This method, for regenerating a member used in a device that treats seawater, involves a cleaning step for removing deposits from the member. In the cleaning step, a first chemical solution containing an acid other than hydroxydicarboxylic acid and a second chemical solution containing hydrogen peroxide, a heavy metal compound and hydroxydicarboxylic acid are used.

Embodiments described herein relate to methods and systems for dewatering alcoholic solutions via forward osmosis, where the concentration of alcohol in the draw stream is equal to or greater than the concentration of the alcohol in the feed stream. As the feed stream is concentrated the alcohol is retained in the feed stream.

A filter unit includes an inlet for receiving unfiltered water. A first fluid path directs water through a membrane and a filter element to a first outlet. Additionally, a second fluid path directs water across the membrane and to a second outlet.

A control system has a water purification module and a control module. The water purification module has a preliminary filter and a reverse osmosis filter. The control module regularly controls the purification and the drainage of the water purification module, and solves the problem that the TDS value of the water on both sides of the reverse osmosis membrane is too high after the water purifier is on standby for a period of time. The control system regularly drains high concentration water on both sides of the reverse osmosis membrane to improve water purification efficiency.

A water purification filter element is provided. The water purification filter element may include a filter bottle, a filter material, an end cover, and a water self-stopping and passing structure.

The disclosed technology includes a membrane-based device configured to concentrate black liquor, which results from papermaking. Certain embodiments may comprise a nanofiltration membrane configured to remove lignin from black liquor, and the nanofiltration membrane may include a first macroporous polymer substrate and a first graphene oxide membrane covering the first macroporous polymer substrate. Some embodiments may comprise a reverse osmosis membrane, which may include a second macroporous polymer substrate and a second graphene oxide membrane covering the second macroporous polymer substrate.

A raw water channel spacer capable of suppressing formation of a concentration polarization layer in a region in the vicinity of a separation membrane in a raw water channel, and a spiral wound membrane element including the same are provided. A raw water channel spacer is formed by superposing a first yarn row and a second yarn row, and includes alternately a first mesh structure having a configuration in which first rectangular meshes formed of the yarn rows are continuous in an extending direction of the second yarn row, and a second mesh structure having a configuration in which meshes are continuous in the extending direction of the second yarn row such that an interval in the second yarn row is smaller than an interval of the second yarn row forming the first mesh structure.

Provided is a feed spacer having a three-layer structure, in which a set forming the feed spacer is formed in a three-layer structure, so that the set, which is in contact with a reverse osmosis membrane, convects raw water to a center of the structure of the feed spacer and a laminar flow velocity gradient is generated at the center to decrease a polarization phenomenon of a reverse osmosis filter module and minimize pressure loss, and a reverse osmosis membrane filter module including the feed spacer.

Photocurable compositions and methods of preparation and use of such compositions. More particularly, photocurable compositions useful for forming topographical features on surfaces such as membrane surfaces. Methods of forming topographical features on a membrane surface using photocurable compositions.

A method and system is provided for treating waste generated from manufacturing operations including at least one of Printed Circuit Boards Fabrication (PCB FAB), General Metal Finishing (GMF), semiconductors manufacturing, chemical milling, and Physical Vapour Deposition (PVD). The method and system are used to create zero liquid discharge recycling.