layer for fastening the ink transfer medium to a base, in particular to a cylinder of a printing machine. The ink transfer medium is characterized by a support layer which is disposed between the cover layer and the adhesive layer, wherein the adhesive layer is disposed directly on that side of the support layer that faces away from the printing side, and wherein the support layer is a film/foil.

A nanowire device of the present description may be produced with the incorporation of at least one hardmask during the fabrication of at least one nanowire transistor in order to assist in protecting an uppermost channel nanowire from damage that may result from fabrication processes, such as those used in a replacement metal gate process and/or the nanowire release process. The use of at least one hardmask may result in a substantially damage free uppermost channel nanowire in a multi-stacked nanowire transistor, which may improve the uniformity of the channel nanowires and the reliability of the overall multi-stacked nanowire transistor.

A waterproof fabric (20) made such by the application of a protective film (10), coupled or coated on a side of the fabric (20). When the film (10) is already produced by extrusion in advance, it is attached onto the fabric and may comprise an adhesive layer (12) to the extruded film, or the adhesive layer may be coated on the fabric (20). The water/oil repellent and waterproof fabric (20) may also be obtained by coating at least one layer of materials made up of fluorocarbon, polyurethane, acrylic resins, with or without the addition of hollow microspheres of thermoplastic material.

Disclosed herein are sacrificial coating compositions comprising at least one hydrophilic polymer; at least one hygroscopic agent; at least one surfactant; at least one non-reactive silicone release agent; and water. In certain embodiments, the at least one non-reactive silicone release agent is chosen from polyether modified polysiloxane and nonreactive silicone glycol copolymers. In certain embodiments, the at least one non-reactive silicone release agent may be present in an amount ranging from about 0.001% to about 2%, based on the total weight of the composition, such as from about 0.03% to about 0.06%. Also disclosed herein is a blanket material suitable for transfix printing comprising a sacrificial coating composition, as well as an indirect printing process comprising a step of applying a sacrificial coating composition to a blanket material.

A printing blanket is provided which includes a reinforcing layer formed from a polymeric fabric reinforcing material which softens and flows at a temperature less than that used in the final curing step of forming the blanket or a polymeric reinforcing material having a thickness of between about 0.003 inches and 0.010 inches. The reinforcing layer provides a smooth surface to support an outer print surface layer and provides improved print performance while enabling a reduction in the overall thickness of the reinforcing layer.

A blanket for transferring a paste image from an engraved plate to a substrate is provided. The blanket includes a foam, a PET layer on the foam, and a paste transfer layer on the PET layer. The entire blanket has a Tan value of 0.05 to 0.10. The foam can be made of polyurethane, polyethylene, nitrile-butadiene rubber, silicone, or a combination thereof. The paste transfer layer can be made of silicone rubber, fluoro rubber, fluorosilicone rubber, a combination thereof, or a multi-layered structure thereof.

An intermediate transfer member (ITM) (44) of printing system (10), the ITM includes: (a) an outer layer (102) configured to receive droplets (11) of printing fluid for producing an image thereon, and transfer the image to target substrate (50), and (b) a stack (107) of flexible support layers, the stack includes a mesh (109), having a first section impregnated in a first layer (106) having a first elastic modulus in an axis in which a tension force is applied to the ITM (44), and a second section impregnated in a second layer (108), which is placed in contact with the first layer (106) and has in the axis, a second elastic modulus different from the first clastic modulus. In response to applying to the ITM (44) a specified level of the tension force, the stack (107) is configured to retain a predefined elongation of the ITM (44) along the axis.