B44C1/22

Material removal from inner surface to preserve perception of outer surface aesthetics

A veneer for a wall-mounted keypad may include indicia that are laser cut therethrough and that are representative of functions that may be performed by the keypad. The veneer may include a recess that extends into an inner surface of the veneer, proximate to the indicia. The recess may be shaped such that a perceived aesthetic of an outer surface of the veneer is preserved during formation of the indicia. The recess may for example have an organic shape defined by a curved outer perimeter that does not define any corners.

Methods of forming portions of near field transducers (NFTS) and articles formed thereby

Methods that include forming at least a portion of a near field transducer (NFT) structure; depositing a material onto at least one surface of the portion of the NFT to form a metal containing layer; and subjecting the metal containing layer to conditions that cause diffusion of at least a portion of the material into the at least one surface of the portion of the NFT; and devices formed thereby.

DECORATIVE ITEM, DECORATIVE ITEM UNIT AND METHOD OF MANUFACTURING DECORATIVE ITEM
20170349000 · 2017-12-07 ·

A decorative item includes a base body; a decorative portion formed by roughing a surface of the base body; and a coating layer that covers the surface of the base body including the decorative portion.

Creating a finishing pattern on a garment by laser

Software and lasers are used in finishing apparel to produce a desired wear pattern or other design. A technique includes determining a fabric's response to a laser, capturing an initial image of a wear pattern on a garment, and processing the initial image to obtain a working image in grayscale. The working image is further processed to obtain a difference image by comparing each pixel relative to a dark reference. The difference image is converted to a laser values image by using the previously determined fabric response to the laser.

ELEMENT CHIP MANUFACTURING METHOD

An element chip manufacturing method includes a preparation process of preparing a substrate which includes a first surface having an exposed bump and a second surface opposite to the first surface and includes a plurality of element regions defined by dividing regions, a bump embedding process of embedding at least a head top part of the bump into the adhesive layer, a mask forming process of forming a mask in the second surface. The method for manufacturing the element chip includes a holding process of arranging the first surface to oppose a holding tape supported on a frame and holding the substrate on the holding tape, a placement process of placing the substrate on a stage provided inside of a plasma processing apparatus through the holding tape, after the mask forming process and the holding process.

METHOD OF MARKING LAMINATED JEWELRY
20170341461 · 2017-11-30 ·

A method to permanently mark an item of laminated jewelry involves creating a laminate of two metals, and upper layer typically formed of a more precious metal such as gold, platinum or palladium that do not readily oxidize laminated onto the surface of a less precious metal, such as silver, which can be oxidized to create a dark color (e.g. black). A laser is used to create characters and/or designs in the upper layer by vaporizing portions thereof to effectively remove those portions. This exposes the upper surface of the less precious metal that does become oxidized. An oxidizer, such as liquid sulfur, is then used to blacken the silver, typically a dark gray. However, if more contrast is needed by making the marked text, designs etc. darker than gray a second step can be used by applying an additional oxidizing agent to turn the dark gray to substantially black.

Metal plate, method of manufacturing metal plate, and method of manufacturing deposition mask by use of metal plate

The object of the present invention is to provide a metal plate capable of manufacturing a deposition mask in which dispersion of positions of through-holes is restrained. A thermal recovery rate is defined as parts per million of a difference a distance between to measurement points on a sample before a heat treatment and a distance therebetween after the heat treatment, relative to the distance therebetween before the heat treatment. In this case, an average value of the thermal recovery rates of the respective samples is not less than −10 ppm and not more than +10 ppm, and (2) a dispersion of the thermal recovery rates of the respective samples is not more than 20 ppm.

Thermal history-based etching
09828284 · 2017-11-28 · ·

A method for adjusting an etchability of a first borosilicate glass by heating the first borosilicate glass; combining the first borosilicate glass with a second borosilicate glass to form a composite; and etching the composite with an etchant. A material having a protrusive phase and a recessive phase, where the protrusive phase protrudes from the recessive phase to form a plurality of nanoscale surface features, and where the protrusive phase and the recessive phase have the same composition.

Methods for manufacturing panels and panel obtained thereby

A method may be provided for manufacturing coated panels of the type including at least a substrate and a top layer with a motif. The top layer may be provided on the substrate. The method may involve providing a synthetic material layer on the substrate. A relief may be provided on the surface of the synthetic material layer provided on the substrate. The relief may include a pattern of recesses and/or projections. The relief may be obtained by providing a mask on or in the synthetic material layer. The mask may enable a selective treatment of the synthetic material layer. A material-removing treatment or a material-depositing treatment may be performed on the synthetic material layer, such that the mask at least partially determines the pattern.

Methods for manufacturing panels and panel obtained thereby

A method may be provided for manufacturing coated panels of the type including at least a substrate and a top layer with a motif. The top layer may be provided on the substrate. The method may involve providing a synthetic material layer on the substrate. A relief may be provided on the surface of the synthetic material layer provided on the substrate. The relief may include a pattern of recesses and/or projections. The relief may be obtained by providing a mask on or in the synthetic material layer. The mask may enable a selective treatment of the synthetic material layer. A material-removing treatment or a material-depositing treatment may be performed on the synthetic material layer, such that the mask at least partially determines the pattern.