The method makes it possible to produce a decorated component for a timepiece or piece of jewellery. This component provided with the decoration may be, for example, a watch hand. To produce said component, a base substrate is used and a micromachining operation is performed on or in the base substrate to obtain an upper part of the component, which is provided with the decoration. The decoration is produced through the thickness of the upper part and in a programmed pattern. Thereafter, the upper part is placed on a luminescent or colored substance to obtain the component.

A method of forming a feature in a void, the method including filling the void having at least one sloped wall with a polymeric material; forming a layer of photoresist over the polymeric material; forming a gap in the layer of photoresist; and etching the polymeric material exposed by the gap in the layer of photoresist to form a feature.

Exemplary cleaning or etching methods may include flowing a fluorine-containing precursor into a remote plasma region of a semiconductor processing chamber. Methods may include forming a plasma within the remote plasma region to generate plasma effluents of the fluorine-containing precursor. The methods may also include flowing the plasma effluents into a processing region of the semiconductor processing chamber. A substrate may be positioned within the processing region, and the substrate may include a region of exposed oxide. Methods may also include providing a hydrogen-containing precursor to the processing region. The methods may further include removing at least a portion of the exposed oxide while maintaining a relative humidity within the processing region below about 50%. Subsequent to the removal, the methods may include increasing the relative humidity within the processing region to greater than or about 50%. The methods may further include removing an additional amount of the exposed oxide.

A method includes forming a first insulating layer over a substrate, the first insulating layer having a non-planar top surface, the first insulating layer having a first etch rate. A second insulating layer is formed over the first insulating layer, the second insulating layer having a non-planar top surface, the second insulating layer having a second etch rate, the second etch rate being greater than the first etch rate. The second insulating layer is polished, the polishing partially removing the second insulating layer. The first insulating layer and the second insulating layer are non-selectively recessed.

This invention provides a method for manufacturing a decorative-part of which the joint-lines bordering the laser-irradiation regions are unnoticeable, thus avoiding deterioration of the design-quality of such a decorative-part. Of this invention, the design (4) comprises the first-blocks (6) of a plurality of design-patterns (5) that are closely arranged with the second-blocks (8) of a plurality of design-patterns (7) that are different from those of the first-blocks (6). In the laser-irradiation-region-setting process, the decorative-area is divided into a plurality of laser-irradiation regions (LR1, LR2 and LR3), at which time the joint-lines (J1, J2) are set as borders of the first-blocks (6) and the second-blocks (8) of the design (4). In the laser-irradiation process, a laser-deflector is relatively displaced, and a laser L is irradiated onto each of the laser-irradiation regions (LR1, LR2 and LR3).

A film for decorative forming includes a layered structure in which a protective layer and a colored layer are arranged sequentially in this order on a base material film, wherein, when a storage elastic modulus of the protective layer at 100° C. is written as E′a(100) and a storage elastic modulus of the colored layer at 100° C. is written as E′b(100), E′a(100) and E′b(100) satisfy conditions (1) to (3): (1) E′a(100)/E′b(100) is less than or equal to 8, (2) E′a(100) is greater than or equal to 10 MPa, (3) E′b(100) is less than or equal to 12 MPa.

A film for decorative forming includes a layered structure in which a protective layer and a colored layer are arranged sequentially in this order on a base material film, wherein, when a storage elastic modulus of the protective layer at 100° C. is written as E′a(100) and a storage elastic modulus of the colored layer at 100° C. is written as E′b(100), E′a(100) and E′b(100) satisfy conditions (1) to (3): (1) E′a(100)/E′b(100) is less than or equal to 8, (2) E′a(100) is greater than or equal to 10 MPa, (3) E′b(100) is less than or equal to 12 MPa.

A method for forming a plurality of precision holes in a substrate by drilling, including affixing a sacrificial cover layer to a surface of the substrate, positioning a laser beam in a predetermined location relative to the substrate and corresponding to a desired location of one of the plurality of precision holes, forming a through hole in the sacrificial cover layer by repeatedly pulsing a laser beam at the predetermined location, and pulsing the laser beam into the through hole formed in the sacrificial cover layer. A work piece having precision holes including a substrate having the precision holes formed therein, wherein a longitudinal axis of each precision hole extends in a thickness direction of the substrate, and a sacrificial cover layer detachably affixed to a surface of the substrate, such that the sacrificial cover layer reduces irregularities of the precision holes.

The invention provides chemical-mechanical polishing compositions and methods of chemically-mechanically polishing a substrate, especially a substrate comprising a silicon oxide layer, with the chemical-mechanical polishing compositions. The polishing compositions comprise first abrasive particles, wherein the first abrasive particles are wet-process ceria particles, have a median particle size of about 75 nm to about 200 nm, and are present in the polishing composition at a concentration of about 0.005 wt. % to about 2 wt. % a functionalized heterocycle, a cationic polymer selected from a quaternary amine, is cationic polyvinyl alcohol, and a cationic cellulose, optionally a carboxylic acid, a pH-adjusting agent, and an aqueous carrier, and have a pH of about 1 to about 6.

A method for decorating a dial includes deeply digging and forming a first groove by repeatedly scanning, in a predetermined scanning direction, a place where laser light is applied to a base material. In the scanning, a depth of the first groove is controlled by the number of irradiation times that the laser light is applied. An area where a depth of the first groove is shallow and an area where a depth of the first groove is deep are present according to the number of irradiation times.