Patent classifications
B01D2257/204
Process for PVC-containing mixed plastic waste pyrolysis
A process for pyrolysis of a mixed plastic stream that contains polyvinyl chloride (PVC) is provided in which the chloride from PVC is removed from an initial melting reactor that heats the mixed plastic stream to a sufficient temperature to produce HCl but at a low enough temperature to avoid production of organochlorides. Chloride is primarily removed in a vapor stream from the initial melting reactor, while additional chloride removal may be removed downstream from the melting reactor by the use of sorbent addition to the pyrolysis reactor and by subsequent adsorbent beds.
Vacuum pumping and abatement system
The present invention relates to a vacuum pumping and abatement system for evacuating processing gas from a process chamber and removing noxious substances from the processing gas. The present invention also relates to a method of purging a vacuum pumping arrangement. The present invention seeks to reduce the cost of ownership and operation and carbon footprint of such systems, by providing a vacuum pumping and abatement system for evacuating processing gas from a process chamber and removing noxious substances from the processing gas, comprising a vacuum pumping arrangement for evacuating processing gas from a process chamber; a source of compressed air for purging the vacuum pumping arrangement during evacuation; and a burner for receiving processing gas and compressed air from the vacuum pumping arrangement and removing noxious substances therefrom by burning the processing gas in oxygen wherein at least some of the oxygen that supports combustion is derived from the compressed air.
Device of purifying hydrogen fluoride in semiconductor process waste gas
A device of purifying a fluoride in a semiconductor process waste gas includes a reaction chamber formed in a waste gas treating tank, and a heat pipe disposed in the waste gas treating tank and inserted into the reaction chamber. A water injection pipe is disposed at the outside end of the heat pipe formed at an outside of the waste gas treating tank, a heating rod is disposed in and passes through the heat pipe, a passage is formed between the heating rod and the heat pipe, water is guided and enters into the passage by the water injection pipe, the water in the passage contacts with the heating rod to produce a mist gaseous water at a high temperature, the mist gaseous water is guided and enters into the reaction chamber via the plurality of spit-outs to dissolve the fluoride to be reacted into a hydrogen fluoride, and a dissolving temperature of the mist gaseous water contacting with the fluoride is 3701300 C.
Carbon sorbents for the removal of nitrogen oxides and methods for making the same
Adsorbents including a sorbent, at least one metal additive and greater than about 5 wt. % triethylenediamine are described herein. Methods for making such adsorbents and filters comprising the adsorbents are also described.
A PROCESS FOR THE PURIFYING OF A RAW GAS STREAM CONTAINING MAINLY C1-C5 HYDROCARBONS AND CARBON DIOXIDE, AND IMPURITIES OF ORGANIC AND INORGANIC SULFUR COMPOUNDS, HALOGENATED AND NON-HALOGENATED VOLATILE ORGANIC COMPOUNDS AND OXYGEN
A method for the purification of a raw gas stream by selective catalytic oxidation, in which organic and inorganic sulfur compounds, halogenated and non-halogenated volatile organic compounds are selectively oxidized without substantially oxidizing the lower hydrocarbons and the sulfur containing compounds present in the gas to sulfur trioxide and excess of oxygen is removed by oxidation of lower alcohols, ethers or hydrogen added to the raw gas stream upstream the catalytic oxidation.
ELECTRONIC GAS IN-SITU PURIFICATION
A method of purifying a target fluid containing one or more impurities, the method includes providing the target fluid to a vessel having an adsorbent material located therein, where the absorbent material is a metal organic framework (MOF) or a porous organic polymer (POP), preferentially adsorbing either the target fluid or at least one of the one or more impurities on the adsorbent material, and venting the target fluid from the vessel if the impurities are preferentially adsorbed on the adsorbent material or venting the one or more impurities from the vessel if the target fluid is preferentially adsorbed on the adsorbent material.
Purification process
A process for removing halogen compounds, particularly chlorine compounds, from a process fluid, includes the steps of (i) passing a process fluid containing hydrogen halide over a first sorbent to remove hydrogen halide and generate a hydrogen halide depleted process fluid and then, (ii) passing the hydrogen halide depleted process fluid over a second different sorbent to remove organic halide compounds therefrom. A purification system suitable for removing hydrogen halide and organic halide compounds from process fluids is also described.
GAS FILTER
A gas filter includes a housing including a mounting portion and a main portion. The mounting portion is configured to mount the gas filter on a surface of a device. The main portion is configured to be positioned apart from the surface of the device and extends from the mounting portion in a horizontal direction. The housing has an inlet and an outlet and defines a flow channel between the inlet and the outlet. The flow channel has first and second channel portions, the first channel portion extending from the inlet to the second channel portion, the second channel portion extending in a direction substantially parallel to the horizontal direction. A filter member is positioned in the flow channel between the inlet and the outlet.
ADSORBENT-ASSISTED STABILIZATION OF HIGHLY REACTIVE GASES
A method of adsorbing a highly reactive gas onto an adsorbent material comprising adsorbing the highly reactive gas to the adsorbent material. The absorbent material comprises at least one Lewis basic functional group, or pores of a size to hold a single molecule of the highly reactive gas, or inert moieties which are provided to the adsorbent material at the same time at the same time as the highly reactive gas, prior to adsorbing the highly reactive gas or after adsorbing the highly reactive gas, or the highly reactive gas reacts with moieties of the adsorbent material resulting in passivation of the adsorbent material. A rate of decomposition of the adsorbed highly reactive gas is lower than a rate of decomposition for the neat gas at equal volumetric loadings and equal temperatures for both the adsorbed highly reactive gas and the neat gas.
Device and process for fluorine recovery from smoke after phosphorus absorption by hydration in kiln process for production of phosphoric acid
A device and process for fluorine recovery from smoke after phosphorus absorption by hydration in KPA, wherein the device comprises a first-stage and second-stage fluorine absorption tower, which are both fluidized counter-current washing towers. The device according to the present invention has simple structure, low investment cost, high raw material utilization rate, and good fluorine recovery effects.