Patent classifications
B01D53/46
Wet abatement system
A wet abatement system which can suppress the accumulation of foreign matters in a treatment gas line is proposed. There is provided a wet abatement system for detoxifying treatment gas by bringing the treatment gas into contact with liquid. The wet abatement system includes an inlet casing having an inlet port from which the treatment gas is let in and an outlet port provided below the inlet port and through which the treatment gas flows, and a liquid film forming device provided between the inlet port and the outlet port and configured to form a liquid film on an inner wall surface of the inlet casing. A heater configured to heat the inlet casing is embedded in an interior of a wall portion of the inlet casing, the wall portion constituting a portion situated above the liquid film forming device.
Wet abatement system
A wet abatement system which can suppress the accumulation of foreign matters in a treatment gas line is proposed. There is provided a wet abatement system for detoxifying treatment gas by bringing the treatment gas into contact with liquid. The wet abatement system includes an inlet casing having an inlet port from which the treatment gas is let in and an outlet port provided below the inlet port and through which the treatment gas flows, and a liquid film forming device provided between the inlet port and the outlet port and configured to form a liquid film on an inner wall surface of the inlet casing. A heater configured to heat the inlet casing is embedded in an interior of a wall portion of the inlet casing, the wall portion constituting a portion situated above the liquid film forming device.
System and method for separating xenon-krypton mixed gas by hydrate formation process
The invention provides a method and system for separating xenon-krypton mixed gas by hydrate formation process. The system is mainly composed of a gas hydrate generating unit, a heat exchanging unit and a gas-water separating unit: pre-cooled xenon-krypton mixed gas is injected from a bottom of a reaction tower, xenon gas in the mixed gas and water attached to a porous tray generate a xenon gas hydrate; and water is injected from a top of the tower to wet the porous tray, a generated hydrate particle is washed and collected to the bottom of the tower simultaneously to form a hydrate slurry, after passing through the heat exchanging unit, the xenon gas hydrate in the slurry is decomposed to form a gas phase flow and a water phase flow, and then enters the gas-water separating unit, and the xenon gas is separated from decomposed water.
System and method for separating xenon-krypton mixed gas by hydrate formation process
The invention provides a method and system for separating xenon-krypton mixed gas by hydrate formation process. The system is mainly composed of a gas hydrate generating unit, a heat exchanging unit and a gas-water separating unit: pre-cooled xenon-krypton mixed gas is injected from a bottom of a reaction tower, xenon gas in the mixed gas and water attached to a porous tray generate a xenon gas hydrate; and water is injected from a top of the tower to wet the porous tray, a generated hydrate particle is washed and collected to the bottom of the tower simultaneously to form a hydrate slurry, after passing through the heat exchanging unit, the xenon gas hydrate in the slurry is decomposed to form a gas phase flow and a water phase flow, and then enters the gas-water separating unit, and the xenon gas is separated from decomposed water.
TRAP FILTER SYSTEM FOR SEMICONDUCTOR EQUIPMENT
The present disclosure is directed to a trap filter system having a plurality of filters, the plurality of filters having filtering materials to remove contaminants from a flow of gas effluents generated by a semiconductor processing tool and a bypass mechanism configured to selectively direct or shut off the flow of gas effluents to one or more of the plurality of filters while the semiconductor processing tool remains in operation. Each of the plurality of filters is removable and replaceable when the filtering material is unable to effectuate the removal of contaminants.
GAS PURIFICATION DEVICE, AND APPARATUS AND METHOD FOR MEASURING NOBLE GAS ISOTOPES
Disclosed are a gas purification device, and an apparatus and a method for measuring isotopes of noble gases. The gas purification device includes a housing and a purification mechanism. The housing is provided with a reaction chamber. The reaction chamber is in a vacuum state and is configured to hold a gas sample. The purification mechanism is arranged on the housing and is provided with a cavity. The cavity in the purification mechanism is communicated with the reaction chamber. The purification mechanism is configured to purify the gas sample in the reaction chamber to obtain a purified gas.
GAS PURIFICATION DEVICE, AND APPARATUS AND METHOD FOR MEASURING NOBLE GAS ISOTOPES
Disclosed are a gas purification device, and an apparatus and a method for measuring isotopes of noble gases. The gas purification device includes a housing and a purification mechanism. The housing is provided with a reaction chamber. The reaction chamber is in a vacuum state and is configured to hold a gas sample. The purification mechanism is arranged on the housing and is provided with a cavity. The cavity in the purification mechanism is communicated with the reaction chamber. The purification mechanism is configured to purify the gas sample in the reaction chamber to obtain a purified gas.
Carbon formation reactor and method of using same
A novel carbon formation reactor for forming carbon from a carbon-bearing fluidic stream, and method of using the same, is described. The reactor uses a catalyst bearing surface placed within a heated zone in a carbon-bearing fluidic stream to form carbon, which can then be removed from the reactor, with the process repeatable to achieve high extraction efficiencies.
Carbon formation reactor and method of using same
A novel carbon formation reactor for forming carbon from a carbon-bearing fluidic stream, and method of using the same, is described. The reactor uses a catalyst bearing surface placed within a heated zone in a carbon-bearing fluidic stream to form carbon, which can then be removed from the reactor, with the process repeatable to achieve high extraction efficiencies.
DEVICE FOR CLEANING AND STERILIZING AIR AND OBJECT SURFACES
Provided is a device that uses ozone, hydrogen peroxide, and hydroxyl radicals to sterilize, detoxify and purify indoor air, while simultaneously removing radon gas. The device is provided with a condensing unit (10) having a Peltier structure, and further provided with a device (2) that discharges electricity and generates ozone. The device further has an ultraviolet lamp (9) and a titanium dioxide coating for creating a titanium dioxide physical environment. The device is also provided with generation boxes (3, 5). Ultrasonic waves are used to electrolyze a liquid, such as water, hydrogen peroxide or oxygen, in the generation boxes (3, 5), so as to further generate hydroxyl radicals.